المؤلفون: A. G. Timko, A. H. Gabor, A. N. Medina, D. K. Downs, E. Reichmanis, F. M. Houlihan, I. L. Rushkin, M. Neiser, O. Nalamasu, R. S. Hutton, R.R. Kunz, S. Malik

المصدر: Journal of Photopolymer Science and Technology. 1999, 12(3):525

المؤلفون: Sanjay Malik, Allen H. Gabor, Arturo N. Medina, Ilya L. Rushkin, D. K. Downs, Omkaram Nalamasu, Richard S. Hutton, M. Neiser, Roderick R. Kunz, Allen G. Timko, Elsa Reichmanis, Francis M. Houlihan

المصدر: SPIE Proceedings.

مصطلحات موضوعية: chemistry.chemical_classification, Outgassing, Resist, Chemistry, Photodissociation, Analytical chemistry, Molecule, Activation energy, Polymer, Mass spectrometry, Photochemistry, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a55a656298097be34f8fb044b1c1fee2
https://doi.org/10.1117/12.350209