المؤلفون: Masao Sakuraba, Katsutoshi Sugawara, Takayuki Nosaka, Hisanao Akima, Shigeo Sato

المصدر: Science and Technology of Advanced Materials, Vol 18, Iss 1, Pp 294-306 (2017)

مصطلحات موضوعية: Epitaxial growth, atomic-layer doping, plasma-enhanced chemical-vapor deposition, argon, silicon, boron, carrier mobility, Hall effect, Materials of engineering and construction. Mechanics of materials, TA401-492, Biotechnology, TP248.13-248.65

وصف الملف: electronic resource

Relation: https://doaj.org/toc/1468-6996; https://doaj.org/toc/1878-5514

URL الوصول: https://doaj.org/article/b71964f8c6fe4bf6b824e1073df6ec8c

المؤلفون: Akira Nagano, Izumi Kodama, Katsutoshi Sugawara, Shinya Sugawara, Takuya Matsumoto, Tomoko Murakami

المصدر: PROCEEDINGS OF CIVIL ENGINEERING IN THE OCEAN. 1998, 14:483

المؤلفون: AKIRA Nagano, IZUMI Kodama, KATSUTOSHI Sugawara, TAKUYA Matsumoto, TOMOKO Murakami

المصدر: ENVIRONMENTAL SYSTEMS RESEARCH. 1998, 26:587

المؤلفون: Akio Yamamoto, Katsutoshi Sugawara, Souichi Izumi, Yukiyoshi Itoh

المصدر: CORROSION ENGINEERING. 1981, 30(9):508

المؤلفون: Hatta Hideyuki, Koketsu Hidenori, Katsutoshi Sugawara, Yasuhiro Kagawa, Shingo Tomohisa, Rina Tanaka, Fukui Yutaka, Miyata Yusuke, Hiroyoshi Suzuki, Naruhisa Miura, Kensuke Taguchi

المصدر: Materials Science Forum. 1004:770-775

مصطلحات موضوعية: High concentration, Materials science, business.industry, Mechanical Engineering, Condensed Matter Physics, chemistry.chemical_compound, Ion implantation, chemistry, Mechanics of Materials, Trench, MOSFET, Silicon carbide, Optoelectronics, General Materials Science, Performance improvement, business, Short circuit, Trench gate

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8e425637047b3eb98fe7d326baa2d8de
https://doi.org/10.4028/www.scientific.net/msf.1004.770

المؤلفون: Hatta Hideyuki, Miyata Yusuke, Rina Tanaka, Koketsu Hidenori, Yasuhiro Kagawa, Kensuke Taguchi, Hiroyoshi Suzuki, Naruhisa Miura, Katsutoshi Sugawara, Shingo Tomohisa, Fukui Yutaka

المصدر: Materials Science Forum. 1004:764-769

مصطلحات موضوعية: Materials science, business.industry, Ground, Mechanical Engineering, Oxide, Condensed Matter Physics, chemistry.chemical_compound, chemistry, Mechanics of Materials, MOSFET, Silicon carbide, Optoelectronics, Protection layer, General Materials Science, business, Trench gate

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::98a6789b62c2db3bc34505610e2f54b2
https://doi.org/10.4028/www.scientific.net/msf.1004.764

المؤلفون: Adachi Kohei, Nobuo Fujiwara, Koji Sadamatsu, Kazuya Konishi, Shingo Tomohisa, Fukui Yutaka, Satoshi Yamakawa, Katsutoshi Sugawara, Hatta Hideyuki

المصدر: Materials Science Forum. 924:761-764

مصطلحات موضوعية: 010302 applied physics, Materials science, Trench mosfet, business.industry, Mechanical Engineering, Oxide, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, chemistry.chemical_compound, chemistry, Mechanics of Materials, 0103 physical sciences, Optoelectronics, Protection layer, General Materials Science, 0210 nano-technology, business, Trench gate

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c43c02255dc525538353d2f07272735e
https://doi.org/10.4028/www.scientific.net/msf.924.761

المؤلفون: Nobuo Fujiwara, Shuhei Nakata, Rina Tanaka, Yasuhiro Kagawa, Fukui Yutaka, Masayuki Imaizumi, Naruhisa Miura, Satoshi Yamakawa, Katsutoshi Sugawara

المصدر: Materials Science Forum. :761-764

مصطلحات موضوعية: Fabrication, Materials science, Trench mosfet, business.industry, Mechanical Engineering, Electrical engineering, JFET, Condensed Matter Physics, Reduction (complexity), Mechanics of Materials, Electric field, Trench, Parasitic element, MOSFET, Optoelectronics, General Materials Science, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::65806d4a55d72f4cb135cd60ef879ed2
https://doi.org/10.4028/www.scientific.net/msf.821-823.761

المؤلفون: Katsutoshi Sugawara, Satoshi Yamakawa, Masayuki Imaizumi, Rina Tanaka, Yasuhiro Kagawa, Shuhei Nakata, Naruhisa Miura, Nobuo Fujiwara, Fukui Yutaka, Yasuki Yamamoto

المصدر: Materials Science Forum. :919-922

مصطلحات موضوعية: Materials science, Trench mosfet, business.industry, Mechanical Engineering, Electrical engineering, Oxide, Condensed Matter Physics, Capacitance, chemistry.chemical_compound, chemistry, Mechanics of Materials, Gate oxide, Electric field, Trench, MOSFET, Optoelectronics, General Materials Science, business, Trench gate

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c2b355c4f06a640f618a7e565da6a605
https://doi.org/10.4028/www.scientific.net/msf.778-780.919

المؤلفون: Katsutoshi Sugawara, Junichi Murota, Masao Sakuraba

المصدر: Key Engineering Materials. 470:98-103

مصطلحات موضوعية: Electron mobility, Materials science, business.industry, Quantum heterostructure, Mechanical Engineering, Doping, Heterojunction, Nanotechnology, Substrate (electronics), Epitaxy, Mechanics of Materials, Plasma-enhanced chemical vapor deposition, Optoelectronics, General Materials Science, business, Plasma processing

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5dcbef6c7767d9f1efac5d5be58a4add
https://doi.org/10.4028/www.scientific.net/kem.470.98

المؤلفون: Katsutoshi Sugawara, Junichi Murota, Masao Sakuraba

المصدر: Thin Solid Films. 518:S57-S61

مصطلحات موضوعية: Electron mobility, Materials science, Silicon, Metals and Alloys, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Substrate (electronics), Epitaxy, Electron cyclotron resonance, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry, Plasma-enhanced chemical vapor deposition, Materials Chemistry, Stress relaxation, Thin film

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3e490118e67fce72ae6668005eda30be
https://doi.org/10.1016/j.tsf.2009.10.055

المؤلفون: Daisuke Muto, Junichi Murota, Katsutoshi Sugawara, Masaki Mori, Masao Sakuraba

المصدر: Thin Solid Films. 517:10-13

مصطلحات موضوعية: Silicon, Doping, Metals and Alloys, Analytical chemistry, chemistry.chemical_element, Heterojunction, Germanium, Surfaces and Interfaces, Substrate (electronics), Epitaxy, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry, Plasma-enhanced chemical vapor deposition, Materials Chemistry, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::246ba7861bdda1ba9ac73248b964f88c
https://doi.org/10.1016/j.tsf.2008.08.028

المؤلفون: Masao Sakuraba, Junichi Murota, Katsutoshi Sugawara

المصدر: Semiconductor Science and Technology. 22:S42-S45

مصطلحات موضوعية: Materials science, Lattice constant, Lattice (order), Materials Chemistry, Analytical chemistry, Heterojunction, Chemical vapor deposition, Plasma, Electrical and Electronic Engineering, Condensed Matter Physics, Epitaxy, Electronic, Optical and Magnetic Materials

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::af476715a41dfbe1f22a18d64b4d2cee
https://doi.org/10.1088/0268-1242/22/1/s10

المؤلفون: Junichi Murota, Masao Sakuraba, Katsutoshi Sugawara

المصدر: Thin Solid Films. 508:143-146

مصطلحات موضوعية: Chemistry, Metals and Alloys, Analytical chemistry, Surfaces and Interfaces, Chemical vapor deposition, Substrate (electronics), Epitaxy, Electron cyclotron resonance, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Nuclear magnetic resonance, Plasma-enhanced chemical vapor deposition, Materials Chemistry, Stress relaxation, Surface roughness, Thin film

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dca7ec92e23287a280823840f3d825d9
https://doi.org/10.1016/j.tsf.2005.07.332

المؤلفون: Katsutoshi Sugawara, Junichi Murota, Masao Sakuraba

المصدر: Materials Science in Semiconductor Processing. 8:69-72

مصطلحات موضوعية: Materials science, Mechanical Engineering, Analytical chemistry, Substrate (electronics), Plasma, Condensed Matter Physics, Epitaxy, Electron cyclotron resonance, Crystallinity, Mechanics of Materials, Plasma-enhanced chemical vapor deposition, Degradation (geology), General Materials Science, Ion energy

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::70878be5bb6b1b4669e18d75c35319ee
https://doi.org/10.1016/j.mssp.2004.09.078

المؤلفون: Katsutoshi Sugawara, Junichi Murota, Masao Sakuraba

المصدر: 2006 International SiGe Technology and Device Meeting.

مصطلحات موضوعية: Argon, Materials science, Analytical chemistry, chemistry.chemical_element, Substrate (electronics), Plasma, Epitaxy, Electron cyclotron resonance, symbols.namesake, Atomic layer deposition, chemistry, symbols, Layer (electronics), Raman scattering

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d79a8a1eefa65b4feb73ed4c063692f0
https://doi.org/10.1109/istdm.2006.246488

المؤلفون: Junichi Murota, Katsutoshi Sugawara, Masao Sakuraba

المصدر: ECS Meeting Abstracts. :2367-2367

مصطلحات موضوعية: Electron mobility, Semiconductor, Materials science, business.industry, Plasma-enhanced chemical vapor deposition, Doping, Optoelectronics, Substrate (electronics), Epitaxy, business, Plasma processing, Electron cyclotron resonance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6f32cc6ac96fb88eb69337469659bc05
https://doi.org/10.1149/ma2009-02/31/2367

المؤلفون: Katsutoshi Sugawara, Masao Sakuraba, Junichi Murota

المصدر: Semiconductor Science & Technology. Jan2007, Vol. 22 Issue 1, pS42-S45. 4p.

مصطلحات موضوعية: *EPITAXY, *PLASMA-enhanced chemical vapor deposition, *RESONANCE, *STRAINS & stresses (Mechanics)