المؤلفون: Brian Rice, Michael Liehr, Michael Tittnich, Richard Brilla, Warren Monttomery

المصدر: Journal of Photopolymer Science and Technology. 2011, 24(2):193

المؤلفون: Warren Montgomery, Michael Liehr, Jun Sung Chun, Michael Tittnich

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Engineering, Resist, business.industry, Center of excellence, Extreme ultraviolet lithography, Extreme ultraviolet, Qualification testing, Nanoscale science and engineering, Nanotechnology, Full field, business, Lithography, Manufacturing engineering

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ab71301fd63d18e2e66661bb35b5ed89
https://doi.org/10.1117/12.2175733

المؤلفون: Christian Wagner, Sjoerd Lok, Bart Kessels, Edwin Boon, Hans Meiling, James Ryan, Olav Waldemar Vladimir Frijns, Kevin Cummings, Kurt G. Ronse, John Zimmerman, Andre van Dijk, Mieke Goethals, Bas Hultermans, Nico Buzing, Bill Pierson, Emil Smitt-Weaver, Martin Lowisch, Michael Tittnich, Noreen Harned, Roel De Jonge, Judy Galloway, Joerg Mallman, Peter Kürz

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Optics, Resist, business.industry, law, Computer science, Extreme ultraviolet, Extreme ultraviolet lithography, Full field, Photolithography, business, Lithography, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b2929329cd98d57f84a83b9fa6cfa415
https://doi.org/10.1117/12.773259

المؤلفون: Harm-Jan Voorma, Uwe Mickan, Sjoerd Lok, Martin Lowisch, Noreen Harned, John Zimmerman, Mieke Goethals, Hans Meiling, Kurt G. Ronse, Michael Tittnich, Peter Kuerz, James Ryan, Rogier Herman Mathijs Groeneveld, Henk Meijer

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Alpha (programming language), Resist, law, Computer science, Extreme ultraviolet lithography, Extreme ultraviolet, Systems engineering, Reticle, Nanotechnology, Photolithography, Contact print, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::28d1dfc7d3471a4ae91cc44abf367ea8
https://doi.org/10.1117/12.712065

المؤلفون: B. La Fontaine, Greg Denbeaux, Dario L. Goldfarb, Michael Tittnich, Tom Wallow, Robert L. Brainard, Yayi Wei, Warren Montgomery, Jeff Mackey, Patrick P. Naulleau, Sven Trogisch, Uzodinma Okoroanyanwu, Chiew-seng Koay, Frank Goodwin, D. Back, Kurt R. Kimmel, Obert R. Wood, Bill Pierson, John G. Hartley, Karen Petrillo, Brian Martinick

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Engineering, Scanner, business.industry, Extreme ultraviolet lithography, Nanotechnology, Design for manufacturability, law.invention, Nanolithography, Resist, law, Reticle, Systems engineering, Photolithography, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::342fba540ad5fe2cdcd4520c15f8e90b
https://doi.org/10.1117/12.714016

المؤلفون: Frank Goodwin, John G. Hartley, Yayi Wei, Richard T. Housley, Kevin Cummings, Peter A. Benson, Brian Martinick, Michael Tittnich, Karen Petrillo, Christopher F. Robinson, Dan Corliss, Uzodinma Okoroanyanwu, Christian Schwarz, Stefan Brandl, David Back, Greg Denbeaux, Harry J. Levinson, Dario Gil

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Microprocessor, Engineering, business.industry, law, Electrical engineering, Full field, IBM, business, Lithography, Immersion lithography, Manufacturing engineering, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4d7441747c5f597d8de9c65afb2d4db1
https://doi.org/10.1117/12.663785