المؤلفون: Junige, Marcel, Oddoy, Tim, Yakimovab, Rositsa, Darakchievab, Vanya, Wenger, Christian, Lupinac, Grzegorz, Kitzmann, Julia, Albert, Matthias, Bartha, Johann W.

مصطلحات موضوعية: Atomic Layer Deposition (ALD), Aluminium(III) oxide (Al²O³), graphene, in-vacuo pre-treatment, Nitrogen trifluoride (NF³), in-situ real-time Spectroscopic Ellipsometry (irtSE), in-vacuo X-ray Photoelectron Spectroscopy (XPS), Atomic Force Microscopy (AFM), Atomschichtabscheidung (ALD), Aluminium(III)oxid (Al²O³), Graphen, In-Vakuo-Vorbehandlung, Stickstoff trifluorid (NF³), in-situ Echtzeit Spektroskopische Ellipsometrie (irtSE), in-vacuo Röntgen-Photoelektronen Spektroskopie (XPS), Rasterkraftmikroskopie (AFM), info:eu-repo/classification/ddc/620, ddc:620

الاتاحة: https://tud.qucosa.de/id/qucosa%3A35188
https://tud.qucosa.de/api/qucosa%3A35188/attachment/ATT-0/