-
1
المؤلفون: Christa Vrancken, M.J.H. van Dal, Peter Verheyen, Jorge A. Kittl, Anne Lauwers, K. Funk, Sofie Mertens, K. Verheyden, O. Chamirian, Caroline Demeurisse
المصدر: Microelectronic Engineering. 83:2268-2271
مصطلحات موضوعية: Diffraction, Materials science, Annealing (metallurgy), Scanning electron microscope, Analytical chemistry, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Isothermal process, Phase formation, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, Silicide, Thermal stability, Electrical and Electronic Engineering, Sheet resistance
-
2
المؤلفون: O. Chamirian, Alain M. Jonas, Jorge A. Kittl, Bert Brijs, Anne Lauwers, Karen Maex, Wilfried Vandervorst, Youssef Travaly, M. Van Hove, Timo Sajavaara
المصدر: Microelectronic Engineering. 82:492-496
مصطلحات موضوعية: Chemistry, Analytical chemistry, Condensed Matter Physics, Rutherford backscattering spectrometry, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, X-ray reflectivity, Elastic recoil detection, Condensed Matter::Materials Science, chemistry.chemical_compound, Transmission electron microscopy, X-ray crystallography, Silicide, Thermal stability, Electrical and Electronic Engineering, Sheet resistance
-
3
المؤلفون: Bencherki Mebarki, O. Chamirian, M. A. Pawlak, Tushar Mandrekar, Karen Maex, Muriel de Potter, Anne Lauwers, Xavier Pages, Jorge A. Kittl, Toon Raymakers, Richard Lindsay, Mark Van Dal
المصدر: Materials Science and Engineering: B. :29-41
مصطلحات موضوعية: Materials science, Dopant, Silicon, Mechanical Engineering, Metallurgy, Oxide, chemistry.chemical_element, Activation energy, Condensed Matter Physics, chemistry.chemical_compound, chemistry, Chemical engineering, Mechanics of Materials, Silicide, General Materials Science, Thermal stability, Work function, Sheet resistance
-
4
المؤلفون: M. A. Pawlak, Jorge A. Kittl, Tom Schram, O. Chamirian, Anne Lauwers, Anabela Veloso, Karen Maex, André Vantomme
المصدر: Microelectronic Engineering. 76:349-353
مصطلحات موضوعية: Materials science, Dopant, business.industry, Oxide, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, CMOS, Silicide, Optoelectronics, Thermal stability, Work function, Electrical and Electronic Engineering, business
-
5
المؤلفون: Richard Lindsay, M.J.H. van Dal, Jorge A. Kittl, M. de Potter, O. Chamirian, Karen Maex, Anne Lauwers
المصدر: Microelectronic Engineering. 76:297-302
مصطلحات موضوعية: Materials science, Analytical chemistry, Mineralogy, Activation energy, Atmospheric temperature range, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Crystallinity, chemistry.chemical_compound, chemistry, Silicide, Thermal stability, Crystallite, Electrical and Electronic Engineering, Single crystal, Sheet resistance
-
6
المؤلفون: Jorge A. Kittl, Karen Maex, X. Pages, Christa Vrancken, Anne Lauwers, Ernst Hendrik August Granneman, O. Chamirian, M. de Potter, K. van der Jeugd, Caroline Demeurisse, M.J.H. van Dal, Vladimir Ivanovich Kuznetsov, Richard Lindsay
المصدر: Microelectronic Engineering. 76:303-310
مصطلحات موضوعية: Materials science, business.industry, Annealing (metallurgy), Junction leakage, Semiconductor device, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Nickel silicide, chemistry, Rapid thermal processing, Silicide, Optoelectronics, Electrical and Electronic Engineering, business
-
7
المؤلفون: Jorge A. Kittl, O. Richard, Karen Maex, Anne Lauwers, M.J.H. van Dal, O. Chamirian
المصدر: Microelectronic Engineering. 70:201-208
مصطلحات موضوعية: Materials science, chemistry.chemical_element, Mineralogy, Activation energy, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, Chemical engineering, Silicide, Degradation (geology), Thermal stability, Electrical and Electronic Engineering, Thin film, Tin, Layer (electronics), Sheet resistance
-
8
المؤلفون: Richard Lindsay, Karen Maex, Anne Lauwers, M. de Potter, A. Akheyar, M.J.H. van Dal, O. Chamirian, Jorge A. Kittl
المصدر: Microelectronic Engineering. 70:158-165
مصطلحات موضوعية: Materials science, business.industry, Contact resistance, Activation energy, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, CMOS, Silicide, Optoelectronics, Electrical and Electronic Engineering, Thin film, business, Sheet resistance, Leakage (electronics), Diode
-
9
المؤلفون: André Vantomme, O. Chamirian, H. Guérault, Caroline Demeurisse, Karen Maex, Anne Lauwers
المصدر: Microelectronic Engineering. 64:173-180
مصطلحات موضوعية: Auger electron spectroscopy, Materials science, Nucleation, Analytical chemistry, chemistry.chemical_element, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Crystallography, chemistry.chemical_compound, chemistry, Transmission electron microscopy, Silicide, Electrical and Electronic Engineering, Thin film, Spectroscopy, Sheet resistance, Titanium
-
10
المؤلفون: Karen Maex, O. Chamirian, Richard Lindsay, Anne Lauwers, Christa Vrancken, M. de Potter, Caroline Demeurisse
المصدر: Microelectronic Engineering. 64:131-142
مصطلحات موضوعية: Resistive touchscreen, Materials science, Silicon, Metallurgy, Nucleation, chemistry.chemical_element, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, Rapid thermal processing, Phase (matter), Silicide, Process window, Electrical and Electronic Engineering, Sheet resistance
-
11
المؤلفون: Karen Maex, M. Cannaerts, C. Van Haesendonck, O Chamirian
المصدر: Nanotechnology. 13:149-152
مصطلحات موضوعية: Scanning joule expansion microscopy, Materials science, Mechanical Engineering, Analytical chemistry, Current crowding, food and beverages, Bioengineering, General Chemistry, chemistry.chemical_compound, chemistry, Mechanics of Materials, Electrical resistivity and conductivity, Heat generation, Silicide, General Materials Science, Grain boundary, Nanometre, Electrical and Electronic Engineering, Composite material, Joule heating
-
12
المؤلفون: An Steegen, Karen Maex, O. Chamirian, Hugo Bender, Franco Marabelli, M. de Potter, Anne Lauwers
المصدر: Microelectronic Engineering. 60:221-230
مصطلحات موضوعية: Materials science, Alloy, Metallurgy, Analytical chemistry, Surface finish, engineering.material, Condensed Matter Physics, Temperature measurement, Atomic and Molecular Physics, and Optics, Light scattering, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Stress (mechanics), chemistry.chemical_compound, chemistry, Silicide, engineering, Electrical and Electronic Engineering, Layer (electronics), Sheet resistance
-
13Academic Journal
المؤلفون: O. Chamirian, A. Steegen, H. Bender, A. Lauwers, M. De Potter, K. Maex, MARABELLI, FRANCO
المساهمون: O., Chamirian, A., Steegen, H., Bender, A., Lauwer, M., De Potter, Marabelli, Franco, K., Maex
مصطلحات موضوعية: microelectronic material, silicide, metallization
وصف الملف: STAMPA
Relation: info:eu-repo/semantics/altIdentifier/wos/WOS:000173194900026; volume:60; firstpage:221; lastpage:230; journal:MICROELECTRONIC ENGINEERING; http://hdl.handle.net/11571/11525; info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-0036133189
الاتاحة: http://hdl.handle.net/11571/11525
-
14
المؤلفون: Jorge A. Kittl, M.J.H. van Dal, M. De Potter, O. Chamirian, M. A. Pawlak, Anabela Veloso, K.G. Anil, Geoffrey Pourtois, Karen Irma Josef Maex, A. Lauwers
المصدر: Materials for Information Technology ISBN: 9781852339418
مصطلحات موضوعية: Materials science, Gate length, Engineering physics, Sheet resistance
-
15
المؤلفون: Richard Lindsay, Jorge A. Kittl, Mark Van Dal, Karen Maex, Christa Vrancken, Anne Lauwers, Muriel de Potter, O. Chamirian
المصدر: MRS Proceedings. 810
مصطلحات موضوعية: Materials science, Morphology (linguistics), Silicon, Dopant, business.industry, chemistry.chemical_element, Epitaxy, Laser linewidth, chemistry.chemical_compound, Si substrate, chemistry, Silicide, Optoelectronics, business, Diode
-
16
المؤلفون: Jorge A. Kittl, O. Chamirian, Anne Lauwers, Caroline Demeurisse, Mark Van Dal, Karen Maex, Muriel De Pottera, Amal Akheyar
المصدر: MRS Proceedings. 810
مصطلحات موضوعية: chemistry.chemical_compound, Materials science, chemistry, CMOS, Chemical engineering, Electrical resistivity and conductivity, Diffusion, Silicide, Contact resistance, Thermal stability, Thermal treatment, Leakage (electronics)
-
17
المؤلفون: Karen Maex, M. A. Pawlak, Anne Lauwers, Muriel de Potter, Amal Akheyar, Geoffrey Pourtois, Richard Lindsay, Mark Van Dal, Anil Kottantharayil, Jorge A. Kittl, O. Chamirian
المصدر: MRS Proceedings. 810
مصطلحات موضوعية: Materials science, Dopant, business.industry, Doping, Activation energy, Salicide, chemistry.chemical_compound, chemistry, Gate oxide, Silicide, Optoelectronics, Work function, business, Sheet resistance
-
18
المؤلفون: Karen Maex, Richard Lindsay, Christa Vrancken, Muriel de Potter, O. Chamirian, Caroline Demeurisse, Anne Lauwers
المصدر: MRS Proceedings. 716
مصطلحات موضوعية: Materials science, business.industry, Stress induced, Junction leakage, chemistry.chemical_compound, Reverse leakage current, Laser linewidth, chemistry, Reverse bias, Silicide, Optoelectronics, business, Leakage (electronics), Diode
-
19
المؤلفون: Alexander Volodin, O. Chamirian, M. Cannaerts, Dries Smeets, André Vantomme, C. Van Haesendonck, Karen Maex
المصدر: Journal of Applied Physics. 108:063539
مصطلحات موضوعية: Materials science, business.industry, Current crowding, Analytical chemistry, General Physics and Astronomy, Thermal expansion, chemistry.chemical_compound, chemistry, Electrical resistivity and conductivity, Heat generation, Microscopy, Silicide, Optoelectronics, Grain boundary, Thin film, business
-
20
المؤلفون: M. A. Pawlak, Hugo Bender, O. Chamirian, Jorge A. Kittl, C. Torregiani, A. Lauwers, Karen Irma Josef Maex, A. Benedetti, K.G. Anil, Anabela Veloso, Olivier Richard, J. Liu, M.J.H. van Dal, Monja Kaiser, J. G. M. van Berkum, M. De Potter
المصدر: ResearcherID
Springer Proceedings in Physics ISBN: 9783540319146مصطلحات موضوعية: Materials science, business.industry, chemistry.chemical_compound, chemistry, Electron diffraction, CMOS, Silicide, Thermal, Degradation (geology), Optoelectronics, Thermal stability, Metal gate, business, Sheet resistance
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b751af61260b9cc5bc71326b796763fd
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000237833300082&KeyUID=WOS:000237833300082