المؤلفون: Gianfranco Aresta, Erik R.J. van Beekum, Mariadriana Creatore, Jurgen Palmans, W. M. M. Erwin Kessels, M.C.M. Richard van de Sanden, Peter van de Weijer, Alberto Perrotta

المساهمون: Plasma & Materials Processing, Interfaces in future energy technologies, Atomic scale processing, Processing of low-dimensional nanomaterials

المصدر: Thin Solid Films, 595, Part B, 251-257
Thin Solid Films, 595, Part B, 251-257. Elsevier

مصطلحات موضوعية: Materials science, Moisture, Initiated chemical vapor deposition, Ellipsometric porosimetry, Metals and Alloys, Surfaces and Interfaces, Chemical vapor deposition, Permeation, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Barrier layer, chemistry.chemical_compound, chemistry, Moisture barriers, Silicon dioxide, Materials Chemistry, Polymer substrate, Organic chemistry, Deposition (phase transition), Nano-pore filling, Composite material, Layer (electronics), Organosilicon

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bcdb4d3cbb8fe31777b6e6a2e43650c3
https://www.differ.nl/bibcite/reference/8030