المؤلفون: Fathzadeh, Atefeh, Bezard, Philippe, Darnon, Maxime, Manders, Inge, Conard, Thierry, Hoflijk, Ilse, Lazzarino, Frederic, de Gendt, Stefan

المساهمون: IMEC (IMEC), Catholic University of Leuven = Katholieke Universiteit Leuven (KU Leuven), Laboratoire Hubert Curien (LabHC), Institut d'Optique Graduate School (IOGS)-Université Jean Monnet - Saint-Étienne (UJM)-Centre National de la Recherche Scientifique (CNRS)

المصدر: ISSN: 0734-2101 ; Journal of Vacuum Science & Technology A ; https://hal.science/hal-04531012 ; Journal of Vacuum Science & Technology A, 2024, 42 (3), ⟨10.1116/6.0003380⟩.

مصطلحات موضوعية: [SPI]Engineering Sciences [physics]

Relation: hal-04531012; https://hal.science/hal-04531012; https://hal.science/hal-04531012/document; https://hal.science/hal-04531012/file/TAPE_110324_unmarked.pdf

الاتاحة: https://hal.science/hal-04531012
https://hal.science/hal-04531012/document
https://hal.science/hal-04531012/file/TAPE_110324_unmarked.pdf
https://doi.org/10.1116/6.0003380

المؤلفون: Lazzarino, Frederic

مصطلحات موضوعية: [PHYS:PHYS] Physics/Physics, [SPI:NANO] Engineering Sciences/Micro and nanotechnologies/Microelectronics, Lithographie, nanoimpression, film mince de polymère, transition vitreuse, épaisseur résiduelle, déformation du moule, ponts capillaires

الاتاحة: http://tel.archives-ouvertes.fr/tel-00128711
http://tel.archives-ouvertes.fr/docs/00/12/87/11/PDF/These_-Frederic_LAZZARINO-.pdf

المؤلفون: Montero Alvarez, Daniel, Buccheri, Nunzio, Lin, Quyang, Roy, Syamashree, Paolillo, Sara, Wu, Chen, Hermans, Yannick, Decoster, Stefan, Baudemprez, Bart, Finoulst, Jan-Frederik, Lazzarino, Frédéric, Park, Seongho, Tokei, Zsolt

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XIII

الاتاحة: http://dx.doi.org/10.1117/12.3010454

المؤلفون: Brissonneau, Vincent, Koo, Il Gyo, Hosseini, Maryam, Batuk, Dmitry, Veloso, Anabela, Mannaert, Geert, Lazzarino, Frédéric

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XIII

الاتاحة: http://dx.doi.org/10.1117/12.3012322

المؤلفون: Filippidou, Konstantina, Bézard, Philippe, Liu, I-Yun, Rolin, Cedric, Lazzarino, Frédéric, Ragnarsson, Lars-Åke

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XIII

الاتاحة: http://dx.doi.org/10.1117/12.3012753

المؤلفون: Sarkar, Tanushree, Radisic, Dunja, Vega Gonzalez, Victor, Stiers, Karen, Sheng, Cassie, Montero Alvarez, Daniel, Jenkins, Hailey, Demand, Marc, Wang, Peng, Lazzarino, Frédéric, Horiguchi, Naoto

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XIII

الاتاحة: http://dx.doi.org/10.1117/12.3014213

المؤلفون: Choudhury, Subhobroto, Mannaert, Geert, Barbosa Lima, Lucas Petersen, Demuynck, Steven, Koo, Il Gyo, Lazzarino, Frédéric

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XIII

الاتاحة: http://dx.doi.org/10.1117/12.3013077

المؤلفون: Li, Jie, Kundu, Shreya, Souriau, Laurent, Bezard, Philippe, Izmailov, Roman, Lazzarino, Frederic

المصدر: Plasma Processes and Polymers ; ISSN 1612-8850 1612-8869

الاتاحة: http://dx.doi.org/10.1002/ppap.202400186
https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.202400186

المؤلفون: Mannaert, Geert, Mertens, Hans, Hosseini, Maryam, Demuynck, Steven, Thi Hoang Nguyen, Vy, Chan, B.T., Lazzarino, Frédéric

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XII

الاتاحة: http://dx.doi.org/10.1117/12.2658073

المؤلفون: Mohanty, Nihar, Altamirano-Sánchez, Efrain, Filippidou, Konstantina, Bezard, Philippe, Liu, I-Yun, Rolin, Cedric, Lazzarino, Frederic, Ragnarsson, Lars-Åke

المصدر: Proceedings of SPIE; April 2024, Vol. 12958 Issue: 1 p129580L-129580L-10, 12828431p

المؤلفون: Milenin, Alexey P., Chan, BT, Lazzarino, Frederic

المصدر: Japanese Journal of Applied Physics ; volume 62, issue SI, page SI1004 ; ISSN 0021-4922 1347-4065

الاتاحة: http://dx.doi.org/10.35848/1347-4065/acbbd6
https://iopscience.iop.org/article/10.35848/1347-4065/acbbd6
https://iopscience.iop.org/article/10.35848/1347-4065/acbbd6/pdf

المؤلفون: Kundu, Shreya, Garbin, Daniele, Devulder, Wouter, Donadio, Gabriele Luca, Lazzarino, Frederic

المساهمون: IMEC

المصدر: ACS Applied Nano Materials ; volume 6, issue 12, page 10668-10679 ; ISSN 2574-0970 2574-0970

الاتاحة: http://dx.doi.org/10.1021/acsanm.3c01611
https://pubs.acs.org/doi/pdf/10.1021/acsanm.3c01611

المؤلفون: Decoster, Stefan, Kundu, Souvik, Lazzarino, Frédéric, Larivière, Stéphane, O'Toole, Martin, Murdoch, Gayle, Le, Quoc Toan, van der Veen, Marleen, Heylen, Nancy

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2614267

المؤلفون: Schleicher, Filip, Bekaert, Joost, Thiam, Arame, Decoster, Stefan, Blanc, Romuald, Lazzarino, Frédéric, Garcia-Santaclara, Jara, Rispens, Gijsbert, Maslow, Mark

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2610941

المؤلفون: Radisic, Dunja, Veloso, Anabela, Gupta, Anshul, Hosseini, Maryam, Wang, Shouhua, Mertens, Hans, Chan, Boon Teik, Batuk, Dmitry, Martinez Alanis, Gerardo Tadeo, Lazzarino, Frédéric, Litta, Eugenio Dentoni, Horiguchi, Naoto

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2616731

المؤلفون: Kundu, Shreya, Decoster, Stefan, Bezard, Philippe, Nalin Mehta, Ankit, Dekkers, Harold, Lazzarino, Frederic

المصدر: ACS Applied Materials & Interfaces ; volume 14, issue 29, page 34029-34039 ; ISSN 1944-8244 1944-8252

الاتاحة: http://dx.doi.org/10.1021/acsami.2c07514
https://pubs.acs.org/doi/pdf/10.1021/acsami.2c07514

المؤلفون: Panneerchelvam, Prem, Agarwal, Ankur, Huard, Chad M., Pret, Alessandro Vaglio, Mani, Antonio, Gronheid, Roel, Demand, Marc, Kumar, Kaushik, Paolillo, Sara, Lazzarino, Frederic

المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Dec2022, Vol. 40 Issue 6, p1-14, 14p

مصطلحات موضوعية: PLASMA etching, SCANNING electron microscopes, SEMICONDUCTOR manufacturing

المؤلفون: Béral, Christophe, Charley, Anne-Laure, Leray, Philippe, Lazzarino, Frederic, Blanc, Romuald, Das, Poulomi, Weldeslassie, Ataklti, Tamaddon, Amir-Hossein, Gillijns, Werner

المساهمون: Ronse, Kurt G., Gargini, Paolo A., Naulleau, Patrick P., Itani, Toshiro

المصدر: Extreme Ultraviolet Lithography 2020

الاتاحة: http://dx.doi.org/10.1117/12.2572865

المؤلفون: Paolillo, Sara, Moussa, Alain, Murdoch, Gayle, Lazzarino, Frederic, Charley, Anne-Laure, Leray, Philippe, Hung, Joey, Koret, Roy, Wolfling, Shay, Ger, Avron

المساهمون: Adan, Ofer, Robinson, John C.

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV

الاتاحة: http://dx.doi.org/10.1117/12.2550366

المؤلفون: Tao, Zheng, Zhang, Liping, Dupuy, Emmanuel, Chan, Boon Teik, Altamirano-Sánchez, Efrain, Lazzarino, Frederic

المساهمون: Labelle, Catherine B., Wise, Richard S.

المصدر: Advanced Etch Technology for Nanopatterning IX

الاتاحة: http://dx.doi.org/10.1117/12.2552022