المؤلفون: Chun-Yi Chou (2163553), Wei-Hao Lee (6116111), Chih-Piao Chuu (8681073), Tse-An Chen (2172658), Cheng-Hung Hou (8719197), Yu-Tung Yin (2106286), Ting-Yun Wang (837165), Jing-Jong Shyue (1509907), Lain-Jong Li (1344654), Miin-Jang Chen (1397377)

مصطلحات موضوعية: Biochemistry, Medicine, Biotechnology, Evolutionary Biology, Ecology, Cancer, Infectious Diseases, Computational Biology, Space Science, Chemical Sciences not elsewhere classified, layer deposition, Inhibitor-Free Area-Selective Atomi., Atomic Layer Nucleation Engineering, dielectric, inhibitor-free AS-ALD, binding energy, high-selectivity AS-ALD, Pt, Al 2 O 3, ALD cycle, film growth, thickness differences, ALNE, semiconductor device, novel concept, Nitride Area-selective, radio-frequency substrate bias, precursor exposure, layer nucleation engineering, metal surfaces

Relation: https://figshare.com/articles/journal_contribution/Atomic_Layer_Nucleation_Engineering_Inhibitor-Free_Area-Selective_Atomic_Layer_Deposition_of_Oxide_and_Nitride/14935450

الاتاحة: https://doi.org/10.1021/acs.chemmater.1c00823.s001

المؤلفون: Chun-Yuan Wang (1499881), Chin-I Wang (8676417), Sheng-Han Yi (10573292), Teng-Jan Chang (8676420), Chun-Yi Chou (2163553), Yu-Tung Yin (2106286), Hsin-Chih Lin (6116120), Miin-Jang Chen (1397377)

مصطلحات موضوعية: Medicine, Biotechnology, Developmental Biology, Computational Biology, Space Science, Chemical Sciences not elsewhere classified, Physical Sciences not elsewhere classified, nanobeam electron diffraction, ZrO 2, film, back-end-of-line process integration, dielectric properties, ZrO 2 Tailoring, X-ray photoelectron spectroscopy, paraelectric-to-antiferroelectric p., nanoscale TiN layer, TiO x N y, strain

Relation: https://figshare.com/articles/journal_contribution/Impact_of_a_TiN_Capping_Layer_on_Phase_Transformation_and_Capacitance_Enhancement_in_ZrO_sub_2_sub_/14388602

الاتاحة: https://doi.org/10.1021/acsaelm.1c00161.s001