المؤلفون: Faure, Thomas, Sakamoto, Yoshifumi, Toda, Yusuke, Badger, Karen, Seki, Kazunori, Lawliss, Mark, Isogawa, Takeshi, Zweber, Amy, Kagawa, Masayuki, Wistrom, Richard, Xu, Yongan, Lobb, Granger, Viswanathan, Ramya, Hu, Lin, Inazuki, Yukio, Nishikawa, Kazuhiro

المساهمون: Yoshioka, Nobuyuki

المصدر: SPIE Proceedings ; Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2241480

المؤلفون: Seki, Kazunori, Isogawa, Takeshi, Kagawa, Masayuki, Akima, Shinji, Kodera, Yutaka, Badger, Karen, Qi, Zhengqing John, Lawliss, Mark, Rankin, Jed, Bonam, Ravi

المساهمون: Yoshioka, Nobuyuki

المصدر: Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2197763

المؤلفون: Isogawa, Takeshi, Seki, Kazunori, Lawliss, Mark, Qi, Zhengqing John, Rankin, Jed, Akima, Shinji

المساهمون: Hayashi, Naoya, Kasprowicz, Bryan S.

المصدر: SPIE Proceedings ; Photomask Technology 2015 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2197761

المؤلفون: Rankin, Jed, Qi, Zhengqing John, Lawliss, Mark, Narita, Eisuke, Seki, Kazunori, Badger, Karen, Bonam, Ravi, Halle, Scott, Turley, Christina

المساهمون: Hayashi, Naoya, Kasprowicz, Bryan S.

المصدر: SPIE Proceedings ; Photomask Technology 2015 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2197476

المؤلفون: Turley, Christina, Rankin, Jed, Kindt, Louis, Lawliss, Mark, Bolton, Luke, Collins, Kevin, Cheong, Lin, Bonam, Ravi, Poro, Richard, Isogawa, Takeshi, Narita, Eisuke, Kagawa, Masayuki

المساهمون: Yoshioka, Nobuyuki

المصدر: Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2197383

المؤلفون: Qi, Zhengqing John, Rankin, Jed H., Lawliss, Mark, Badger, Karen D., Turley, Christina

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS ; volume 15, issue 2, page 023502 ; ISSN 1932-5150

الاتاحة: http://dx.doi.org/10.1117/1.jmm.15.2.023502
http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=2514145

المؤلفون: Isogawa, Takeshi, Seki, Kazunori, Lawliss, Mark, Qi, Zhengqing John, Rankin, Jed, Akima, Shinji

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS ; volume 15, issue 2, page 021010 ; ISSN 1932-5150

الاتاحة: http://dx.doi.org/10.1117/1.jmm.15.2.021010
http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=2505663

المؤلفون: Seki, Kazunori, Isogawa, Takeshi, Kagawa, Masayuki, Akima, Shinji, Kodera, Yutaka, Badger, Karen, Qi, Zhengqing John, Lawliss, Mark, Rankin, Jed, Bonam, Ravi

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS ; volume 15, issue 2, page 021004 ; ISSN 1932-5150

الاتاحة: http://dx.doi.org/10.1117/1.jmm.15.2.021004
http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=2489596

المؤلفون: Lawliss, Mark, Gallagher, Emily, Hibbs, Michael, Seki, Kazunori, Isogawa, Takeshi, Robinson, Tod, LeClaire, Jeff

المساهمون: Ackmann, Paul W., Hayashi, Naoya

المصدر: SPIE Proceedings ; Photomask Technology 2014 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2069787

المؤلفون: Gallagher, Emily, Wagner, Alfred, Lawliss, Mark, McIntyre, Gregory, Seki, Kazunori, Isogawa, Takeshi, Nash, Steven

المساهمون: Kato, Kokoro

المصدر: SPIE Proceedings ; Photomask and Next-Generation Lithography Mask Technology XXI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2070871

المؤلفون: Isogawa, Takeshi, Seki, Kazunori, Lawliss, Mark, Gallagher, Emily, Akima, Shinji, Konishi, Toshio

المساهمون: Kato, Kokoro

المصدر: SPIE Proceedings ; Photomask and Next-Generation Lithography Mask Technology XXI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2070251

المؤلفون: McIntyre, Gregory, Gallagher, Emily, Robinson, Tod, Smith, Adam C., Lawliss, Mark, LeClaire, Jeffrey, Bozak, Ron, White, Roy, Archuletta, Michael

المساهمون: Naulleau, Patrick P.

المصدر: Extreme Ultraviolet (EUV) Lithography IV ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2014935

المؤلفون: Gallagher, Emily, McIntyre, Gregory, Lawliss, Mark, Robinson, Tod, Bozak, Ronald, White, Roy, LeClaire, Jeff

المساهمون: Abboud, Frank E., Faure, Thomas B.

المصدر: SPIE Proceedings ; Photomask Technology 2012 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.974749

المؤلفون: Gallagher, Emily, Badger, Karen, Lawliss, Mark, Kodera, Yutaka, Azpiroz, Jaione Tirapu, Pang, Song, Zhang, Hongqin, Eugenieva, Eugenia, Clifford, Chris, Goonesekera, Arosha, Tian, Yibin

المساهمون: Kawahira, Hiroichi, Zurbrick, Larry S.

المصدر: Photomask Technology 2008 ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.801945

المؤلفون: Badger, Karen, Kodera, Yutaka, Gallagher, Emily, Lawliss, Mark

المساهمون: Kawahira, Hiroichi, Zurbrick, Larry S.

المصدر: Photomask Technology 2008 ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.801951

المؤلفون: Kodera, Yutaka, Badger, Karen, Gallagher, Emily, Akima, Shinji, Lawliss, Mark, Ikeda, Hidehiro, Stobert, Ian, Kikuchi, Yasutaka

المساهمون: Watanabe, Hidehiro

المصدر: SPIE Proceedings ; Photomask and Next-Generation Lithography Mask Technology XIV ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.728997

المؤلفون: Marokkey, Sajan, Conrad, Edward W., Gallagher, Emily E., Ikeda, Hidehiro, Bruce, James A., Lawliss, Mark

المساهمون: Naber, Robert J., Kawahira, Hiroichi

المصدر: SPIE Proceedings ; Photomask Technology 2007 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.746685

المؤلفون: Fisch, Emily, Brodsky, Colin, Flanigan, Philip, Lawliss, Mark, Rankin, Jed, Thibault, David

المساهمون: Silver, Richard M.

المصدر: SPIE Proceedings ; Metrology, Inspection, and Process Control for Microlithography XIX ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.600101

المؤلفون: Thiel, Carey, Racette, Kenneth C., Fisch, Emily, Lawliss, Mark, Kindt, Louis, Huang, Chester, Ackel, Robin, Levy, Max

المساهمون: Engelstad, Roxann L.

المصدر: SPIE Proceedings ; Emerging Lithographic Technologies VII ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.484988
http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.484988

المؤلفون: Wood II, Obert R., Reu, Phillip L., Engelstad, Roxann L., Lovell, Edward G., Lercel, Michael J., Thiel, Carey W., Lawliss, Mark S., Mackay, R. S.

المساهمون: Engelstad, Roxann L.

المصدر: SPIE Proceedings ; Emerging Lithographic Technologies VII ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.490136
http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.490136