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1Academic Journal
المؤلفون: Güneş, Mehmet, Cansever, Hamza, Yılmaz, Gökhan, Sagban, Muzaffer H., Smirnov, Vladimir, Finger, Friedhelm, Brueggemann, Rudolf
المساهمون: MÜ, Fen Fakültesi, Fizik Bölümü, Güneş, Mehmet, Cansever, Hamza, Yılmaz, Gökhan
مصطلحات موضوعية: Microcrystalline silicon films
وصف الملف: application/pdf
Relation: Canadian Journal of Physics; Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı; https://doi.org/10.1139/cjp-2013-0630; https://hdl.handle.net/20.500.12809/3442; 92; 7-8; 768; 773
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2Conference
المؤلفون: Kervran, Y., Kandoussi, K., Dong, H., Janfaoui, S., Coulon, N., Simon, C., Jacques, E., Mohammed-Brahim, T.
المساهمون: Institut d'Électronique et des Technologies du numéRique (IETR), Université de Nantes (UN)-Université de Rennes (UR)-Institut National des Sciences Appliquées - Rennes (INSA Rennes), Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-CentraleSupélec-Centre National de la Recherche Scientifique (CNRS)
المصدر: Symposium on Thin Film Transistors 13, TFT 2016 - PRiME 2016/230th ECS Meeting ; https://univ-rennes.hal.science/hal-01397913 ; Symposium on Thin Film Transistors 13, TFT 2016 - PRiME 2016/230th ECS Meeting, Oct 2016, Honolulu, United States. pp.13--25, ⟨10.1149/07510.0013ecst⟩
مصطلحات موضوعية: Flexible electronics, Metallic films, Microcrystalline silicon, Silicon, Temperature, Thick films, Thin film circuits, Thin films, Low temperatures, Microcrystalline silicon films, Plastic substrates, Reproducibilities, Silicon films, Silicon-based, Thin film transistors, [INFO.INFO-NI]Computer Science [cs]/Networking and Internet Architecture [cs.NI], [SPI.TRON]Engineering Sciences [physics]/Electronics
جغرافية الموضوع: Honolulu, United States
Relation: hal-01397913; https://univ-rennes.hal.science/hal-01397913
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3Report
المؤلفون: Liao XB, Sheng SR, Yun F, Ma ZX, Kong GL, Zhao YW, He SQ, Li ZM, Liao XB CHINESE ACAD SCIINST SEMICONDSTATE LAB SURFACE PHYSBEIJING 100083PEOPLES R CHINA.
مصطلحات موضوعية: Microcrystalline Silicon Films, Tandem Solar Cells, Pecvd, 半导体材料
Relation: SOLAR ENERGY MATERIALS AND SOLAR CELLS; Liao XB; Sheng SR; Yun F; Ma ZX; Kong GL; Zhao YW; He SQ; Li ZM .Microcrystalline silicon films and tandem solar cells prepared by triode PECVD ,SOLAR ENERGY MATERIALS AND SOLAR CELLS,1997,49(0):171-177; http://ir.semi.ac.cn/handle/172111/15117
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4
المؤلفون: CanseverHamza, SmirnovVladimir, BrüggemannRudolf, GünesMehmet, H SagbanMuzaffer, FingerFriedhelm, YilmazGökhan
المساهمون: MÜ, Fen Fakültesi, Fizik Bölümü, Güneş, Mehmet, Cansever, Hamza, Yılmaz, Gökhan
مصطلحات موضوعية: Physics, Steady state, Silicon, Absorption spectroscopy, Photoconductivity, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Semimetal, chemistry, Electrical resistivity and conductivity, Metastability, Microcrystalline silicon films, sense organs, Thin film
وصف الملف: application/pdf
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5Academic Journal
المؤلفون: Zheng, Jie, Yang, Rong, Xie, Lei, Qu, Jianglan, Liu, Yang, Li, Xingguo
المساهمون: Li, XG (reprint author), Peking Univ, Coll Chem & Mol Engn, State Key Lab Rare Earth Mat Chem & Applicat, Beijing Natl Lab Mol Sci, Beijing 100871, Peoples R China., Peking Univ, Coll Chem & Mol Engn, State Key Lab Rare Earth Mat Chem & Applicat, Beijing Natl Lab Mol Sci, Beijing 100871, Peoples R China.
المصدر: PubMed ; SCI
مصطلحات موضوعية: CHEMICAL-VAPOR-DEPOSITION, WALLED CARBON NANOTUBES, HYDROGEN STORAGE PROPERTIES, INDUCTIVELY-COUPLED PLASMA, LOW-TEMPERATURE GROWTH, IRON-NITRIDE FILMS, MICROCRYSTALLINE SILICON FILMS, ENHANCED FIELD-EMISSION, HIGH-YIELD GROWTH, SNO2 THIN-FILMS
Relation: ADVANCED MATERIALS.2010,22,(13),1451-1473.; 670048; http://hdl.handle.net/20.500.11897/150117; WOS:000276737700003
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6Academic Journal
المؤلفون: Hu, SW, Kim, J, Tarakeshwar, P, Kim, KS
المساهمون: 화학과, 10051563, Kim, KS
مصطلحات موضوعية: CHEMICAL-VAPOR-DEPOSITION, HYDROGENATED AMORPHOUS-SILICON, DOPED MICROCRYSTALLINE SILICON, FUNCTION COUNTERPOISE METHOD, BOND-DISSOCIATION ENERGIES, HOT-WIRE CVD, SI-H FILMS, AB-INITIO, THERMODYNAMIC ENERGIES, VIBRATIONAL-SPECTRA, MICROCRYSTALLINE SILICON FILMS, AMORPHOUS-SILICON, LOW-TEMPERATURE, WATER HEXAMER, BASIS-SETS
Relation: JOURNAL OF PHYSICAL CHEMISTRY A; 106; 29; 6817; 6822; SCI급, SCOPUS 등재논문; SCI; Chemistry, Physical; Physics, Atomic, Molecular & Chemical; Chemistry; Physics; 2002-OAK-0000002793; https://oasis.postech.ac.kr/handle/2014.oak/18975; 2867; JOURNAL OF PHYSICAL CHEMISTRY A, v.106, no.29, pp.6817 - 6822; 000176956300018; 2-s2.0-0037173836
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المؤلفون: Giovanni Bruno, Caterina Summonte, Maria Losurdo, Rita Rizzoli, G. Cicala, Pio Capezzuto
المصدر: Journal of applied physics 88 (2000): 2408–2414. doi:10.1063/1.1287129
info:cnr-pdr/source/autori:Losurdo M.1, Rizzoli R.2, Summonte C.2, Cicala G.1, Capezzuto P.3, Bruno G.1/titolo:Anatomy of mc-Si thin films by plasma enhanced chemical vapor deposition: An investigation by spectroscopic ellipsometry/doi:10.1063%2F1.1287129/rivista:Journal of applied physics/anno:2000/pagina_da:2408/pagina_a:2414/intervallo_pagine:2408–2414/volume:88
Scopus-Elsevierمصطلحات موضوعية: Materials science, AMORPHOUS-SILICON, Layer by layer, General Physics and Astronomy, Chemical vapor deposition, Anatomy, Combustion chemical vapor deposition, OPTICALPROPERTIES, Amorphous solid, MICROCRYSTALLINE SILICON FILMS, Carbon film, Plasma-enhanced chemical vapor deposition, LOW-TEMPERATURE, GROWTH, Thin film, Layer (electronics)
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المؤلفون: 彭逸軒, Peng,, I-Hsuan
المساهمون: 吳泰伯, 劉柏村, Wu, Tai-Bor, Liu, Po-Tsun
مصطلحات موضوعية: 撓曲性, 金屬基板, 直接沉積多晶矽薄膜, flexible, metal foil substrate, directly deposition microcrystalline silicon films
Time: 3
وصف الملف: 155 bytes; text/html
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