المؤلفون: A. Eliat, A.M. Goethals, D. Van den Heuvel, F. Van Roey, J. Hermans, K. Ronse, P. De Bisschop, R. Jonckheere

المصدر: Journal of Photopolymer Science and Technology. 2003, 16(4):549

المؤلفون: A. M. Goethal, A. Myers, A. Niroomand, C. F. Lurusso, F. Iwamoto, F. Van Roey, I. Kim, J. Hermans, K. Ronse, N. Stepenenko, R. Jockheere

المصدر: Journal of Photopolymer Science and Technology. 2007, 20(3):383

المؤلفون: G. Vandenberghe, K. Ronse, M. Ercken, M. Meanhoudt, P. Leunissen, S. Cheng

المصدر: Journal of Photopolymer Science and Technology. 2005, 18(5):571

المؤلفون: D. Van Den Heuvel, D. Vangoidsenhoven, H-W Kim, K. Nafus, K. Ronse, M. Benndorf, M. Kocsis, M. Meanhoudt, N. Stepanenko, R. Gronheid, S. Kishimura, S. O'Brien, W. Fyen

المصدر: Journal of Photopolymer Science and Technology. 2006, 19(5):585

المؤلفون: A.M. Goethals, F. van Roey, G. Vandenberghe, I. Pollentier, I. Pollers, K. Ronse, P. Jaenen

المصدر: Journal of Photopolymer Science and Technology. 2000, 13(4):635

المؤلفون: A.M. Goethals, G. Vandenberghe, I. Pollentier, K. Ronse, M. Ercken, M. Maenhoudt, P. de Bisschop

المصدر: Journal of Photopolymer Science and Technology. 2001, 14(3):333

المؤلفون: A.M. Goethals, B. Heskamp, F. van Roey, G. Davies, I. Pollers, K. Ronse, P. Jaenen

المصدر: Journal of Photopolymer Science and Technology. 1999, 12(3):445

المؤلفون: A. Blakeney, A. Gabor, A. Medina, A. Timko, A.M. Goethals, F. Houlihan, F. van Roey, I. Pollers, J. Biafore, J. Kometani, K. Ronse, O. Nalamasu, P. Tzviatkov, R. Cirelli, S. Slater, T. Steinhausler, T. Sugihara, V. van Driessche

المصدر: Journal of Photopolymer Science and Technology. 1998, 11(3):513

المؤلفون: A. M. Goethals, K. Ronse, Ki-Ho Baik, Luc van Den Hove

المصدر: Journal of Photopolymer Science and Technology. 1994, 7(3):517

المؤلفون: K. Ronse

المصدر: Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387).

مصطلحات موضوعية: Materials science, Computational lithography, law, Extreme ultraviolet lithography, Multiple patterning, X-ray lithography, Nanotechnology, Photolithography, Lithography, Next-generation lithography, Immersion lithography, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::480226cabea84838c679e02313e540ee
https://doi.org/10.1109/imnc.2000.872597

المؤلفون: M. Weiss, K. Ronse, W. Henke

المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 11:2659

مصطلحات موضوعية: Masking (art), Optics, Computer simulation, business.industry, Feature (computer vision), Position (vector), Logic gate, General Engineering, Edge (geometry), Type (model theory), business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::51bf5372a8510afae55a7bd8ab64ab56
https://doi.org/10.1116/1.586580