المؤلفون: Chien-Lin Lee, Jia-Syun Cai, Kuen-Yu Tsai, Sheng-Wei Chien

المصدر: JSAP Annual Meetings Extended Abstracts. 2019, :177

المؤلفون: Pulikanti Guruprasad Reddy, Neha Thakur, Chien-Lin Lee, Sheng-Wei Chien, Chullikkattil P. Pradeep, Subrata Ghosh, Kuen-Yu Tsai, Kenneth E. Gonsalves

المصدر: AIP Advances, Vol 7, Iss 8, Pp 085314-085314-9 (2017)

مصطلحات موضوعية: Physics, QC1-999

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2158-3226

URL الوصول: https://doaj.org/article/cda0161b8c724bd1a14906e29dbe5359

المؤلفون: Cheng-Han Tsai, Jia-Han Li, Kuen-Yu Tsai, Pei-Chuen Chiou, Szu-Hung Chen, Tien-Tung Chung, Yen-Min Lee, Zhan-Yu Liu

المصدر: JSAP Annual Meetings Extended Abstracts. 2014, :3822

المؤلفون: Kuen-Yu Tsai, 蔡昆育

Thesis Advisors: Yu-Lin Kuo, 郭俞麟

وصف الملف: 112

الاتاحة: http://ndltd.ncl.edu.tw/handle/frg7f6

المؤلفون: Sheng-Wei Chien, Kuen-Yu Tsai, Chien-Lin Lee, Chun-Hung Liu

المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology. 20

مصطلحات موضوعية: Point spread function, Materials science, Ion beam, business.industry, Ion beam lithography, Acceleration voltage, law.invention, Optics, Resist, law, Sensitivity (control systems), Photolithography, business, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::aa8af784c9a536faf204dc978bfb1762
https://doi.org/10.1117/1.jmm.20.3.033201

المؤلفون: Sheng-Wei Chien, Kuen-Yu Tsai, Jia-Syun Cai, Chien-Lin Lee, Xin-Yang Zheng

المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology. 20

مصطلحات موضوعية: Transistor model, Computer science, Extreme ultraviolet lithography, Transistor, Silicon on insulator, Hardware_PERFORMANCEANDRELIABILITY, Integrated circuit, law.invention, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Static random-access memory, Technology CAD, Electronic circuit

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7298884d66c0899a9f033b6e681fca59
https://doi.org/10.1117/1.jmm.20.3.033401

المؤلفون: Chao-Te Lee, Kuen-Yu Tsai, Jia-Han Li, Jia-Syun Cai, Sheng-Wei Chien, Chien-Lin Lee

المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology. 20

مصطلحات موضوعية: Materials science, Fabrication, Ion beam, business.industry, Extreme ultraviolet lithography, Metrology, law.invention, law, Optoelectronics, Node (circuits), Process optimization, Photolithography, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::711ec3c55fd5b7cd97f59221b1813188
https://doi.org/10.1117/1.jmm.20.2.023001

المؤلفون: Kuen-Yu Tsai, Meng-Fu You, Yi-Chang Lu, Philip C W Ng

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://www.cecs.uci.edu/%7Epapers/iccad08/PDFs/Papers/03D.3.pdf.

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.1076.1112; http://www.cecs.uci.edu/%7Epapers/iccad08/PDFs/Papers/03D.3.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.1076.1112
http://www.cecs.uci.edu/%7Epapers/iccad08/PDFs/Papers/03D.3.pdf

المؤلفون: Kuen-Yu Tsai, Jia-Syun Cai, Sheng-Wei Chien, Chien-Lin Lee

المصدر: International Conference on Extreme Ultraviolet Lithography 2019.

مصطلحات موضوعية: Fabrication, Computer science, Extreme ultraviolet lithography, Electronic engineering, Process optimization, Node (circuits), Semiconductor device, Ion beam lithography, Lithography, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5e2c0ef71a8fbee005946f6f58728364
https://doi.org/10.1117/12.2536874

المؤلفون: Matt St. John, Kuen-Yu Tsai, Jia-Syun Cai, Chien-Lin Lee, James P. Shiely, Sheng-Wei Chien

المصدر: Optical Microlithography XXXII.

مصطلحات موضوعية: Optical proximity correction, Computer science, Small number, Computation, Convergence (routing), Polygon, Hot spot (veterinary medicine), Enhanced Data Rates for GSM Evolution, Lithography, Algorithm

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::05a533bfbf787a731471f5ea716541f3
https://doi.org/10.1117/12.2515414

المؤلفون: Sheng-Wei Chien, Xin-Yang Zheng, Chien-Lin Lee, Jia-Syun Cai, Kuen-Yu Tsai

المصدر: Design-Process-Technology Co-optimization for Manufacturability XIII.

مصطلحات موضوعية: Transistor model, Computer science, Extreme ultraviolet lithography, Transistor, Hardware_PERFORMANCEANDRELIABILITY, law.invention, Weighting, Design for manufacturability, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Technology CAD, Lithography, Electronic circuit

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::49e2a990c32a13521bba9440756df531
https://doi.org/10.1117/12.2515186

المؤلفون: Chien-Lin Lee, Kuen-Yu Tsai, Sheng-Wei Chien

المصدر: Novel Patterning Technologies 2018.

مصطلحات موضوعية: Point spread function, Materials science, Ion beam, Scattering, business.industry, Monte Carlo method, 030206 dentistry, 02 engineering and technology, 021001 nanoscience & nanotechnology, Ion beam lithography, Acceleration voltage, 03 medical and health sciences, 0302 clinical medicine, Optics, Resist, Sensitivity (control systems), 0210 nano-technology, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1819553646b89074304cb44515b8a419
https://doi.org/10.1117/12.2297691

المؤلفون: Chun-Hung Liu, Sheng-Wei Chien, Kuen-Yu Tsai, Chit-Sung Hong, Sheng-Yung Chen, Chao-Te Lee, Jia-Han Li, Bor-Yuan Shew, Chien-Lin Lee

المصدر: SPIE Proceedings.

مصطلحات موضوعية: 010302 applied physics, Fabrication, Materials science, Ion beam, business.industry, Nanotechnology, 02 engineering and technology, Semiconductor device, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, Semiconductor, Resist, 0103 physical sciences, Optoelectronics, Node (circuits), 0210 nano-technology, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4952a3975f446d7c7e6530b08d4776ea
https://doi.org/10.1117/12.2257989

المؤلفون: Ting-Hang Pei, Jia-Han Li, Kuen-Yu Tsai

المصدر: Optical and Quantum Electronics. 47:1557-1567

مصطلحات موضوعية: Diffraction, Maximum intensity, Physics, Fresnel zone, business.industry, Zone plate, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, law.invention, Full width at half maximum, Optics, law, Electrical and Electronic Engineering, business, Computer communication networks, Fresnel diffraction

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b54e0c441cc7df2861f9c7dfc1196c23
https://doi.org/10.1007/s11082-014-9995-y

المؤلفون: Ting Hang Pei, Kuen-Yu Tsai, Jia-Han Li

المصدر: Advanced Materials Research. 933:534-537

مصطلحات موضوعية: Physics, Optics, Successive over-relaxation, business.industry, Mathematical analysis, General Engineering, Finite difference, Periodic boundary conditions, Electron, business, Boundary values, Finite element method, Domain (software engineering)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1645574bc57baf59129f938eab7f746e
https://doi.org/10.4028/www.scientific.net/amr.933.534

المؤلفون: Chang Li Hung, Feng Chun Yeh, Zu Rong Liu, Ting Hang Pei, Kuen-Yu Tsai, Jia-Han Li

المصدر: Advanced Materials Research. 933:572-577

مصطلحات موضوعية: Physics, Scattering, business.industry, Plane (geometry), Detector, General Engineering, Speckle noise, Edge (geometry), law.invention, Speckle pattern, Optics, law, Reflection (physics), business, Beam splitter

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d67e01fd494651284a9bc2df3e054766
https://doi.org/10.4028/www.scientific.net/amr.933.572

المؤلفون: Chien-Lin Lee, Jia-Syun Cai, Sheng-Wei Chien, Kuen-Yu Tsai

المصدر: Proceedings of SPIE; 7/29/2019, Vol. 11147, p1-7, 7p

المؤلفون: Yen-Min Lee, Jia-Han Li, Kuen-Yu Tsai, Yu-Tian Sheng, Hsin-Hung Cheng

المصدر: Journal of Display Technology. 10:57-70

مصطلحات موضوعية: Materials science, business.industry, Scattering, Condensed Matter Physics, Light scattering, Electronic, Optical and Magnetic Materials, Optics, Reflection (mathematics), Ellipsometry, Color gel, RGB color model, Electrical and Electronic Engineering, business, Optical filter, Refractive index

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::df580725783389de55ef7f6663ff03ef
https://doi.org/10.1109/jdt.2013.2285577

المؤلفون: Philip C. W. Ng, Kuen-Yu Tsai, Lawrence S. Melvin

المصدر: Microelectronic Engineering. 110:147-151

مصطلحات موضوعية: Process modeling, Computer science, Process (computing), Lithography process, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Compensation (engineering), Optical proximity correction, Control theory, Etching (microfabrication), Distortion, Hardware_INTEGRATEDCIRCUITS, Electrical and Electronic Engineering, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c20d0f7a231fb186695e9740ee0b71e2
https://doi.org/10.1016/j.mee.2013.03.024

المؤلفون: Jia-Syun Cai, Sheng-Wei Chien, Xin-Yang Zheng, Chien-Lin Lee, Kuen-Yu Tsai

المصدر: Proceedings of SPIE; 1/25/2019, Vol. 10962, p1-22, 22p