المؤلفون: Park, Seong-Bin, Yeom, Hee-Jung, Hwang, Do-Yeon, Kim, Young-Joo, Lee, Hyo-Chang, Kim, Jung Hyung

المصدر: Journal of Applied Physics; 12/28/2024, Vol. 136 Issue 24, p1-8, 8p

مصطلحات موضوعية: MANUFACTURING processes, PLASMA density, PLASMA frequencies, PLASMA displays, MICROWAVE plasmas

المؤلفون: Kim, Ji-Hoon, Yoon, Min-Young, Kim, Gwan, Kwon, Deuk-Chul, Lee, Hyo-Chang, Kim, Jung-Hyung, Choe, Hee-Hwan

المصدر: Journal of Applied Physics; 9/7/2024, Vol. 136 Issue 9, p1-16, 16p

مصطلحات موضوعية: THIN film deposition, BOLTZMANN'S equation, ELECTRON distribution, ENERGY function, AMORPHOUS silicon, PLASMA flow

المؤلفون: Lee, Jae-Heon, Yeom, Hee-Jung, Chae, Gwang-Seok, Kim, Jung-Hyung, Lee, Hyo-Chang

المصدر: Journal of Applied Physics; 8/28/2024, Vol. 136 Issue 8, p1-6, 6p

مصطلحات موضوعية: PLASMA density, MEASUREMENT errors, PLASMA frequencies, FREQUENCY spectra, MICROWAVES

المؤلفون: Hwang, Do-Yeon, Yeom, Hee-Jung, Lee, Gawon, Kim, Jung-Hyung, Lee, Hyo-Chang

المصدر: Journal of Applied Physics; 6/14/2024, Vol. 135 Issue 22, p1-9, 9p

مصطلحات موضوعية: SPECTRUM analysis, CERAMIC materials, ELECTRON density, PLASMA materials processing, MICROWAVES, TRANSMISSION of sound

المؤلفون: Ma, Ho Jin, Kim, Seonghyeon, Kim, Ha-Neul, Kim, Mi-Ju, Ko, Jae-Woong, Lee, Jae-Wook, Kim, Jung-Hyung, Lee, Hyo-Chang, Park, Young-Jo

المساهمون: Korea Institute of Materials Science, National Research Foundation of Korea

المصدر: Scientific Reports ; volume 14, issue 1 ; ISSN 2045-2322

الاتاحة: http://dx.doi.org/10.1038/s41598-024-57697-5
https://www.nature.com/articles/s41598-024-57697-5.pdf
https://www.nature.com/articles/s41598-024-57697-5

المؤلفون: Choe, Eun‐Seok, Choi, Seungwook, Kim, Ansoon, Kim, Kwan‐Yong, Yeom, Hee‐Jung, Yoon, Min Young, Hong, Seongwan, Kim, Dong‐Wook, Kim, Jung‐Hyung, Lee, Hyo‐Chang

المصدر: Advanced Materials Interfaces ; volume 11, issue 7 ; ISSN 2196-7350 2196-7350

الاتاحة: http://dx.doi.org/10.1002/admi.202300867
https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.202300867

المؤلفون: Choi, Jinseok, Yeom, H.J., Chae, Gwang-Seok, Kee, Wonchul, Kim, Kwan-Yong, Lee, Hyo-Chang, Jeong, Hyun-Dam, Kim, Jung-Hyung

المساهمون: National Research Foundation of Korea, National Research Council of Science and Technology, Korea Ministry of Trade Industry and Energy, Ministry of Science, ICT and Future Planning, Korea Research Institute of Standards and Science, Korea Evaluation Institute of Industrial Technology

المصدر: Vacuum ; volume 217, page 112529 ; ISSN 0042-207X

الاتاحة: http://dx.doi.org/10.1016/j.vacuum.2023.112529
https://api.elsevier.com/content/article/PII:S0042207X23007261?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0042207X23007261?httpAccept=text/plain

المؤلفون: Yoon, Min Young, Jeong, Jong-Ryul, Lee, Hyo-Chang, Kim, Jung-Hyung

المساهمون: Korea Evaluation Institute of Industrial Technology, Korea Research Institute of Standards and Science, National Research Foundation of Korea, National Research Council of Science and Technology, Ministry of Science, ICT and Future Planning

المصدر: Applied Surface Science ; volume 636, page 157814 ; ISSN 0169-4332

الاتاحة: http://dx.doi.org/10.1016/j.apsusc.2023.157814
https://api.elsevier.com/content/article/PII:S0169433223014939?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0169433223014939?httpAccept=text/plain

المؤلفون: Yeom, Hee-Jung, Yoon, Min Young, Choi, Daehan, Lee, Youngseok, Kim, Jung-Hyung, You, Shin-Jae, Lee, Hyo-Chang

المساهمون: National Research Council of Science and Technology, National Research Foundation of Korea, Korea Research Institute of Standards and Science, Korea Evaluation Institute of Industrial Technology

المصدر: ACS Omega ; volume 8, issue 36, page 32450-32457 ; ISSN 2470-1343 2470-1343

الاتاحة: http://dx.doi.org/10.1021/acsomega.3c02438
https://pubs.acs.org/doi/pdf/10.1021/acsomega.3c02438

المؤلفون: Chae, Gwang-Seok, Yeom, Hee-Jung, Yoon, Min Young, Kim, Jung-Hyung, Lee, Hyo-Chang

المصدر: Plasma Sources Science & Technology; Nov2024, Vol. 33 Issue 11, p1-10, 10p

مصطلحات موضوعية: DIELECTRIC films, PLASMA diagnostics, ELECTRON density, ELECTROMAGNETIC waves, PERMITTIVITY

المؤلفون: Yeom, Hee-Jung, Chae, Gwang-Seok, Yoon, Min Young, Kim, Wooram, Lee, Jae-Heon, Park, Jun-Hyung, Park, Chan-Woo, Kim, Jung-Hyung, Lee, Hyo-Chang

المصدر: Physics of Plasmas; Sep2024, Vol. 31 Issue 9, p1-7, 7p

مصطلحات موضوعية: PLASMA density, PLASMA materials processing, PLASMA devices, POWER transmission, POWER spectra

المؤلفون: Yeom, H. J., Kim, Young-Gi, Chae, Gwang-Seok, Hwang, Do-Yeon, Kim, Jung-Hyung, Lee, Hyo-Chang

المصدر: Journal of Applied Physics; May2023, Vol. 133 Issue 18, p1-6, 6p

مصطلحات موضوعية: SPECTRUM analysis, ELECTRON density, MEASUREMENT errors, MICROWAVES, PLASMA frequencies

المؤلفون: Yeom, H. J., Chae, Gwang-Seok, Kim, Jung Hyung, You, ShinJae, Lee, Hyo-Chang

المصدر: Journal of Applied Physics; 4/21/2023, Vol. 133 Issue 15, p1-7, 7p

مصطلحات موضوعية: SPECTRUM analysis, DETECTORS, PLASMA density, PLASMA frequencies, FUSION reactors, METALS

المؤلفون: Yoon, Min Young, Yeom, H.J., Kim, Jung Hyung, Jeong, Jong-Ryul, Lee, Hyo-Chang

المساهمون: National Research Council of Science and Technology, Ministry of Science, ICT and Future Planning, Korea Research Institute of Standards and Science, National Research Foundation of Korea

المصدر: Applied Surface Science ; volume 595, page 153462 ; ISSN 0169-4332

الاتاحة: http://dx.doi.org/10.1016/j.apsusc.2022.153462
https://api.elsevier.com/content/article/PII:S0169433222010157?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0169433222010157?httpAccept=text/plain

المؤلفون: Kim, Ji-Hoon, Yoon, Min-Young, Kim, Gwan, Kwon, Deuk-Chul, Lee, Hyo-Chang, Kim, Jung-Hyung, Choe, Hee-Hwan

المساهمون: Ministry of Trade, Industry and Energy, Korea Semiconductor Research Consortium, National Research Council of Science and Technology

المصدر: Journal of Applied Physics ; volume 136, issue 9 ; ISSN 0021-8979 1089-7550

الاتاحة: http://dx.doi.org/10.1063/5.0223700
https://pubs.aip.org/aip/jap/article-pdf/doi/10.1063/5.0223700/20260292/093303_1_5.0223700.pdf

المؤلفون: Shim, Hun, Kim, Hyung-Ho, Hong, Seongwan, Kim, Jung-Hyung, Lee, Hyo-Chang, Park, Young-Jo, Lee, Sung-Min, Hong, Seong-Hyeon

المساهمون: National Research Foundation of Korea, Ministry of Science, ICT and Future Planning

المصدر: Ceramics International ; volume 50, issue 1, page 2096-2102 ; ISSN 0272-8842

الاتاحة: http://dx.doi.org/10.1016/j.ceramint.2023.10.317
https://api.elsevier.com/content/article/PII:S0272884223033904?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0272884223033904?httpAccept=text/plain

المؤلفون: Yoon, Min Young, Yeom, H. J., Kim, Jung Hyung, Chegal, Won, Cho, Yong Jai, Kwon, Deuk-Chul, Jeong, Jong-Ryul, Lee, Hyo-Chang

المساهمون: Material Innovation Program, R&D Convergence Program, KRISS research program

المصدر: Physics of Plasmas ; volume 28, issue 6 ; ISSN 1070-664X 1089-7674

الاتاحة: http://dx.doi.org/10.1063/5.0047811
https://pubs.aip.org/aip/pop/article-pdf/doi/10.1063/5.0047811/13316746/063504_1_online.pdf

المؤلفون: Ma, Ho Jin, Kim, Seonghyeon, Kim, Ha-Neul, Kim, Mi-Ju, Ko, Jae-Woong, Lee, Jae-Wook, Kim, Jung-Hyung, Lee, Hyo-Chang, Park, Young-Jo

المصدر: Scientific Reports; 3/25/2024, Vol. 14 Issue 1, p1-12, 12p

مصطلحات موضوعية: PLASMA etching, SEMICONDUCTOR manufacturing, ETCHING, MANUFACTURING processes, ALUMINUM composites, SURFACE roughness, OXYGEN plasmas

المؤلفون: Kim, Young-Gi, Yeom, H.J., Kwon, Deuk-Chul, Kim, Kwan-Yong, Chae, Gwang-Seok, Yoon, Jung-Sik, Kim, Jung-Hyung, Lee, Hyo-Chang

المساهمون: National Research Foundation of Korea, National Research Council of Science and Technology, Ministry of Science, ICT and Future Planning, Korea Research Institute of Standards and Science

المصدر: Vacuum ; volume 215, page 112330 ; ISSN 0042-207X

الاتاحة: http://dx.doi.org/10.1016/j.vacuum.2023.112330
https://api.elsevier.com/content/article/PII:S0042207X23005274?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0042207X23005274?httpAccept=text/plain

المؤلفون: Ma, Ho Jin, Park, Young-Jo, Kim, Mi-Ju, Kim, Ha-Neul, Ko, Jae-Woong, Lee, Jae-Wook, Kim, Jung-Hyung, Lee, Hyo-Chang

المساهمون: Ministry of Science, ICT and Future Planning, Korea Institute of Materials Science, National Research Foundation of Korea

المصدر: Applied Surface Science ; volume 641, page 158483 ; ISSN 0169-4332

الاتاحة: http://dx.doi.org/10.1016/j.apsusc.2023.158483
https://api.elsevier.com/content/article/PII:S0169433223021633?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0169433223021633?httpAccept=text/plain