المؤلفون: Kato, Kanzo, Huli, Lior, Grzeskowiak, Steven, Krawicz, Alexandra, Liu, Eric, Ko, Akiteru, Shimura, Satoru, Kawakami, Shinichiro, Dinh, Cong Q., Kitano, Takahiro, Nagahara, Seiji, Meli, Luciana, Seshadri, Indira, Burkhardt, Martin, Petrillo, Karen

المساهمون: Burkhardt, Martin, van Lare, Claire

المصدر: Optical and EUV Nanolithography XXXVII

الاتاحة: http://dx.doi.org/10.1117/12.3010880

المؤلفون: Oehrlein, Gottlieb S., Brandstadter, Stephan M., Bruce, Robert L., Chang, Jane P., DeMott, Jessica C., Donnelly, Vincent M., Dussart, Rémi, Fischer, Andreas, Gottscho, Richard A., Hamaguchi, Satoshi, Honda, Masanobu, Hori, Masaru, Ishikawa, Kenji, Jaloviar, Steven G., Kanarik, Keren J., Karahashi, Kazuhiro, Ko, Akiteru, Kothari, Hiten, Kuboi, Nobuyuki, Kushner, Mark J.

المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Jul2024, Vol. 42 Issue 4, p1-53, 53p

مصطلحات موضوعية: PLASMA etching, SEMICONDUCTOR manufacturing, MICROELECTRONICS, COMPUTATIONAL intelligence, CHEMICAL milling, GREENHOUSE gases, SEMICONDUCTOR technology

المؤلفون: Oehrlein, Gottlieb, Brandstadter, Stephan, Bruce, Robert, Chang, Jane, Demott, Jessica, Donnelly, Vincent, Dussart, Rémi, Fischer, Andreas, Gottscho, Richard, Hamaguchi, Satoshi, Honda, Masanobu, Hori, Masaru, Ishikawa, Kenji, Jaloviar, Steven, Kanarik, Keren, Karahashi, Kazuhiro, Ko, Akiteru, Kothari, Hiten, Kuboi, Nobuyuki, Kushner, Mark, Lill, Thorsten, Luan, Pingshan, Mesbah, Ali, Miller, Eric, Nath, Shoubhanik, Ohya, Yoshinobu, Omura, Mitsuhiro, Park, Chanhoon, Poulose, John, Rauf, Shahid, Sekine, Makoto, Smith, Taylor, Stafford, Nathan, Standaert, Theo, Ventzek, Peter

المساهمون: Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS)

المصدر: ISSN: 2166-2746.

مصطلحات موضوعية: [PHYS]Physics [physics], [SPI]Engineering Sciences [physics]

الاتاحة: https://hal.science/hal-04824255
https://doi.org/10.1116/6.0003579

المؤلفون: Zhang, Du, Chang, Shihsheng, Luan, Pingshan, Kaphle, Amrit, Hisamatsu, Toru, Shearer, Jeffrey, Park, Minjoon, Metz, Andrew, Ko, Akiteru, Biolsi, Peter

المساهمون: Altamirano-Sánchez, Efrain, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XII

الاتاحة: http://dx.doi.org/10.1117/12.2657285

المؤلفون: Kato, Kanzo, Nagahara, Seiji, Huli, Lior, Antonovich, Nathan, Hetzer, David, Grzeskowiak, Steven, Krawicz, Alexandra, Liu, Eric, Bae, Nayoung, Ko, Akiteru, Shimura, Satoru, Kawakami, Shinichiro, Conque, Dinh, Kitano, Takahiro, Meli, Luciana, Seshadri, Indira, Burkhardt, Martin, Petrillo, Karen

المساهمون: Ronse, Kurt G., Gargini, Paolo A., Naulleau, Patrick P., Itani, Toshiro

المصدر: International Conference on Extreme Ultraviolet Lithography 2023

الاتاحة: http://dx.doi.org/10.1117/12.2687901

المؤلفون: Kato, Kanzo, Huli, Lior, Antonovich, Nathan, Hetzer, David, Grzeskowiak, Steven, Liu, Eric, Ko, Akiteru, Shimura, Satoru, Kawakami, Shinichiro, Kitano, Takahiro, Nagahara, Seiji, Meli, Luciana, Seshadri, Indira, Burkhardt, Martin, Petrillo, Karen

المساهمون: Guerrero, Douglas, Amblard, Gilles R.

المصدر: Advances in Patterning Materials and Processes XL

الاتاحة: http://dx.doi.org/10.1117/12.2657290

المؤلفون: Raley, Angélique, Huli, Lior, Grzeskowiak, Steven, Lutker-Lee, Katie, Krawicz, Alexandra, Feurprier, Yannick, Liu, Eric, Kato, Kanzo, Nafus, Kathleen, Dauendorffer, Arnaud, Bae, Nayoung, LaRose, Josh, Metz, Andrew, Hetzer, Dave, Honda, Masanobu, Nishizuka, Tetsuya, Ko, Akiteru, Okada, Soichiro, Ido, Yasuyuki, Onitsuka, Tomoya, Kawakami, Shinichiro, Fujimoto, Seiji, Shimura, Satoru, Dinh, Cong Que, Muramatsu, Makoto, Biolsi, Peter, Mochiki, Hiromasa, Nagahara, Seiji

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2613063

المؤلفون: Bae, Nayoung, Thibaut, Sophie, Wada, Toshiharu, Metz, Andrew, Ko, Akiteru, Biolsi, Peter

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning X

الاتاحة: http://dx.doi.org/10.1117/12.2584594

المؤلفون: Dutta, Ashim, Church, Jennifer, Lee, Joe, O’Brien, Brendan, Meli, Luciana, Liu, Chi-Chun, Sharma, Saumya, Petrillo, Karen, Murray, Cody J., Liu, Eric, Lutker-Lee, Katie, Lou, Qiaowei, Cole, Christopher, Raley, Angélique, Ko, Akiteru, Kal, Subhadeep, Kaminsky, Jake, Mosden, Aelan, Zhang, Henan, Hu, Shan, Huli, Lior, Shibata, Naoki, Hetzer, Dave, Hsieh, Chia-Yun

المساهمون: Felix, Nelson M., Lio, Anna

المصدر: Extreme Ultraviolet (EUV) Lithography XI

الاتاحة: http://dx.doi.org/10.1117/12.2551727

المؤلفون: Philippi, Caitlin, Thibaut, Sophie, Metz, Andrew, Ko, Akiteru, Raley, Angélique, Biolsi, Peter

المساهمون: Labelle, Catherine B., Wise, Richard S.

المصدر: Advanced Etch Technology for Nanopatterning IX

الاتاحة: http://dx.doi.org/10.1117/12.2550987