المؤلفون: Masahide KAWANO, Masaji YOSHIDA, Muneaki MATSUDA, Nobuyasu SEIKE, Tadaaki WAKIMOTO

المصدر: Journal of Environmental Chemistry. 2001, 11(3):455

المؤلفون: Masaji YOSHIDA, Tomoko YAMADA, 吉田 正二, 山田 智子

المصدر: 日本建築学会計画系論文集 / Journal of Architecture and Planning (Transactions of AIJ). 2011, 76(663):1037

المؤلفون: Masaji YOSHIDA, 吉田 正二

المصدر: 日本建築学会計画系論文集 / Journal of Architecture and Planning (Transactions of AIJ). 2010, 75(657):2747

المؤلفون: Masaji YOSHIDA, 吉田 正二

المصدر: 日本建築学会計画系論文集 / Journal of Architecture and Planning (Transactions of AIJ). 1999, 64(520):247

المؤلفون: Masaji YOSHIDA, 吉田 正二

المصدر: 日本建築学会技術報告集 / AIJ Journal of Technology and Design. 1999, 5(8):207

المؤلفون: Abdullah al-Hadrami, Akihiro Seita, Hiroshi Sato, Kenji Yokoi, Masaji Yoshida, Reiko Otsubo, Tomoko Kobayashi, ハドラミー アブダッラー, 佐藤 寛, 吉田 正二, 大坪 玲子, 小林 朋子, 横井 健二, 清田 明宏

المصدر: 住宅総合研究財団研究年報 / HOUSING RESEARCH FOUNDATION ANNUAL REPORT. 1999, 25:13

المؤلفون: Hidemi Shiga, Jian Cai Xie, Katsuhiko Yashiro, Masaji Yoshida, Qi Wei Gu, Yoshitaka Akui, 八代 克彦, 吉田 正二, 滋賀 秀実, 解 建才, 阿久井 喜孝, 顧 奇偉

المصدر: 住宅総合研究財団研究年報 / HOUSING RESEARCH FOUNDATION ANNUAL REPORT. 1996, 22:123

المؤلفون: Masaji YOSHIDA, 吉田 正二

المصدر: 日本建築学会計画系論文集 / Journal of Architecture and Planning (Transactions of AIJ). 1997, 62(500):185

المؤلفون: Masaji Yoshida

الاتاحة: http://data.europeana.eu/aggregation/europeana/91643/SMVK_OM_objekt_108783

المؤلفون: Shozo Nishimoto, Shintaro Yamamichi, Toshihiro Iizuka, Masaji Yoshida, Shuji Sone, Hisato Yabuta, Yoshitake Kato, Koji Arita, H. Yamaguchi

المصدر: Journal of Electroceramics. 3:123-133

مصطلحات موضوعية: Dynamic random-access memory, Materials science, business.industry, chemistry.chemical_element, Chemical vapor deposition, Dielectric, Condensed Matter Physics, Electron cyclotron resonance, Electronic, Optical and Magnetic Materials, law.invention, Capacitor, chemistry.chemical_compound, chemistry, Mechanics of Materials, law, Materials Chemistry, Ceramics and Composites, Strontium titanate, Optoelectronics, Electrical and Electronic Engineering, business, Tin, Ceramic capacitor

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1c79c7778156525601dbd2aa70fa5b13
https://doi.org/10.1023/a:1009938909239

المؤلفون: Yoshitake Kato, Masaji Yoshida, Ken Tokashiki, K. Nakajima, Yoichi Miyasaka, Hisato Yabuta, K. Sato, Shintaro Yamamichi, Haruhiko Ono, H. Yamaguchi, Yoshihiro Hayashi, S. Ohnishi, Shuji Sone, Koichi Takemura, T. Tamura, Pierre-Yves Lesaicherre

المصدر: IEEE Transactions on Electron Devices. 44:1076-1083

مصطلحات موضوعية: Materials science, Silicon, Annealing (metallurgy), Analytical chemistry, chemistry.chemical_element, Capacitance, Electronic, Optical and Magnetic Materials, chemistry, Electrode, Metalorganic vapour phase epitaxy, Electrical and Electronic Engineering, Reactive-ion etching, Thin film, Tin

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c7d988366d0030e2956de4c34f953b57
https://doi.org/10.1109/16.595934

المؤلفون: Ken Tokashiki, Koichi Takemura, Haruhiko Ono, Shintaro Yamamichi, Masaji Yoshida, Yoichi Miyasaka, H. Yamaguchi, Pierre-Yves Lesaicherre

المصدر: Integrated Ferroelectrics. 11:81-100

مصطلحات موضوعية: Permittivity, Materials science, business.industry, chemistry.chemical_element, Substrate (electronics), Condensed Matter Physics, Electronic, Optical and Magnetic Materials, law.invention, Capacitor, chemistry, Control and Systems Engineering, law, Electrode, Materials Chemistry, Ceramics and Composites, Optoelectronics, Electrical and Electronic Engineering, Reactive-ion etching, Thin film, Tin, business, Dram

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::65f66e239f2b30b6738c3d848d8b3c2e
https://doi.org/10.1080/10584589508013581

المؤلفون: Hirohito Watanabe, H. Yamaguchi, Haruhiko Ono, Pierre-Yves Lesaicherre, Yoichi Miyasaka, Masaji Yoshida

المصدر: Integrated Ferroelectrics. 8:201-225

مصطلحات موضوعية: Materials science, business.industry, Substrate (electronics), Dielectric, Condensed Matter Physics, Microstructure, Electronic, Optical and Magnetic Materials, law.invention, Capacitor, Carbon film, Control and Systems Engineering, law, Materials Chemistry, Ceramics and Composites, Deposition (phase transition), Optoelectronics, Metalorganic vapour phase epitaxy, Electrical and Electronic Engineering, Thin film, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b8ff3b47a35076ec09b38f119243b863
https://doi.org/10.1080/10584589508012313

المؤلفون: Toshiyuki Sakuma, Hiromu Yamaguchi, Pierre-Yves Lesaicherre, Akihiko Ishitani, Yoichi Miyasaka, Masaji Yoshida

المصدر: Journal of The Electrochemical Society. 142:244-248

مصطلحات موضوعية: Renewable Energy, Sustainability and the Environment, Annealing (metallurgy), Analytical chemistry, Mineralogy, Chemical vapor deposition, Crystal structure, Dielectric, Condensed Matter Physics, Electron cyclotron resonance, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, Plasma-enhanced chemical vapor deposition, Materials Chemistry, Electrochemistry, Strontium titanate, Thin film

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3aec6d93fa3802cf44a9b46f0a4a6e5f
https://doi.org/10.1149/1.2043883

المؤلفون: Sigenori Yuhya, D. J. Baar, Yuh Shiohara, Masaji Yoshida, Tsunemi Sugimoto, Shouji Tanaka

المصدر: Journal of Applied Physics. 70:1600-1605

مصطلحات موضوعية: High-temperature superconductivity, Chemistry, Film plane, Analytical chemistry, General Physics and Astronomy, Mineralogy, Chemical vapor deposition, Combustion chemical vapor deposition, law.invention, Electrical resistivity and conductivity, law, Phase (matter), Deposition (phase transition), Thin film

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::389e11b3b38fd17332787c52f21337e0
https://doi.org/10.1063/1.349524

المؤلفون: Sone, Shuji, Yabuta, Hisato, Kato, Yoshitake, Iizuka, Toshihiro, Yamamichi, Shintaro, Yamaguchi, Hiromu, Lesaicherre, Pierre-Yves, Nishimoto, Shozo, Masaji Yoshida, Masaji Yoshida

المصدر: Japanese Journal of Applied Physics ; volume 35, issue 9S, page 5089 ; ISSN 0021-4922 1347-4065

الاتاحة: http://dx.doi.org/10.1143/jjap.35.5089
https://iopscience.iop.org/article/10.1143/JJAP.35.5089
https://iopscience.iop.org/article/10.1143/JJAP.35.5089/pdf

المؤلفون: Takemura, Koichi, Yamamichi, Shintaro, Lesaicherre, Pierre-Yves, Tokashiki, Ken, Miyamoto, Hidenobu, Ono, Haruhiko, Miyasaka, Yoichi, Masaji Yoshida, Masaji Yoshida

المصدر: Japanese Journal of Applied Physics ; volume 34, issue 9S, page 5224 ; ISSN 0021-4922 1347-4065

الاتاحة: http://dx.doi.org/10.1143/jjap.34.5224
https://iopscience.iop.org/article/10.1143/JJAP.34.5224
https://iopscience.iop.org/article/10.1143/JJAP.34.5224/pdf

المؤلفون: Yamaguchi, Hiromu, Lesaicherre, Pierre-Yves, Sakuma, Toshiyuki, Miyasaka, Yoichi, Ishitani, Akihiko, Masaji Yoshida, Masaji Yoshida

المصدر: Japanese Journal of Applied Physics ; volume 32, issue 9S, page 4069 ; ISSN 0021-4922 1347-4065

الاتاحة: http://dx.doi.org/10.1143/jjap.32.4069
https://iopscience.iop.org/article/10.1143/JJAP.32.4069
https://iopscience.iop.org/article/10.1143/JJAP.32.4069/pdf

المؤلفون: Tsunemi Sugimoto, Kazushi Sugawara, Masaji Yoshida, Shoji Tanaka, Yuh Shiohara

المصدر: Applied Physics Letters. 58:1103-1105

مصطلحات موضوعية: Surface coating, Lattice constant, Materials science, Physics and Astronomy (miscellaneous), Phase (matter), X-ray crystallography, Analytical chemistry, Mineralogy, Deposition (phase transition), Crystal growth, Chemical vapor deposition, Thin film

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6ae0bdd8f65d3953f9220efeadc86fc6
https://doi.org/10.1063/1.104385

المؤلفون: Masaji Yoshida, Hisato Yabuta, Shuji Sone, Reiko Akahane, Shintaro Yamamichi, Yoshitake Kato, Koji Arita

المصدر: Extended Abstracts of the 1998 International Conference on Solid State Devices and Materials.

مصطلحات موضوعية: Materials science, business.industry, Electrode, Optoelectronics, Nanotechnology, Plasma, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1b0f9da0648901ba4d8422ca0526fb45
https://doi.org/10.7567/ssdm.1998.b-2-3