نتائج البحث - "Koty, Devi"

1

Academic Journal

Demonstration of transfer learning using 14 nm technology analog ReRAM array

المؤلفون: Athena, Fabia Farlin, Fagbohungbe, Omobayode, Gong, Nanbo, Rasch, Malte J., Penaloza, Jimmy, Seo, SoonCheon, Gasasira, Arthur, Solomon, Paul, Bragaglia, Valeria, Consiglio, Steven, Higuchi, Hisashi, Park, Chanro, Brew, Kevin, Jamison, Paul, Catano, Christopher, Saraf, Iqbal, Silvestre, Claire, Liu, Xuefeng, Khan, Babar, Jain, Nikhil, McDermott, Steven, Johnson, Rick, Estrada-Raygoza, I., Li, Juntao, Gokmen, Tayfun, Li, Ning, Pujari, Ruturaj, Carta, Fabio, Miyazoe, Hiroyuki, Frank, Martin M., La Porta, Antonio, Koty, Devi, Yang, Qingyun, Clark, Robert D., Tapily, Kandabara, Wajda, Cory, Mosden, Aelan, Shearer, Jeff, Metz, Andrew, Teehan, Sean, Saulnier, Nicole, Offrein, Bert, Tsunomura, Takaaki, Leusink, Gert, Narayanan, Vijay, Ando, Takashi

المصدر: Frontiers in Electronics ; volume 4 ; ISSN 2673-5857

الاتاحة: http://dx.doi.org/10.3389/felec.2023.1331280
https://www.frontiersin.org/articles/10.3389/felec.2023.1331280/full

View record in BASE

2

Conference

Etching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas

المؤلفون: Borges, Juliano, Yan, Hongwen, Koty, Devi, Rogalskyj, Sophia, Gignac, Lynne, Ocola, Leonidas, Hopstaken, Marinus, Molis, Steven, Simon, Andrew, Arnold, John, Shearer, Jeffrey, Bruce, Robert L.

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XIII

الاتاحة: http://dx.doi.org/10.1117/12.3010015

View record in BASE

3

Conference

Characterization of TSV etch from a sustainability standpoint

المؤلفون: Isowamwen, Osakpolo, Marchack, Nathan, Koty, Devi, Yang, Qingyun, Nguyen, Hien, Molis, Steve, LeFevre, Scott, Hopstaken, Marinus, Metz, Andrew, Shearer, Jeffrey, Bruce, Robert

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XII

الاتاحة: http://dx.doi.org/10.1117/12.2658564

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4

Periodical

Etching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas

المؤلفون: Mohanty, Nihar, Altamirano-Sánchez, Efrain, Borges, Juliano, Yan, Hongwen, Koty, Devi, Rogalskyj, Sophia, Gignac, Lynne, Ocola, Leonidas, Hopstaken, Marinus, Molis, Steve, Simon, Andrew, Arnold, John, Shearer, Jeffrey, Bruce, Robert L.

المصدر: Proceedings of SPIE; April 2024, Vol. 12958 Issue: 1 p129580E-129580E-7, 1166228p

5

Conference

Control of sidewall roughness formation in through-silicon via etch at non-cryogenic temperatures

المؤلفون: Papalia, John M., Koty, Devi, Marchack, Nathan, LeFevre, Scott, Yang, Qingyun, Mosden, Aelan, Engelmann, Sebastian U., Bruce, Robert L.

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2614264

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6

Conference

Study of surface interactions for encapsulation of phase change memory materials

المؤلفون: Buzi, Luxherta, Koty, Devi, Hopstaken, Marinus, Bruley, John, Gignac, Lynne, Sagianis, Matthew, Farmer, Damon, Miyazoe, Hiroyuki, Mosden, Aelan, Engelmann, Sebastian U., Bruce, Robert L.

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2614303

View record in BASE

7

Periodical

Characterization of TSV etch from a sustainability standpoint

المؤلفون: Mohanty, Nihar, Altamirano-Sánchez, Efrain, Isowamwen, Osakpolo, Marchack, Nathan, Koty, Devi, Yang, Qingyun, Nguyen, Hien, Molis, Steve, Lefevre, Scott, Hopstaken, Marco, Metz, Andy, Shearer, Jeff, Bruce, Robert L.

المصدر: Proceedings of SPIE; May 2023, Vol. 12499 Issue: 1 p124990H-124990H-8, 1124919p

8

Patent

Methods for producing photomask blanks, cluster tool apparatus for producing photomask blanks and the resulting photomask blanks from such methods and apparatus

View record in USPTO Patent Applications

9

Conference

Mobile metrology for advanced photomask manufacturing

المؤلفون: MacDonald, Paul, Goudy, Michael P., Koty, Devi, Omoregie, Henryson, Webster, M. David

المساهمون: Weed, J. Tracy, Martin, Patrick M.

المصدر: SPIE Proceedings ; 25th Annual BACUS Symposium on Photomask Technology ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.632221

View record in BASE

10

Periodical

Control of sidewall roughness formation in through-silicon via etch at non-cryogenic temperatures

المؤلفون: Bannister, Julie, Mohanty, Nihar, Papalia, John M., Koty, Devi, Marchack, Nathan, Lefevre, Scott, Yang, Qingyun, Mosden, Aelan, Engelmann, Sebastian U., Bruce, Robert L.

المصدر: Proceedings of SPIE; May 2022, Vol. 12056 Issue: 1 p1205603-1205603-9

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