المؤلفون: Minho Jeon, Anil Kumar Khambampati, Jong Hyun Song, Keun Joong Yoon, Kyung Youn Kim

المصدر: IEEE Access, Vol 13, Pp 1445-1457 (2025)

مصطلحات موضوعية: Electrical capacitance measurement, semiconductor process, pipe deposition monitoring, free volume index, artificial neural network (ANN), Electrical engineering. Electronics. Nuclear engineering, TK1-9971

وصف الملف: electronic resource

Relation: https://ieeexplore.ieee.org/document/10817552/; https://doaj.org/toc/2169-3536

URL الوصول: https://doaj.org/article/4c1450058c264ba1ad2e09862c5b0afb