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1Academic Journal
المؤلفون: Tezsevin, I., Maas, J.F.W., Merkx, M.J.M., Lengers, R., Kessels, W.M.M., Sandoval, T.E., Mackus, A.J.M.
المصدر: Tezsevin , I , Maas , J F W , Merkx , M J M , Lengers , R , Kessels , W M M , Sandoval , T E & Mackus , A J M 2023 , ' Computational investigation of precursor blocking during area-selective atomic layer deposition using aniline as a small molecule inhibitor ' , Langmuir , vol. 39 , no. 12 , pp. 4265-4273 . https://doi.org/10.1021/acs.langmuir.2c03214
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2Academic Journal
المؤلفون: Li, Jun, Tezsevin, I., Merkx, M.J.M., Maas, Joost F.W., Kessels, W.M.M., Sandoval, T.E., Mackus, A.J.M.
المصدر: Li , J , Tezsevin , I , Merkx , M J M , Maas , J F W , Kessels , W M M , Sandoval , T E & Mackus , A J M 2022 , ' Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations ' , Journal of Vacuum Science and Technology A , vol. 40 , no. 6 , 062409 . https://doi.org/10.1116/6.0002096
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3Academic Journal
المؤلفون: Vandalon, V., Mackus, A.J.M., Kessels, W.M.M.
المساهمون: Stichting voor de Technische Wetenschappen, Nederlandse Organisatie voor Wetenschappelijk Onderzoek
المصدر: The Journal of Physical Chemistry C ; volume 126, issue 5, page 2463-2474 ; ISSN 1932-7447 1932-7455
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4Academic Journal
المؤلفون: Vos, M.F.J., van Straaten, G., Kessels, W.M.M., Mackus, A.J.M.
المصدر: Vos , M F J , van Straaten , G , Kessels , W M M & Mackus , A J M 2018 , ' Atomic layer deposition of cobalt using H 2 -, N 2 -, and NH 3 -based plasmas : on the role of the Co-reactant ' , Journal of Physical Chemistry C , vol. 122 , no. 39 , pp. 22519-22529 . https://doi.org/10.1021/acs.jpcc.8b06342
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5Academic Journal
المؤلفون: Singh, J. (Joseph), Thissen, N.F.W., Kim, W.-H., Johnson, H., Kessels, W.M.M., Bol, A.A., Bent, S.F., Mackus, A.J.M.
المصدر: Singh , J , Thissen , N F W , Kim , W-H , Johnson , H , Kessels , W M M , Bol , A A , Bent , S F & Mackus , A J M 2018 , ' Area-selective atomic layer deposition of metal oxides on noble metals through catalytic oxygen activation ' , Chemistry of Materials , vol. 30 , no. 3 , pp. 663–670 . https://doi.org/10.1021/acs.chemmater.7b03818
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6Academic Journal
المؤلفون: Mameli, A., Merkx, M.J.M., Karasulu, B., Roozeboom, F., Kessels, W.M.M., MacKus, A.J.M.
المصدر: Mameli , A , Merkx , M J M , Karasulu , B , Roozeboom , F , Kessels , W M M & MacKus , A J M 2017 , ' Area-selective atomic layer deposition of SiO 2 using acetylacetone as a chemoselective inhibitor in an ABC-type cycle ' , ACS Nano , vol. 11 , no. 9 , pp. 9303-9311 . https://doi.org/10.1021/acsnano.7b04701
مصطلحات موضوعية: area-selective deposition, atomic layer deposition (ALD), chemoselective inhibition, density functional theory, nanomanufacturing, self-aligned fabrication, silicon oxide
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7Academic Journal
المؤلفون: Vos, M.F.J., Knoops, H.C.M., Synowicki, R.A., Kessels, W.M.M., Mackus, A.J.M.
المصدر: Vos , M F J , Knoops , H C M , Synowicki , R A , Kessels , W M M & Mackus , A J M 2017 , ' Atomic layer deposition of aluminum fluoride using Al(CH 3 ) 3 and SF 6 plasma ' , Applied Physics Letters , vol. 111 , no. 11 , 113105 . https://doi.org/10.1063/1.4998577
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8Academic Journal
المؤلفون: Thissen, N.F.W., Vervuurt, R.H.J., Mackus, A.J.M., Mulders, J.J.L., Weber, J.-W., Kessels, W.M.M., Bol, A.A.
المصدر: Thissen , N F W , Vervuurt , R H J , Mackus , A J M , Mulders , J J L , Weber , J-W , Kessels , W M M & Bol , A A 2017 , ' Graphene devices with bottom-up contacts by area-selective atomic layer deposition ' , 2D Materials , vol. 4 , no. 2 , 025046 . https://doi.org/10.1088/2053-1583/aa636a
مصطلحات موضوعية: Atomic layer deposition, Contact induced doping, Contact resistance, Coupling strength, Field-effect transistor, Graphene, Resist residue
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الاتاحة: https://research.tue.nl/en/publications/4237119b-394f-4562-8e40-8a34099a72c0
https://doi.org/10.1088/2053-1583/aa636a
https://pure.tue.nl/ws/files/62764290/Manuscript_NickThissen_Revised_R2.pdf
https://pure.tue.nl/ws/files/58254608/Thissen_2017_2D_Mater._4_025046.pdf
http://www.scopus.com/inward/record.url?scp=85020884673&partnerID=8YFLogxK -
9Academic Journal
المؤلفون: Mackus, A.J.M., Thissen, N.F.W., Mulders, J.J.L., Trompenaars, P.H.F., Chen, Z., Kessels, W.M.M., Bol, A.A.
المصدر: Mackus , A J M , Thissen , N F W , Mulders , J J L , Trompenaars , P H F , Chen , Z , Kessels , W M M & Bol , A A 2017 , ' Resist-free fabricated carbon nanotube field-effect transistors with high-quality atomic-layer-deposited platinum contacts ' , Applied Physics Letters , vol. 110 , no. 1 , 013101 , pp. 1-5 . https://doi.org/10.1063/1.4973359
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10Academic Journal
المؤلفون: Mameli, A., Kuang, Y., Aghaee, M., Ande, C.K., Karasulu, B., Creatore, M., Mackus, A.J.M., Kessels, W.M.M., Roozeboom, F.
المصدر: Mameli , A , Kuang , Y , Aghaee , M , Ande , C K , Karasulu , B , Creatore , M , Mackus , A J M , Kessels , W M M & Roozeboom , F 2017 , ' Area-selective atomic layer deposition of In 2 O 3 :H Using a μ-plasma printer for local area activation ' , Chemistry of Materials , vol. 29 , no. 3 , pp. 921-925 . https://doi.org/10.1021/acs.chemmater.6b04469
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11Academic Journal
المؤلفون: Mackus, A.J.M., Weber, M.J., Thissen, N.F.W., Garcia-Alonso Garcia, D., Vervuurt, R.H.J., Assali, S., Bol, A.A., Verheijen, M.A., Kessels, W.M.M.
المصدر: Mackus , A J M , Weber , M J , Thissen , N F W , Garcia-Alonso Garcia , D , Vervuurt , R H J , Assali , S , Bol , A A , Verheijen , M A & Kessels , W M M 2016 , ' Atomic layer deposition of Pd and Pt nanoparticles for catalysis : on the mechanisms of nanoparticle formation ' , Nanotechnology , vol. 27 , no. 3 , 034001 , pp. 1-13 . https://doi.org/10.1088/0957-4484/27/3/034001
مصطلحات موضوعية: atomic layer deposition, catalysis, nanoparticles, palladium, platinum, thin film, nanostructures
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12Academic Journal
المؤلفون: Leick, N., Weber, J.W., Mackus, A.J.M., Weber, M.J., van de Sanden, M.C.M., Kessels, W.M.M.
المصدر: Leick , N , Weber , J W , Mackus , A J M , Weber , M J , van de Sanden , M C M & Kessels , W M M 2016 , ' In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd ' , Journal of Physics D: Applied Physics , vol. 49 , no. 12 , 115504 . https://doi.org/10.1088/0022-3727/49/11/115504
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13Book
المؤلفون: Mackus, A.J.M.
المصدر: Mackus , A J M 2013 , ' Atomic layer deposition of platinum : from surface reactions to nanopatterning ' , Doctor of Philosophy , Applied Physics and Science Education , Eindhoven . https://doi.org/10.6100/IR754694
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Relation: https://research.tue.nl/en/publications/0257319a-3f78-4487-87fe-c91f8ce64244; urn:ISBN:978-90-386-3384-8
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14Academic Journal
المؤلفون: Thissen, N.F.W., Mackus, A.J.M., Kessels, W.M.M., Bol, A.A.
المصدر: Thissen , N F W , Mackus , A J M , Kessels , W M M & Bol , A A 2013 , ' Nanofabricage van koolstofnanobuistransistors met atoomlaagdepositie ' , Nevac Blad , vol. 51 , nr. 3 , blz. 10- .
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15Academic Journal
المؤلفون: Erkens, I.J.M., Mackus, A.J.M., Knoops, H.C.M., Smits, Paul H.M., Ven, van de, T.H.M., Roozeboom, F., Kessels, W.M.M.
المصدر: Erkens , I J M , Mackus , A J M , Knoops , H C M , Smits , P H M , Ven, van de , T H M , Roozeboom , F & Kessels , W M M 2012 , ' Mass spectrometry study of the temperature dependence of Pt film growth by atomic layer deposition ' , ECS Journal of Solid State Science and Technology , vol. 1 , no. 6 , pp. 255-262 . https://doi.org/10.1149/2.006206jss
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16Academic Journal
المؤلفون: Dielissen, S.A.F., Mackus, A.J.M., Mulders, J.J.L., Kessels, W.M.M.
المصدر: Dielissen , S A F , Mackus , A J M , Mulders , J J L & Kessels , W M M 2012 , ' Plaatsopgeloste depositie van Pt nanostructuren door het combineren van elektronenbundel geïnduceerde depositie en atoomlaagdepositie ' , Nevac Blad , vol. 50 , nr. 2 , blz. 7-9 .
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17Academic Journal
المؤلفون: Baker, L., Cavanagh, A.S., Seghete, D., George, S.M., Mackus, A.J.M., Kessels, W.M.M., Liu, Z.Y., Wagner, F.T.
المصدر: Baker , L , Cavanagh , A S , Seghete , D , George , S M , Mackus , A J M , Kessels , W M M , Liu , Z Y & Wagner , F T 2011 , ' Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma ' , Journal of Applied Physics , vol. 109 , no. 8 , 084333 , pp. 084333-1/10 . https://doi.org/10.1063/1.3555091
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18Academic Journal
المؤلفون: Mackus, A.J.M., Heil, S.B.S., Langereis, E., Knoops, H.C.M., Sanden, van de, M.C.M., Kessels, W.M.M.
المصدر: Mackus , A J M , Heil , S B S , Langereis , E , Knoops , H C M , Sanden, van de , M C M & Kessels , W M M 2010 , ' Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes ' , Journal of Vacuum Science and Technology A , vol. 28 , no. 1 , pp. 77-87 . https://doi.org/10.1116/1.3256227
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19Academic Journal
المصدر: Mackus , A J M , Mulders , J J L , Sanden, van de , M C M & Kessels , W M M 2010 , ' Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition ' , Journal of Applied Physics , vol. 107 , no. 11 , 116102 , pp. 116102-1/3 . https://doi.org/10.1063/1.3431351
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20Academic Journal
المؤلفون: Knoops, H.C.M., Mackus, A.J.M., Donders, M.E., Sanden, van de, M.C.M., Notten, P.H.L., Kessels, W.M.M.
المصدر: Knoops , H C M , Mackus , A J M , Donders , M E , Sanden, van de , M C M , Notten , P H L & Kessels , W M M 2009 , ' Remote plasma ALD of platinum and platinum oxide films ' , Electrochemical and Solid-State Letters , vol. 12 , no. 7 , pp. G34-G36 . https://doi.org/10.1149/1.3125876
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