-
1Academic Journal
المؤلفون: Jinesh, K.B., Hemmen, van, J.L., Sanden, van de, M.C.M., Roozeboom, F., Klootwijk, J.H., Besling, W.F.A., Kessels, W.M.M.
المصدر: Jinesh , K B , Hemmen, van , J L , Sanden, van de , M C M , Roozeboom , F , Klootwijk , J H , Besling , W F A & Kessels , W M M 2011 , ' Dielectric properties of thermal and plasma-assisted atomic layer deposition Al2O3 thin films ' , Journal of the Electrochemical Society , vol. 158 , no. 2 , pp. G21-G26 . https://doi.org/10.1149/1.3517430
وصف الملف: application/pdf
-
2Academic Journal
المؤلفون: Stavitski, N., Klootwijk, J.H., Zeijl, H.W. van, Kovalgin, A.Y., Wolters, R.A.M.
وصف الملف: application/pdf
-
3Academic Journal
المؤلفون: Stavitski, N., Klootwijk, J.H., Zeijl, H.W. van, Kovalgin, A.Y., Wolters, R.A.M.
وصف الملف: application/pdf
-
4Academic Journal
المؤلفون: Knoops, H.C.M., Baggetto, L., Langereis, E., Sanden, van de, M.C.M., Klootwijk, J.H., Roozeboom, F., Niessen, R.A.H., Notten, P.H.L., Kessels, W.M.M.
المصدر: Knoops , H C M , Baggetto , L , Langereis , E , Sanden, van de , M C M , Klootwijk , J H , Roozeboom , F , Niessen , R A H , Notten , P H L & Kessels , W M M 2008 , ' Deposition of TiN and TaN by remote plasma ALD for Cu and Li diffusion barrier applications ' , Journal of the Electrochemical Society , vol. 155 , no. 12 , pp. G287-G294 . https://doi.org/10.1149/1.2988651
وصف الملف: application/pdf
-
5Academic Journal
المؤلفون: Jinesh, K.B., Lamy, Y., Wolters, R.A.M., Klootwijk, J.H., Tois, E., Roozeboom, F., Besling, W.F.A.
المصدر: Jinesh , K B , Lamy , Y , Wolters , R A M , Klootwijk , J H , Tois , E , Roozeboom , F & Besling , W F A 2008 , ' Silicon out-diffusion and aluminum in-diffusion in devices with atomic-layer deposited La2O3 thin films ' , Applied Physics Letters , vol. 93 , no. 19 , 192912 , pp. 192912-1/3 . https://doi.org/10.1063/1.3025850
وصف الملف: application/pdf
-
6Academic Journal
المؤلفون: Jinesh, K.B., Klootwijk, J.H., Lamy, Y., Wolters, R., Tois, E., Tuominen, M., Roozeboom, F., Besling, W.F.A.
المصدر: Jinesh , K B , Klootwijk , J H , Lamy , Y , Wolters , R , Tois , E , Tuominen , M , Roozeboom , F & Besling , W F A 2008 , ' Enhanced electrical properties of atomic layer deposited La2O3 thin films with embedded ZrO2 nanocrystals ' , Applied Physics Letters , vol. 93 , no. 17 , 172904 , pp. 172904-1/3 . https://doi.org/10.1063/1.3009202
وصف الملف: application/pdf
-
7Academic Journal
المؤلفون: Jinesh, K.B., Besling, W.F.A., Tois, E., Klootwijk, J.H., Wolters, R.P.C., Dekkers, W., Kaiser, M., Bakker, F.E., Tuominen, M., Roozeboom, F.
المصدر: Jinesh , K B , Besling , W F A , Tois , E , Klootwijk , J H , Wolters , R P C , Dekkers , W , Kaiser , M , Bakker , F E , Tuominen , M & Roozeboom , F 2008 , ' Spontaneous nanoclustering of ZrO2 in atomic layer deposited LayZr1-yOx thin films ' , Applied Physics Letters , vol. 93 , no. 6 , 062903 , pp. 062903-1/3 . https://doi.org/10.1063/1.2971032
وصف الملف: application/pdf
-
8Academic Journal
المؤلفون: Stavitski, N., Klootwijk, J.H., Zeijl, H.W. van, Boksteen, B.K., Kovalgin, A.Y., Wolters, R.A.M.
وصف الملف: application/pdf
-
9Academic Journal
المؤلفون: Hemmen, van, J.L., Heil, S.B.S., Klootwijk, J.H., Roozeboom, F., Hodson, C.J., Sanden, van de, M.C.M., Kessels, W.M.M.
المصدر: Hemmen, van , J L , Heil , S B S , Klootwijk , J H , Roozeboom , F , Hodson , C J , Sanden, van de , M C M & Kessels , W M M 2007 , ' Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor ' , Journal of the Electrochemical Society , vol. 154 , no. 7 , pp. G165-G169 . https://doi.org/10.1149/1.2737629
وصف الملف: application/pdf
-
10Academic Journal
المؤلفون: Hemmen, van, J.L., Heil, S.B.S., Klootwijk, J.H., Roozeboom, F., Hodson, C.J., Sanden, van de, M.C.M., Kessels, W.M.M.
المصدر: Hemmen, van , J L , Heil , S B S , Klootwijk , J H , Roozeboom , F , Hodson , C J , Sanden, van de , M C M & Kessels , W M M 2007 , ' Remote plasma and thermal ALD of Al2O3 for trench capacitor applications ' , ECS Transactions , vol. 3 , no. 15 , pp. 67-77 . https://doi.org/10.1149/1.2721475
وصف الملف: application/pdf
-
11Academic Journal
المؤلفون: Roozeboom, F., Klootwijk, J.H., Verhoeven, J.F.C., Heuvel, van den, F.C., Dekkers, W., Heil, S.B.S., Hemmen, van, J.L., Sanden, van de, M.C.M., Kessels, W.M.M., LeCornec, F., Guiraud, L., Chevrie, D., Bunel, C., Murray, F., Kim, H.-D., Blin, D.
المصدر: Roozeboom , F , Klootwijk , J H , Verhoeven , J F C , Heuvel, van den , F C , Dekkers , W , Heil , S B S , Hemmen, van , J L , Sanden, van de , M C M , Kessels , W M M , LeCornec , F , Guiraud , L , Chevrie , D , Bunel , C , Murray , F , Kim , H-D & Blin , D 2007 , ' ALD options for Si-integrated ultrahigh-density decoupling capacitors in pore and trench designs ' , ECS Transactions , ....
وصف الملف: application/pdf
-
12Academic Journal
المؤلفون: Heil, S.B.S., Hemmen, van, J.L., Hodson, C.J., Singh, N., Klootwijk, J.H., Roozeboom, F., Sanden, van de, M.C.M., Kessels, W.M.M.
المصدر: Heil , S B S , Hemmen, van , J L , Hodson , C J , Singh , N , Klootwijk , J H , Roozeboom , F , Sanden, van de , M C M & Kessels , W M M 2007 , ' Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor ' , Journal of Vacuum Science and Technology A , vol. 25 , no. 5 , pp. 1357-1366 . https://doi.org/10.1116/1.2753846
وصف الملف: application/pdf
-
13Academic Journal
المؤلفون: Salm, C., Klootwijk, J.H., Ponomarev, Y., Boos, P.W.M., Gravesteijn, D.J., Woerlee, P.H.
وصف الملف: application/pdf
-
14Academic Journal
وصف الملف: application/pdf
Relation: http://doc.utwente.nl/15122/1/interpolysilicon_dielectric-klootwijk.pdf; http://purl.utwente.nl/publications/15122
-
15Academic Journal
المؤلفون: Verweij, J.F., Klootwijk, J.H.
وصف الملف: application/pdf
-
16Academic Journal
المؤلفون: Klootwijk, J.H., Verweij, J.F., Rem, J.B., Bijlsma, S.
وصف الملف: application/pdf
-
17Academic Journal
المؤلفون: Klootwijk, J.H., Bergveld, H.J., Kranenburg, H. van, Woerlee, P.H., Wallinga, H.
وصف الملف: application/pdf
-
18Academic Journal
المؤلفون: Klootwijk, J.H., Kranenburg, H. van, Cobianu, C., Petrescu, V., Woerlee, P.H., Wallinga, H.
وصف الملف: application/pdf
-
19
المؤلفون: van Nieuwkasteele-Bystrova, Svetlana Nikolajevna, Smits, Sander M., Kovalgin, Alexey Y., Wolters, Robertus A.M., Nanver, Lis Karen, Schmitz, Jurriaan, Klootwijk, J.H.
المصدر: ISSUE=30;TITLE=30th International conference on Microelectronic Test Structures, ICMTS 2017
وصف الملف: application/pdf
-
20Academic Journal
المؤلفون: Giesbers, A.J.M., Bouten, P.C.P., Cillessen, J.F.M., van der Tempel, L., Klootwijk, J.H., Pesquera, A., Centeno, A., Zurutuza, A., Balkenende, A.R.
المساهمون: WVTR experiments, European Union Seventh Framework Program
المصدر: Solid State Communications ; volume 229, page 49-52 ; ISSN 0038-1098