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1Report
المؤلفون: Natarajan, Suresh Kondati, Caro, Miguel A.
مصطلحات موضوعية: Condensed Matter - Materials Science, Computer Science - Machine Learning
URL الوصول: http://arxiv.org/abs/2101.00049
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2Academic Journal
المؤلفون: Natarajan, Suresh Kumar, S, Jayanthi, Mathivanan, Sandeep Kumar, Rajadurai, Hariharan, M.B, Benjula Anbu Malar, Shah, Mohd Asif
المصدر: Scientific Reports ; volume 14, issue 1 ; ISSN 2045-2322
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3Academic Journal
المؤلفون: Natarajan, Suresh Kumar, S, Jayanthi, Mathivanan, Sandeep Kumar, Rajadurai, Hariharan, M.B, Benjula Anbu Malar, Shah, Mohd Asif
المصدر: Scientific Reports ; volume 14, issue 1 ; ISSN 2045-2322
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4Academic Journal
المؤلفون: Natarajan, Suresh Kumar, Shanmurthy, Prakash, Arockiam, Daniel, Balusamy, Balamurugan, Selvarajan, Shitharth
المصدر: Scientific Reports ; volume 14, issue 1 ; ISSN 2045-2322
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5Academic Journal
المؤلفون: Rajamanickam, Anuradha, Kumar, Nathella Pavan, Venkataraman, Aishwarya, Varadarjan, Poovazhagi, Selladurai, Elilarasi, Sankaralingam, Thangavelu, Thiruvengadam, Kannan, Selvam, Ramya, Thimmaiah, Akshith, Natarajan, Suresh, Ramaswamy, Ganesh, Putlibai, Sulochana, Sadasivam, Kalaimaran, Sundaram, Balasubramanian, Hissar, Syed, Ranganathan, Uma Devi, Babu, Subash
المساهمون: Division of Intramural Research, the National Institute of Allergy and Infectious Diseases (NIAID), and the National Institutes of Health
المصدر: Scientific Reports ; volume 14, issue 1 ; ISSN 2045-2322
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6Academic Journal
المؤلفون: Pavan Kumar, Nathella, Abbas, Kadar M., Renji, Rachel M., Venkataraman, Aishwarya, Nancy, Arul, Varadarjan, Poovazhagi, Selladurai, Elilarasi, Sangaralingam, Thankgavelu, Selvam, Ramya, Thimmaiah, Akshith, Natarajan, Suresh, Ramasamy, Ganesh, Hissar, Syed, Ranganathan, Uma Devi, Nutman, Thomas B., Babu, Subash
المساهمون: Division of Intramural Research, National Institute of Allergy and Infectious Diseases, NIAID
المصدر: Frontiers in Pediatrics ; volume 11 ; ISSN 2296-2360
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7Conference
المؤلفون: V, Varun, Natarajan, Suresh Kumar, M, Adithya, P, Nagatejas, A, Mithun Chavan, Moorthi Hosahalli, Nethra
المصدر: 2024 2nd International Conference on Recent Advances in Information Technology for Sustainable Development (ICRAIS) ; page 72-77
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8Conference
المؤلفون: A P, Sachin Pavithran, Banerjee, Anurima, Pradeep Ghantasala, G S, R, Rajesh Sharma, Ananthanagu, U, Natarajan, Suresh Kumar, Vidyullatha, Pellakuri
المصدر: 2024 3rd Odisha International Conference on Electrical Power Engineering, Communication and Computing Technology (ODICON) ; page 1-6
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9Book
المؤلفون: Packianathan, Rajeswari, Arumugam, Gobinath, Natarajan, Suresh Kumar, Malaiarasan, Anandan
المصدر: Machine Vision and Industrial Robotics in Manufacturing ; page 299-313 ; ISBN 9781003438137
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10Academic Journal
المؤلفون: Sharma, Varun, Natarajan, Suresh Kondati, Elliott, Simon D., Blomberg, Tom, Haukka, Suvi, Givens, Michael E., Tuominen, Marko, Ritala, Mikko
المساهمون: Doctoral Programme in Materials Research and Nanosciences, Department of Chemistry, Mikko Ritala / Principal Investigator, HelsinkiALD
مصطلحات موضوعية: atomic layer etching, density functional theory, thermal etching, ATOMIC LAYER DEPOSITION, THIN-FILMS, METAL, TIN, DECOMPOSITION, CHEMISTRIES, PERFORMANCE, Chemical sciences
وصف الملف: application/pdf
Relation: The authors thank Eurofins EAG Materials Science, LLC (California, USA) for the TEM analysis. S.K.N. thanks ICHEC and the Science Foundation Ireland funded computing center of Tyndall National Institute for computer time. S.K.N. thanks Rita Mullins for help with reaction free energy calculations.; Sharma , V , Natarajan , S K , Elliott , S D , Blomberg , T , Haukka , S , Givens , M E , Tuominen , M & Ritala , M 2021 , ' Combining Experimental and DFT Investigation of the Mechanism Involved in Thermal Etching of Titanium Nitride Using Alternate Exposures of NbF5 and CCl4, or CCl4 Only ' , Advanced Materials Interfaces , vol. 8 , no. 22 , 2101085 . https://doi.org/10.1002/admi.202101085; ORCID: /0000-0002-6210-2980/work/124027030; http://hdl.handle.net/10138/350070; 4220e790-b275-48c8-b7a5-0335135ece99; 000709853400001
الاتاحة: http://hdl.handle.net/10138/350070
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11Academic Journal
المؤلفون: Cano, Austin M., Kondati Natarajan, Suresh, Partridge, Jonathan L., Elliott, Simon D., George, Steven M.
المساهمون: University of Colorado Boulder, Department of Electrical Engineering and Automation, Schrödinger LLC, Aalto-yliopisto, Aalto University
وصف الملف: application/pdf
Relation: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films; Volume 40, issue 2; Cano , A M , Kondati Natarajan , S , Partridge , J L , Elliott , S D & George , S M 2022 , ' Spontaneous etching of B 2 O 3 by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory ' , Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol. 40 , no. 2 , 022601 . https://doi.org/10.1116/6.0001542; PURE UUID: e4fb9b17-9717-42b8-a669-784de721cf88; PURE ITEMURL: https://research.aalto.fi/en/publications/e4fb9b17-9717-42b8-a669-784de721cf88; PURE LINK: http://www.scopus.com/inward/record.url?scp=85123191220&partnerID=8YFLogxK; PURE FILEURL: https://research.aalto.fi/files/81259786/Spontaneous_etching_of_B2O3_by_HF_gas_studied_using_infrared_spectroscopy_mass_spectrometry_and_density_functional_theory.pdf; https://aaltodoc.aalto.fi/handle/123456789/113898; URN:NBN:fi:aalto-202204062774
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12Academic Journal
المؤلفون: Nies, Cara-Lena, Natarajan, Suresh Kondati, Nolan, Michael
المساهمون: Science Foundation Ireland
المصدر: Chemical Science ; volume 13, issue 3, page 713-725 ; ISSN 2041-6520 2041-6539
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13Academic Journal
المؤلفون: Rajamanickam, Anuradha, Nathella, Pavan Kumar, Venkataraman, Aishwarya, Varadarjan, Poovazhagi, Kannan, Srinithi, Pandiarajan, Arul Nancy, Renji, Rachel Mariam, Elavarasan, Elayarani, Thimmaiah, Akshith, Sasidaran, Kandasamy, Krishnamoorthy, Nedunchelian, Natarajan, Suresh, Ramaswamy, Ganesh, Sundaram, Balasubramanian, Putlibai, Sulochana, Hissar, Syed, Selladurai, Elilarasi, Uma Devi, K. Ranganathan, Nutman, Thomas B., Babu, Subash
المساهمون: Suthar, Mehul, Division of Intramural Research, National Institute of Allergy and Infectious Diseases
المصدر: PLOS Pathogens ; volume 18, issue 11, page e1010915 ; ISSN 1553-7374
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14Academic Journal
المؤلفون: Kumar, Nathella Pavan, Venkataraman, Aishwarya, Nancy, Arul, Moideen, Kadar, Varadarjan, Poovazhagi, Selladurai, Elilarasi, Sangaralingam, Thankgavelu, Selvam, Ramya, Thimmaiah, Akshith, Natarajan, Suresh, Ramasamy, Ganesh, Hissar, Syed, Radayam Ranganathan, Umadevi, Babu, Subash
المساهمون: Division of Intramural Research, National Institute of Allergy and Infectious Diseases, National Institute for Research in Tuberculosis, International Center for Excellence in Research
المصدر: The Journal of Infectious Diseases ; volume 226, issue 7, page 1215-1223 ; ISSN 0022-1899 1537-6613
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15Academic Journal
المؤلفون: Pavan Kumar, Nathella, Venkataraman, Aishwarya, Varadarjan, Poovazhagi, Nancy, Arul, Rajamanickam, Anuradha, Selladurai, Elilarasi, Sankaralingam, Thangavelu, Thiruvengadam, Kannan, Selvam, Ramya, Thimmaiah, Akshith, Natarajan, Suresh, Ramaswamy, Ganesh, Putlibai, Sulochana, Sadasivam, Kalaimaran, Sundaram, Balasubramanian, Hissar, Syed, Ranganathan, Uma Devi, Nutman, Thomas B., Babu, Subash
المساهمون: Division of Intramural Research, National Institute of Allergy and Infectious Diseases
المصدر: Frontiers in Medicine ; volume 9 ; ISSN 2296-858X
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16Academic Journal
المؤلفون: Sathiyasekaran, Malathi, Ganesh, R., Natarajan, Suresh
المصدر: Indian Journal of Pediatrics; Jun2024, Vol. 91 Issue 6, p606-613, 8p
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17Academic Journal
المؤلفون: Sharma, Varun, Kondati Natarajan, Suresh, Elliott, Simon D., Blomberg, Tom, Haukka, Suvi, Givens, Michael E., Tuominen, Marko, Ritala, Mikko
المساهمون: ASM Microchemistry Oy, Department of Electrical Engineering and Automation, Schrödinger LLC, Department of Chemistry and Materials Science, University of Helsinki, Aalto-yliopisto, Aalto University
مصطلحات موضوعية: atomic layer etching, density functional theory, thermal etching
Relation: Advanced Materials Interfaces; Volume 8, issue 22; Sharma , V , Kondati Natarajan , S , Elliott , S D , Blomberg , T , Haukka , S , Givens , M E , Tuominen , M & Ritala , M 2021 , ' Combining Experimental and DFT Investigation of the Mechanism Involved in Thermal Etching of Titanium Nitride Using Alternate Exposures of NbF 5 and CCl 4 , or CCl 4 Only ' , Advanced Materials Interfaces , vol. 8 , no. 22 , 2101085 . https://doi.org/10.1002/admi.202101085; PURE UUID: 35e3f3ec-1229-4039-b970-1bd290d81843; PURE ITEMURL: https://research.aalto.fi/en/publications/35e3f3ec-1229-4039-b970-1bd290d81843; PURE LINK: http://www.scopus.com/inward/record.url?scp=85117452388&partnerID=8YFLogxK; PURE LINK: https://researchportal.helsinki.fi/fi/publications/combining-experimental-and-dft-investigation-of-the-mechanism-inv; https://aaltodoc.aalto.fi/handle/123456789/112919; URN:NBN:fi:aalto-202202091812
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18Academic Journal
المؤلفون: Kondati Natarajan, Suresh, Nolan, Michael, Theofanis, Patrick, Mokhtarzadeh, Charles, Clendenning, Scott B.
المساهمون: Department of Electrical Engineering and Automation, University College Cork, Intel, Aalto-yliopisto, Aalto University
وصف الملف: application/pdf
Relation: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films; Volume 39, issue 2; Kondati Natarajan , S , Nolan , M , Theofanis , P , Mokhtarzadeh , C & Clendenning , S B 2021 , ' In silico design of a thermal atomic layer etch process of cobalt ' , Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol. 39 , no. 2 , 022603 . https://doi.org/10.1116/6.0000804; PURE UUID: fa246abc-c19a-4e59-8836-80fb7a51ff5e; PURE ITEMURL: https://research.aalto.fi/en/publications/fa246abc-c19a-4e59-8836-80fb7a51ff5e; PURE LINK: http://www.scopus.com/inward/record.url?scp=85101981257&partnerID=8YFLogxK; PURE FILEURL: https://research.aalto.fi/files/61673504/ELEC_Natarajan_etal_In_Siloco_Design_JVacSciTec_2021_finalpublishedversion.pdf; https://aaltodoc.aalto.fi/handle/123456789/106940; URN:NBN:fi:aalto-202104206234
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19Conference
المؤلفون: Lorigan, David, Kuthanur-Natarajan, Suresh
المصدر: Miscellaneous ; page A222.2-A222
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20Academic Journal
المؤلفون: Kondati Natarajan, Suresh, Nolan, Michael, Theofanis, Patrick, Mokhtarzadeh, Charles, Clendenning, Scott B.
المساهمون: Department of Electrical Engineering and Automation, University College Cork, Intel Labs, Aalto-yliopisto, Aalto University
مصطلحات موضوعية: Atomic layer etching, Atomistic simulations, Density functional theory, First principles, Self-limiting reaction, Transistor contacts
وصف الملف: application/pdf
Relation: ACS applied materials & interfaces; Volume 12, issue 32; Kondati Natarajan , S , Nolan , M , Theofanis , P , Mokhtarzadeh , C & Clendenning , S B 2020 , ' Mechanism of Thermal Atomic Layer Etch of W Metal Using Sequential Oxidation and Chlorination : A First-Principles Study ' , ACS applied materials & interfaces , vol. 12 , no. 32 , pp. 36670-36680 . https://doi.org/10.1021/acsami.0c06628; PURE UUID: 8eb11d34-2de4-48c4-82b3-d591600123e8; PURE ITEMURL: https://research.aalto.fi/en/publications/8eb11d34-2de4-48c4-82b3-d591600123e8; PURE LINK: http://www.scopus.com/inward/record.url?scp=85089710402&partnerID=8YFLogxK; PURE FILEURL: https://research.aalto.fi/files/53474284/Natarajan_Mechanism_of_thermal_ACS.pdf; https://aaltodoc.aalto.fi/handle/123456789/61752; URN:NBN:fi:aalto-2020113020597