المؤلفون: Benjamin L. Ervin, Richard P. Kingsborough, Michael Sworin, Mordechai Rothschild, Michael Switkes

المصدر: Sensors and Actuators B: Chemical. 160:1244-1249

مصطلحات موضوعية: Remote detection, Chemistry, Materials Chemistry, Metals and Alloys, Laser illumination, Electrical and Electronic Engineering, Contamination, Condensed Matter Physics, Instrumentation, Retroreflector, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Remote sensing

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8e275bd306a3b573042c0c123c4c8c5b
https://doi.org/10.1016/j.snb.2011.09.057

المؤلفون: T M Lyszczarz, M W Geis, T H Fedynyshyn, Michael Switkes, Steven J. Spector, Charles M. Wynn, R R Kunz, Mordechai Rothschild

المصدر: Nanotechnology. 15:86-91

مصطلحات موضوعية: Materials science, Chipset, Mechanical Engineering, Bioengineering, Nanotechnology, Self-assembled monolayer, General Chemistry, Chip, law.invention, Surface micromachining, Mechanics of Materials, law, General Materials Science, Electrical and Electronic Engineering, Photolithography, Electrical conductor, Nanoscopic scale, Flip chip

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::40524bf995e70b6e4a36ed41b0c2bd7e
https://doi.org/10.1088/0957-4484/15/1/017

المؤلفون: Kevin J. Orvek, Michael Switkes, Theodore M. Bloomstein, William A. Mowers, Roger F. Sinta, Vladimir Liberman, Mordechai Rothschild, Theodore H. Fedynyshyn, Andrew Grenville

المصدر: Journal of Fluorine Chemistry. 122:3-10

مصطلحات موضوعية: business.industry, Chemistry, Organic Chemistry, Nanotechnology, Laser, Biochemistry, law.invention, Inorganic Chemistry, Semiconductor, Resist, law, Environmental Chemistry, Microelectronics, Physical and Theoretical Chemistry, Photolithography, business, Lithography, Immersion lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::81ff571969eb8f026e733bf97253886a
https://doi.org/10.1016/s0022-1139(03)00074-5

المؤلفون: Theodore H. Fedynyshyn, Roderick R. Kunz, Theodore M. Bloomstein, Michael Switkes, Allen Keith Bates, Mordechai Rothschild, Vladimir Liberman

المصدر: IBM Journal of Research and Development. 45:605-614

مصطلحات موضوعية: Materials science, General Computer Science, Computational lithography, Nanotechnology, Lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d0121eff573009fcda690f042c43e1dc
https://doi.org/10.1147/rd.455.0605

المؤلفون: Vladimir Liberman, Roderick R. Kunz, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Mordechai Rothschild, Michael Switkes

المصدر: Journal of Photopolymer Science and Technology. 13:369-372

مصطلحات موضوعية: Materials science, Polymers and Plastics, Resist, law, Optical materials, Organic Chemistry, Materials Chemistry, Nanotechnology, Photoresist, Photolithography, Lithography, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e022f4f999e950188edc9c471ac5d3d7
https://doi.org/10.2494/photopolymer.13.369

المؤلفون: Michael Switkes, Theodore M. Bloomstein, Mordechai Rothschild

المصدر: Applied Physics Letters. 77:3149-3151

مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), business.industry, Extreme ultraviolet lithography, Interference lithography, Optics, Resist, Multiple patterning, Optoelectronics, X-ray lithography, business, Lithography, Immersion lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::481c7952818abf4b2a9ace7941979fef
https://doi.org/10.1063/1.1326490

المؤلفون: Hema Viswanath, Catherine Cabrera, Walter Zukas, James Harper, Theodore M. Lyszczarz, Michael Sennett, Mordechai Rothschild, Roderick R. Kunz, Lalitha Parameswaran, Michael Switkes

المصدر: ACS Symposium Series ISBN: 9780841269811
Nanoscience and Nanotechnology for Chemical and Biological Defense

مصطلحات موضوعية: Engineering, business.industry, Nanotechnology, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::293d70084406cf202b5816f86746419d
https://doi.org/10.1021/bk-2009-1016.ch002

المؤلفون: D. E. Hardy, Vladimir Liberman, Andrew Grenville, Michael Switkes, Jan H. C. Sedlacek, Stephen T. Palmacci, Mordechai Rothschild

المصدر: Optical Microlithography XVIII.

مصطلحات موضوعية: Materials science, business.industry, Laser, law.invention, Lens (optics), Optics, Optical coating, law, Ultrapure water, Surface roughness, Optoelectronics, Water treatment, Irradiation, Thin film, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b0e2499e34816abf775f6205f85c5b35
https://doi.org/10.1117/12.601468

المؤلفون: Theodore M. Bloomstein, Michael Switkes, E. W. Arriola, T. H. Morrison, Mordechai Rothschild

المصدر: Optical Microlithography XVIII.

مصطلحات موضوعية: Engineering, business.industry, law.invention, Numerical aperture, Lens (optics), Interferometry, Optics, law, Astronomical interferometer, Actuator, business, Lithography, Immersion lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d78d4e01a7636088fba0a2b698b4533e
https://doi.org/10.1117/12.602585

المؤلفون: Theodore M. Bloomstein, Michael Switkes, Michael S. Yeung, Roderick R. Kunz, Jeffrey W. Ruberti, Mordechai Rothschild, Timothy A. Shedd

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Scattering, business.industry, Bubble, Laser, Molecular physics, law.invention, Physics::Fluid Dynamics, symbols.namesake, Outgassing, Optics, Resist, law, symbols, Rayleigh scattering, business, Raman scattering, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bc419cc4bdd6d58a3d1f9f637cef70c8
https://doi.org/10.1117/12.534194

المؤلفون: R. Nagarajan, Walter Zukas, T. Alan Hatton, Stephen Lee, Charles A. Bass, Catherine Cabrera, James Harper, Roderick Kunz, Theodore Lyszczarz, Lalitha Parameswaran, Mordechai Rothschild, Michael Sennett, Michael Switkes, Hema Viswanath, Gossett Campbell, David Maraldo, Raj Mutharasan, Minoo Naebe, Tong Lin, Lianfang Feng, Liming Dai, Alexis Abramson, Vikas Prakash, Xungia Wang, Pornnipa Vichchulada, Deepa Vairavapandian, Marcus D. Lay, Letha J. Sooter, Dimitra N. Stratis-Cullum, Yanting Zhang, Jeffrey J. Rice, John T. Ballew, Hyongsok T. Soh, Patrick S. Daugherty, Paul Pellegrino, Nancy Stagliano, Yuehe Lin, Jun Wang, Guodong Liu, Charles Timchalk, J. D. Driskell, S. Shanmukh, Y. Liu, S. Chaney, S. Hennigan, L. Jones, D. Krause, R. A. Tripp, Y.-P. Zhao, R. A. Dluhy, Paresh Chandra Ray, Gopala Krishna Darbha, Oleg Tovmachenko, Uma Shanker Rai, Jelani Griffin, William Hardy, Ana Balarezo, Michael L. Ramirez, Leonardo C. Pacheco, Marcos A. Barreto, Samuel P. Hernández-Rivera, Amy Szuchmacher Blum, Carissa M. Soto, Gary J. Vora, Kim E. Sapsford, Banahall

Resource Type: eBook.

الموضوعات: Nanotechnology--Congresses, Biotechnology--Congresses, Chemical detectors--Congresses, Chemical warfare--Safety measures.--United Sta, Biological warfare--Safety measures.--United S

Categories: TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS, SCIENCE / Nanoscience, TECHNOLOGY & ENGINEERING / Chemical & Biochemical

المؤلفون: Eytan Barouch, Michael S. Yeung, Michael Switkes, Daniel C. Cole, So-Yeon Baek, Mordechai Rothschild

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Mechanical Engineering, Extreme ultraviolet lithography, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, law.invention, Numerical aperture, Optics, law, Phase-shift mask, Process window, X-ray lithography, Electrical and Electronic Engineering, Photolithography, business, Refractive index, Lithography, Next-generation lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::80a00cf83d4b04099d1156b65193b951
https://doi.org/10.1117/12.504600

المؤلفون: Roger F. Sinta, Paula M. Gallagher-Wetmore, Michael Switkes, Roderick R. Kunz, Val J. Krukonis, Kara Williams, Mordechai Rothschild

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Absorbance, Materials science, Resist, medicine, Analytical chemistry, medicine.disease_cause, Lithography, Dissolution, Supercritical fluid, Immersion lithography, Surface energy, Ultraviolet

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::92f2cfcfc29ef27d3ed2cbf10cd2a806
https://doi.org/10.1117/12.485329

المؤلفون: Michael Switkes, Cheng-fu Chen, Alexander C. Wei, G.F. Nellis, Amr Y. Abdo, Mordechai Rothschild, Roxann L. Engelstad

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Microfluidics, Computational fluid dynamics, Computer Science::Other, law.invention, Physics::Fluid Dynamics, Lens (optics), Optics, law, Fluid dynamics, Deposition (phase transition), Wafer, Photolithography, business, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a1b55cc84476e9f336b1466ebddf689c
https://doi.org/10.1117/12.497495

المؤلفون: Michael Switkes, Mordechai Rothschild

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, law.invention, Interference lithography, Optics, law, Optoelectronics, Stencil lithography, X-ray lithography, Photolithography, business, Lithography, Next-generation lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4bd0f009613a9b0b61f88f8d5a323a63
https://doi.org/10.1117/12.474568

المؤلفون: Michael Switkes, Theodore M. Bloomstein, Mordechai Rothschild

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Interference lithography, law.invention, Optics, Resist, law, Optoelectronics, X-ray lithography, Photolithography, business, Lithography, Next-generation lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2caf4efde479b772e68e0e84e85875e5
https://doi.org/10.1117/12.389007

المؤلفون: Lithography So-Yeon Baek, So-yeon Baek A, Daniel C. Cole A, Mordechai Rothschild B, Michael Switkes B, Michael S. Yeung A

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.bu.edu/simulation/publications/dcole/PDF/JMMMLiquidImmersionFirst.pdf.

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.4.1294; http://www.bu.edu/simulation/publications/dcole/PDF/JMMMLiquidImmersionFirst.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.4.1294
http://www.bu.edu/simulation/publications/dcole/PDF/JMMMLiquidImmersionFirst.pdf

المؤلفون: Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes, Nikolay N. Efremow, Stephen T. Palmacci, Jan H. C. Sedlacek, Dennis E. Hardy, Andrew Grenville

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.ll.mit.edu/news/journal/pdf/vol14_no2/14_2recenttrendsop.pdf.

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.67.6381; http://www.ll.mit.edu/news/journal/pdf/vol14_no2/14_2recenttrendsop.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.67.6381
http://www.ll.mit.edu/news/journal/pdf/vol14_no2/14_2recenttrendsop.pdf

المؤلفون: So-yeon Baek A, Er Wei B, Daniel C. Cole A, Greg Nellis B, Michael S. Yeung A, Amr Abdo B, Roxann Engelstad B, Mordechai Rothschild C, Michael Switkes C

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.bu.edu/simulation/publications/dcole/PDF/JMMMLiquidImmersionSecond.pdf.

مصطلحات موضوعية: Optical lithography, liquid immersion, simulation, high NA1. INTRODUCTION

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.216.8428; http://www.bu.edu/simulation/publications/dcole/PDF/JMMMLiquidImmersionSecond.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.216.8428
http://www.bu.edu/simulation/publications/dcole/PDF/JMMMLiquidImmersionSecond.pdf

المؤلفون: So-Yeon Baek, Michael S. Yeung, Amr Abdo, Alexander C. Wei, Michael Switkes, Daniel C. Cole, Mordechai Rothschild, Roxann L. Engelstad, Gregory F. Nellis

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS. 4:013002

مصطلحات موضوعية: Materials science, business.industry, Mechanical Engineering, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Die (integrated circuit), Electronic, Optical and Magnetic Materials, law.invention, Physics::Fluid Dynamics, Lens (optics), Nanolithography, Optics, law, Fluid dynamics, Wafer, Electrical and Electronic Engineering, Photolithography, business, Refractive index, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fd749c707afbec14d6d033eba6b5ba11
https://doi.org/10.1117/1.1858331