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1Conference
المؤلفون: A. Koschik, M. Ciappa, S. Holzer, W. Fichtner, Dapor, Maurizio
المساهمون: Michael T. Postek, Dale E. Newbury, S. Frank Platek, David C. Joy, A., Koschik, M., Ciappa, S., Holzer, Dapor, Maurizio, W., Fichtner
مصطلحات موضوعية: critical dimension (CD) metrology, scanning electron microscopy (SEM), CD-SEM, Monte Carlo (MC) modeling, simulation
وصف الملف: STAMPA
Relation: info:eu-repo/semantics/altIdentifier/wos/WOS:000285720600019; ispartofbook:Proc. of SPIE; Scanning Microscopy 2010; volume:7729; firstpage:1; lastpage:12; serie:PROCEEDINGS OF SPIE, THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING; http://hdl.handle.net/11572/84197; info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-77954489749
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2Conference
المساهمون: Michael T. Postek, Dale E. Newbury, S. Frank Platek, David C. Joy, Alexander, Koschik, Mauro, Ciappa, Stephan, Holzer, Dapor, Maurizio, Wolfgang, Fichtner
مصطلحات موضوعية: critical dimension (CD) metrology, scanning electron microscopy (SEM), CD-SEM, Monte Carlo (MC) modeling, simulation
Relation: ispartofbook:Proceedings of SPIE - The International Society for Optical Engineering; Scanning Microscopy 2010; volume:7729; numberofpages:12; journal:PROCEEDINGS OF SPIE, THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING; http://hdl.handle.net/11582/9888