المؤلفون: Andrew Metz, Hao Tang, Jeffrey C. Shearer, John C. Arnold, Karen Petrillo, Lin Lee Cheong, Nicole A. Saulnier, Stuart A. Sieg

المصدر: Journal of Photopolymer Science and Technology. 2015, 28(1):13

المؤلفون: Chandra Sarma, Karen Petrillo, Kyoung Yong Cho, Mark Neisser

المصدر: Journal of Photopolymer Science and Technology. 2013, 26(5):617

المؤلفون: Anthony Lisi, Dah Chung Owe-Yang, Daniel D. Sanders, Dario L. Goldfarb, David R. Medeiros, Dirk Pfeiffer, John Arnold, Karen Petrillo, Kazumi Noda, Libor Vyklicky, Robert D. Allen, Sean D. Burns, Seiichiro Tachiban, Shozo Shirai

المصدر: Journal of Photopolymer Science and Technology. 2008, 21(3):397

المؤلفون: Bill Pierson, Chief-seng Koay, Dario Goldfarb, Harun H. Solak, James W. Thakerlay, Jeff Mackey, Karen Petrillo, Kathleen Spear-Alfonso, Patrick Naulleau, Robert Brainard, Robert Wood, Roger A. Nassar, Thomas Wallow, Warren Montgomery, Yayi Wei

المصدر: Journal of Photopolymer Science and Technology. 2007, 20(3):411

المؤلفون: Anthony Lisi, Dah chung Owe-Yang, Daniel P. Sanders, Dario L. Goldfarb, David R. Medeiros, Dirk Pfeiffer, John Arnold, Karen Petrillo, Kazumi Noda, Libor Vylicky, Robert D. Allen, Sean D. Burns, Seiichiro Tachibana, Shozo Shirai

المصدر: Journal of Photopolymer Science and Technology. 2009, 22(1):7

المؤلفون: Brian Cardineau, Karen Petrillo, Ken Maruyama, Makato Shimizu, Robert Brainard, Shalini Sharma, Tomohisa Fujisawa, William Early

المصدر: Journal of Photopolymer Science and Technology. 2012, 25(5):633

المؤلفون: Karen Petrillo, Kyoungyong Cho, Neisser Mark

المصدر: Journal of Photopolymer Science and Technology. 2012, 25(1):87

المؤلفون: Dave Seeger, Donald C. Hofer, Greg Breyta, Hiroshi Ito, Holger Moritz, Karen Petrillo, Thomas Fischer

المصدر: Journal of Photopolymer Science and Technology. 1994, 7(3):449

المؤلفون: David SEEGER, Don HOFER, Greg BREYTA, Hiroshi ITO, Karen PETRILLO, R. SOORIYAKUMARAN

المصدر: Journal of Photopolymer Science and Technology. 1994, 7(3):433

المؤلفون: Kanzo Kato, Lior Huli, Nathan Antonovich, David Hetzer, Steven Grzeskowiak, Eric Liu, Akiteru Ko, Satoru Shimura, Shinichiro Kawakami, Takahiro Kitano, Seiji Nagahara, Luciana Meli, Indira Seshadri, Martin Burkhardt, Karen Petrillo

المصدر: Advances in Patterning Materials and Processes XL.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::62f26d28be561703578290b2c86ae190
https://doi.org/10.1117/12.2657290

المؤلفون: Mary A. Breton, Karen Petrillo, Jennifer Church, Luciana Meli, Jennifer Fullam, Stuart Sieg, Romain Lallement, Nelson M. Felix, Shimon Levi, Susan Zollinger, Felix Levitov, Sean Hand, Jason Osborne, Weijie Wang

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8c92deb71005e7569268d7156eb153bf
https://doi.org/10.1117/12.2614219

المؤلفون: Kanzo Kato, Lior Huli, Dave Hetzer, Satoru Shimura, Shinichiro Kawakami, Soichiro Okada, Takahiro Kitano, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Cody Murray, Alex Hubbard

المصدر: Advances in Patterning Materials and Processes XXXIX.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::64495d07f491b080d950ef1d71c013f4
https://doi.org/10.1117/12.2613805

المؤلفون: Dave Hetzer, Alexandra Krawicz, Luciana Meli, Alex Hubbard, Cody Murray, Christopher Cole, Shinichiro Kawakami, Karen Petrillo, Soichiro Okada, Akihiro Sonoda, Kanzo Kato, Lior Huli, Naoki Shibata, Satoru Shimura, Takahiro Kitano, Angelique Raley

المصدر: International Conference on Extreme Ultraviolet Lithography 2021.

مصطلحات موضوعية: Resist, Process (engineering), Computer science, business.industry, Extreme ultraviolet lithography, Hardware_INTEGRATEDCIRCUITS, Integrated circuit fabrication, Hardware_PERFORMANCEANDRELIABILITY, Lithography process, Line edge roughness, Process engineering, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b5a67765648aab4b0a480a914b3fc6ed
https://doi.org/10.1117/12.2602829

المؤلفون: Igor Turovets, Jennifer Fullam, Mary Breton, Roy Koret, Karen Petrillo, Daniel Schmidt, Aron Cepler

المصدر: 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Reference data (financial markets), 02 engineering and technology, Surface finish, 021001 nanoscience & nanotechnology, Machine learning, computer.software_genre, 01 natural sciences, Line width, Metrology, Characterization (materials science), 010309 optics, Resist, 0103 physical sciences, Line (geometry), Artificial intelligence, 0210 nano-technology, business, computer

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::751e641cba50434e9d41a5b8b6f0cbc6
https://doi.org/10.1109/asmc51741.2021.9435698

المؤلفون: Mary Breton, Anuja De Silva, Jing Guo, Karen Petrillo, Nelson Felix, Jennifer Church, Martin Burkhardt, Luciana Meli, Allen H. Gabor, Cody Murray, Lijuan Zou

المصدر: Extreme Ultraviolet (EUV) Lithography XII.

مصطلحات موضوعية: Interconnection, Scanner, Materials science, Stack (abstract data type), Resist, business.industry, Etching (microfabrication), Extreme ultraviolet lithography, Optoelectronics, Node (circuits), Performance improvement, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a879bbeb6cadd42b19242c8ff84854a9
https://doi.org/10.1117/12.2582563

المؤلفون: Anuja De Silva, Romain Lallement, Dario L. Goldfarb, Jennifer Church, Karen Petrillo, Dallas Lea, Cody Murray, Martin Burkhardt, Stuart A. Sieg, Nelson Felix, Luciana Meli

المصدر: Extreme Ultraviolet (EUV) Lithography XII.

مصطلحات موضوعية: Computer science, law, Extreme ultraviolet lithography, Transistor, Audio time-scale/pitch modification, Process (computing), Electronic engineering, Node (circuits), IBM, Chip, Line (electrical engineering), law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5d9ccacda2530d3d00ca8ba13b262b01
https://doi.org/10.1117/12.2583566

المؤلفون: Joe Lee, Subhadeep Kal, Qiaowei Lou, Aelan Mosden, Brendan O’Brien, Naoki Shibata, Eric Liu, Luciana Meli, Chia-Yun Hsieh, Jake Kaminsky, Katie Lutker-Lee, Christopher Cole, Chi-Chun Liu, Saumya Sharma, Akiteru Ko, Angelique Raley, Jennifer Church, Lior Huli, Cody Murray, Karen Petrillo, Shan Hu, Dave Hetzer, Henan Zhang, Ashim Dutta

المصدر: Extreme Ultraviolet (EUV) Lithography XI.

مصطلحات موضوعية: Mandrel, Computer science, Extreme ultraviolet lithography, Process optimization, Trimming, Surface finish, Critical dimension, Lithography, Engineering physics, Trim

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::df9661f3d44580f55ce0611c92337abd
https://doi.org/10.1117/12.2551727

المؤلفون: Jennifer Church, Ashim Dutta, Michael Rizzolo, Chi-Chun Liu, Yann Mignot, Dominik Metzler, John C. Arnold, Luciana Meli, Nelson Felix, Karen Petrillo, Saumya Sharma, Hao Tang

المصدر: Advances in Patterning Materials and Processes XXXVII.

مصطلحات موضوعية: Magnetoresistive random-access memory, Range (mathematics), Computer engineering, Memory cell, Computer science, Computation, Process control, Context (language use), Applications of artificial intelligence, Resistive random-access memory

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0b2b0dc4996824f37adb0e203986aace
https://doi.org/10.1117/12.2552112

المؤلفون: Mary Breton, Anuja DeSilva, Karen Petrillo, Ravi K. Bonam, Eric R. Miller, Brad Austin, Martin Burkhardt, Shravan Matham, Chris A. Mack, Luciana Meli, Nelson Felix, Romain Lallement, Jing Guo, Jennifer Church

المصدر: Extreme Ultraviolet (EUV) Lithography XI.

مصطلحات موضوعية: Materials science, Optics, Modulation, business.industry, Extreme ultraviolet lithography, Emphasis (telecommunications), Shot noise, Node (circuits), Process window, business, Lithography, Critical dimension

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::76be2bd49dc28b190f8b58f3d7bf8a72
https://doi.org/10.1117/12.2551487

المؤلفون: Jason A. Osborne, Sean Hand, Weijie Wang, David Fey, Daniel Schmidt, Jennifer Fullam, Mary Breton, Karen Petrillo

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.

مصطلحات موضوعية: Optics, Materials science, Resist, Optical proximity correction, business.industry, Scanning electron microscope, Extreme ultraviolet lithography, Line (geometry), Surface finish, business, Critical dimension, Line Break

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::21edb409a712128e9557ea51b8b90dc5
https://doi.org/10.1117/12.2551623