المؤلفون: Tesfamichael, Tuquabo, Bell, John

المساهمون: Chiao, J, Thiel, D, Dzurak, A, Jagadish, C

المصدر: Device and Process Technologies for Microelectronics, MEMS, and Photonics IV: Proceedings of SPIE. Vol. 6037.

مصطلحات موضوعية: Microscopic structure, Nitrogen depth profile, Nitrogen ion implantation, Optical properties, Tungsten oxide

وصف الملف: application/pdf

Relation: https://eprints.qut.edu.au/7902/1/7902.pdf; Tesfamichael, Tuquabo & Bell, John (2005) Nitrogen ion implantation and characterization of tungsten oxide films. In Chiao, J, Thiel, D, Dzurak, A, & Jagadish, C (Eds.) Device and Process Technologies for Microelectronics, MEMS, and Photonics IV: Proceedings of SPIE. Vol. 6037. SPIE (The International Society for Optical Engineering), United States of America, pp. 1-9.; https://eprints.qut.edu.au/7902/; Faculty of Built Environment and Engineering; Science & Engineering Faculty; Australian Research Centre for Aerospace Automation

الاتاحة: https://eprints.qut.edu.au/7902/

المؤلفون: Mohammadi, Malihe, Akbari, Alireza, Warchomicka, Fernando, Pichon, Luc

المساهمون: Sahand University of Technology (SUT) Tabriz, Iran (SUT), Surface, Interfaces et MAtériaux sous Contrainte Institut Pprime (SIMAC), Département Physique et Mécanique des Matériaux Institut Pprime (Département PMM), Institut Pprime UPR 3346 (PPrime Poitiers ), Université de Poitiers = University of Poitiers (UP)-École Nationale Supérieure de Mécanique et d’Aérotechnique Poitiers (ISAE-ENSMA )-Centre National de la Recherche Scientifique (CNRS)-Université de Poitiers = University of Poitiers (UP)-École Nationale Supérieure de Mécanique et d’Aérotechnique Poitiers (ISAE-ENSMA )-Centre National de la Recherche Scientifique (CNRS)-Institut Pprime UPR 3346 (PPrime Poitiers ), Université de Poitiers = University of Poitiers (UP)-École Nationale Supérieure de Mécanique et d’Aérotechnique Poitiers (ISAE-ENSMA )-Centre National de la Recherche Scientifique (CNRS)-Université de Poitiers = University of Poitiers (UP)-École Nationale Supérieure de Mécanique et d’Aérotechnique Poitiers (ISAE-ENSMA )-Centre National de la Recherche Scientifique (CNRS)

المصدر: ISSN: 1044-5803 ; Materials Characterization ; https://hal.science/hal-04080668 ; Materials Characterization, 2021, 181, pp.111453. ⟨10.1016/j.matchar.2021.111453⟩.

مصطلحات موضوعية: Gas nitriding, Titanium nitride (TiNx), Ti2N, Diffusion zone, Nitrogen depth profile, X-ray photoelectron spectroscopy (XPS), [SPI]Engineering Sciences [physics]

Relation: hal-04080668; https://hal.science/hal-04080668

الاتاحة: https://hal.science/hal-04080668
https://doi.org/10.1016/j.matchar.2021.111453

المؤلفون: Goh, Roland, Waclawik, Eric, Motta, Nunzio, Bell, John

المساهمون: Chiao, J, Thiel, D, Dzurak, A, Jagadish, C

المصدر: Proceedings SPIE Symposium Vol 6037: Device and Process Technologies for Microelectronics, MEMS, and Photonics IV

مصطلحات موضوعية: Microstructure, Nitrogen Depth Profile, Nitrogen Ion Implantation, Optical Properties, Tungsten Oxide

Relation: Goh, Roland, Waclawik, Eric, Motta, Nunzio, & Bell, John (2005) Influence of Dispersed Carbon Nanotubes on the Optical and Structural Properties of a Conjugated Polymer. In Chiao, J, Thiel, D, Dzurak, A, & Jagadish, C (Eds.) Proceedings SPIE Symposium Vol 6037: Device and Process Technologies for Microelectronics, MEMS, and Photonics IV. SPIE - International Society for Optical Engineering, CD Rom, pp. 1-7.; https://eprints.qut.edu.au/24287/; Faculty of Built Environment and Engineering; Faculty of Science and Technology; Science & Engineering Faculty; Australian Research Centre for Aerospace Automation

الاتاحة: https://eprints.qut.edu.au/24287/

المؤلفون: Kimura, K, Nakajima, K, Okazaki, Y, Kobayashi, H, Miwa, S, Satori, K

المساهمون: 50127073, 80293885

مصطلحات موضوعية: silicon oxynitride, ultrathin film, nitrogen depth profile, RBS, high-resolution, SIMS, AES

Relation: http://hdl.handle.net/2433/4885; http://gateway.isiknowledge.com/gateway/Gateway.cgi?&GWVersion=2&SrcAuth=KyotoUniv&SrcApp=KyotoUniv&DestLinkType=FullRecord&KeyUT=ISI:000088910000106&DestApp=WOS; JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS; 39; 7B; 4663; 4665

الاتاحة: http://hdl.handle.net/2433/4885
http://gateway.isiknowledge.com/gateway/Gateway.cgi?&GWVersion=2&SrcAuth=KyotoUniv&SrcApp=KyotoUniv&DestLinkType=FullRecord&KeyUT=ISI:000088910000106&DestApp=WOS

المؤلفون: Hajime Kobayashi, Kaoru Nakajima, Shiro Miwa, Kenji Kimura, Yasutaka Okazaki, Kotaro Satori

المصدر: Scopus-Elsevier

مصطلحات موضوعية: Auger electron spectroscopy, Silicon oxynitride, Materials science, AES, Silicon, Resolution (electron density), General Engineering, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Substrate (electronics), high-resolution, Nitrogen, Spectral line, nitrogen depth profile, chemistry.chemical_compound, chemistry, ultrathin film, Spectroscopy, SIMS, RBS, silicon oxynitride

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0757846231d62d2f064dd359439aed44
http://www.scopus.com/inward/record.url?eid=2-s2.0-0034228207&partnerID=MN8TOARS

المؤلفون: Chiao, J, Thiel, D, Dzurak, A, Jagadish, C, Goh, Roland, Waclawik, Eric, Motta, Nunzio, Bell, John

المصدر: Proceedings SPIE Symposium Vol 6037: Device and Process Technologies for Microelectronics, MEMS, and Photonics IV

مصطلحات الفهرس: Microstructure, Nitrogen Depth Profile, Nitrogen Ion Implantation, Optical Properties, Tungsten Oxide, Chapter in Book, Report or Conference volume

URL: doi:10.1117/12.638671
Goh, Roland, Waclawik, Eric, Motta, Nunzio, & Bell, John (2005) Influence of Dispersed Carbon Nanotubes on the Optical and Structural Properties of a Conjugated Polymer. In Chiao, J, Thiel, D, Dzurak, A, & Jagadish, C (Eds.) Proceedings SPIE Symposium Vol 6037: Device and Process Technologies for Microelectronics, MEMS, and Photonics IV. SPIE - International Society for Optical Engineering, CD Rom, pp. 1-7.

المؤلفون: Chiao, J, Thiel, D, Dzurak, A, Jagadish, C, Tesfamichael, Tuquabo, Bell, John

المصدر: Device and Process Technologies for Microelectronics, MEMS, and Photonics IV: Proceedings of SPIE.Vol. 6037.

مصطلحات الفهرس: Microscopic structure, Nitrogen depth profile, Nitrogen ion implantation, Optical properties, Tungsten oxide, Chapter in Book, Report or Conference volume

URL: https://eprints.qut.edu.au/7902/1/7902.pdf
https://eprints.qut.edu.au/7902/1/7902.pdf
doi:10.1117/12.640054
Tesfamichael, Tuquabo & Bell, John (2005) Nitrogen ion implantation and characterization of tungsten oxide films. In Chiao, J, Thiel, D, Dzurak, A, & Jagadish, C (Eds.) Device and Process Technologies for Microelectronics, MEMS, and Photonics IV: Proceedings of SPIE.Vol. 6037. SPIE (The International Society for Optical Engineering), United States of America, pp. 1-9.

المؤلفون: 50127073, 80293885, Kimura, K, Nakajima, K, Okazaki, Y, Kobayashi, H, Miwa, S, Satori, K

مصطلحات الفهرس: silicon oxynitride, ultrathin film, nitrogen depth profile, RBS, high-resolution, SIMS, AES, journal article

URL: http://hdl.handle.net/2433/4885
http://gateway.isiknowledge.com/gateway/Gateway.cgi?&GWVersion=2&SrcAuth=KyotoUniv&SrcApp=KyotoUniv&DestLinkType=FullRecord&KeyUT=ISI:000088910000106&DestApp=WOS
10.1143/JJAP.39.4663