المؤلفون: Tatsuya Onuki, Shao Hui Wu, James Myers, Masahiro Fujita, Chi Chang Shuai, Shunpei Yamazaki, Klaus Doppler, Satoru Okamoto, Wataru Uesugi, Kiyoshi Kato, Tri Rung Yew, Atsuo Isobe, Juan-Yuan Wu, Yoshinori Ando

المصدر: IEEE Journal of Solid-State Circuits. 52:925-932

مصطلحات موضوعية: 010302 applied physics, Indium gallium zinc oxide, Materials science, business.industry, Sense amplifier, Amplifier, 020208 electrical & electronic engineering, Electrical engineering, 02 engineering and technology, 01 natural sciences, law.invention, Capacitor, Memory management, CMOS, law, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, 0202 electrical engineering, electronic engineering, information engineering, Optoelectronics, Field-effect transistor, Electrical and Electronic Engineering, business, Standby power

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f4fa40f492db681ff4851db137255060
https://doi.org/10.1109/jssc.2016.2632303

المؤلفون: Momoyo Yamaguchi, Atsuo Isobe, Shunpei Yamazaki, Daisuke Matsubayashi, Hai Biao Yao, Juan-Yuan Wu, Kiyoshi Kato, Takahiko Ishizu, Shuhei Nagatsuka, Chi Chang Shuai, Hung Chan Lin, Masahiro Fujita, Yoshinori Ando

المصدر: 2017 Symposium on VLSI Circuits.

مصطلحات موضوعية: 010302 applied physics, Indium gallium zinc oxide, Very-large-scale integration, Materials science, Power gating, business.industry, Transistor, Electrical engineering, AC power, 01 natural sciences, law.invention, CMOS, law, Logic gate, 0103 physical sciences, Data retention, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::13adbd2ccc9878843f331278e42dbd85
https://doi.org/10.23919/vlsic.2017.8008466

المؤلفون: Kiyoshi Kato, Chi Chang Shuai, Tri Rung Yew, Tien Yu Hsieh, X Y Jia, Shao Hui Wu, Juan-Yuan Wu, Mei Kui, Derek Chen, Shunpei Yamazaki, Yuta Endo, Chen Bin Lin, Hung Chan Lin

المصدر: 2016 IEEE Symposium on VLSI Technology.

مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, 020208 electrical & electronic engineering, Transistor, Electrical engineering, Normally off, 02 engineering and technology, eDRAM, 01 natural sciences, law.invention, law, 0103 physical sciences, MOSFET, 0202 electrical engineering, electronic engineering, information engineering, Optoelectronics, Image sensor, Internet of Things, business, Field-programmable gate array, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::77ea1c4c9803e0967e8ae5f6bca14b1f
https://doi.org/10.1109/vlsit.2016.7573378

المؤلفون: Yen-Ming Chen, Juan-Yuan Wu, Chia-Lin Hsu, Yu-Ting Li, Climbing Huang, Dung-Ching Perng, Chang-Hung Kung, Yu-Ru Yang, Lin Chih-Hsun, Shu-Min Huang, Chin-Fu Lin

المصدر: Journal of The Electrochemical Society. 159:H162-H165

مصطلحات موضوعية: Resistive touchscreen, Materials science, Renewable Energy, Sustainability and the Environment, business.industry, Electrical engineering, Analytical chemistry, chemistry.chemical_element, Tungsten, Condensed Matter Physics, Electrochemistry, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Corrosion, Galvanic corrosion, chemistry.chemical_compound, chemistry, Materials Chemistry, Tin, business, Layer (electronics), Diborane

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7d7932c8edfa326f2704474bff5539c4
https://doi.org/10.1149/2.094202jes

المؤلفون: Y. M. Lin, Wu-Sian Sie, S. K. Hsu, C. H. Lin, Chih-Chien Liu, Z. J. Lin, Tsai Fu-Shou, Kun-Ju Li, Yu-Ting Li, Juan-Yuan Wu, Wen-Chin Lin, P. C. Huang, Yi-Liang Liu, J.F. Lin

المصدر: Proceedings of International Conference on Planarization/CMP Technology 2014.

مصطلحات موضوعية: Materials science, business.industry, Transistor, Polishing, Hardware_PERFORMANCEANDRELIABILITY, law.invention, Amorphous solid, law, Logic gate, Chemical-mechanical planarization, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Process control, Optoelectronics, business, Lithography, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e841b4fb5c28c5c8a578cccd49049983
https://doi.org/10.1109/icpt.2014.7017276

المؤلفون: L. C. Hsu, Yi-Liang Liu, C. C. Huang, Yu-Ting Li, Juan-Yuan Wu, H. K. Hsu, Y. M. Lin, Wu-Sian Sie, Oliver Wang

المصدر: Proceedings of International Conference on Planarization/CMP Technology 2014.

مصطلحات موضوعية: Galvanic corrosion, Materials science, chemistry, Chemical-mechanical planarization, Metallurgy, Contact resistance, Copper interconnect, Polishing, chemistry.chemical_element, Surface finish, Copper, Corrosion

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0815a030034d034e35e731a98a92145e
https://doi.org/10.1109/icpt.2014.7017247

المؤلفون: J. F. Lin, Yi-Liang Liu, Y. M. Lin, C. L. Wu, Y. T. Lee, Wu-Sian Sie, W. C. Lin, L. C. Hsu, Juan-Yuan Wu, W. K. Lee, C. H. Hsu, C. C. Huang, Oliver Wang, S. K. Hsu

المصدر: Proceedings of International Conference on Planarization/CMP Technology 2014.

مصطلحات موضوعية: Back end of line, Engineering drawing, Reliability (semiconductor), Materials science, Resist, business.industry, Chemical-mechanical planarization, Optoelectronics, Polishing, Wafer, Edge (geometry), business, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c5647796abb064aa2434786a51d846b2
https://doi.org/10.1109/icpt.2014.7017284

المؤلفون: Juan-Yuan Wu, Heinrich Lang, Christian Weber, Bernhard Nuber, Susanne Weinmann

المصدر: Journal of Organometallic Chemistry. 541:157-165

مصطلحات موضوعية: Structure analysis, Stereochemistry, Chemistry, Organic Chemistry, Triclinic crystal system, Triple bond, Biochemistry, Inorganic Chemistry, Crystallography, Transition metal, Yield (chemistry), Materials Chemistry, Moiety, Molecule, Physical and Theoretical Chemistry

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a6a21377019f6c8dddffa18c1b052cd0
https://doi.org/10.1016/s0022-328x(97)00047-8

المؤلفون: C. W. Hsu, Y. L. Hsieh, Wen-Chin Lin, Y. H. Su, Climbing Huang, Juan-Yuan Wu, K. Liu, W. C. Tsao, Y. M. Lin, H. K. Hsu, R. P. Huang, C. H. Lin, Chih-Hsien Chen

المصدر: 2013 IEEE International Reliability Physics Symposium (IRPS).

مصطلحات موضوعية: Engineering drawing, Materials science, Dielectric strength, Chemical-mechanical planarization, Abrasive, Low-k dielectric, Polishing, Time-dependent gate oxide breakdown, Dielectric, Composite material, Sheet resistance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e4faa34cf2957c19f019f1aa4c1646a3
https://doi.org/10.1109/irps.2013.6532056

المؤلفون: Chao-Yu Harvey Cheng, Juli Cheng, Wu-Sian Sie, Houssam Chouaib, Qiong-Yan Yuan, Zhiming Jiang, Chih-Hsun Lin, Chia-Lin Hsu, Juan-Yuan Wu, Chien-Jen Eros Huang, Zhi-Qing James Xu, Ching-Hung Bert Lin, Sungchul Yoo, Climbing Huang

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Azimuth, Materials science, Shallow trench isolation, Electronic engineering, Process control, Wafer, Nanotechnology, Sensitivity (control systems), Throughput (business), Critical dimension, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e15505d1637a8936483c54bb255687f0
https://doi.org/10.1117/12.916235

المؤلفون: J. F. Lin, Juan-Yuan Wu, C. C. Liu, W. H. Liu, J. C. Chang, Shui-Jinn Wang, C. L. Yang, Chiang Chun

المصدر: 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.

مصطلحات موضوعية: Materials science, business.industry, Gate dielectric, Electrical engineering, Analytical chemistry, Dielectric, law.invention, Metal, Atomic layer deposition, Capacitor, Oxide semiconductor, law, visual_art, visual_art.visual_art_medium, business, Leakage (electronics), Photonic crystal

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::86916440fb7e833544ee9eb78b7ce5be
https://doi.org/10.1109/asmc.2011.5898177

المؤلفون: Chi-Mao Hsu, J. F. Lin, C. M. Cheng, Juan-Yuan Wu, Climbing Huang, C. C. Liu, H. K. Hsu, Chia-Lin Hsu, Teng-Chun Tsai, Wen-Chin Lin, Jack Lin, Willis Chen, W. C. Tsao

المصدر: 2011 International Reliability Physics Symposium.

مصطلحات موضوعية: Barrier layer, Materials science, Dielectric strength, Chemical-mechanical planarization, Surface roughness, Electronic engineering, Low-k dielectric, Polishing, Time-dependent gate oxide breakdown, Dielectric, Composite material

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c13246bcda7e9927a1c32ab4bbd010a5
https://doi.org/10.1109/irps.2011.5784470

المؤلفون: Teng-Chun Tsai, Juan-Yuan Wu, Wen-Chin Lin, Climbing Huang, Chia-Lin Hsu

المصدر: 2011 International Reliability Physics Symposium.

مصطلحات موضوعية: Materials science, Dielectric strength, Chemical-mechanical planarization, Electronic engineering, Surface roughness, Time-dependent gate oxide breakdown, Surface finish, Dielectric, Composite material, Porosity, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::14ed159751a5e8db4d11bc216bef5d14
https://doi.org/10.1109/irps.2011.5784554

المؤلفون: C. K. Chiang, J. F. Lin, H. Y. Huang, C. H. Wu, Juan-Yuan Wu, C. C. Liu, C. L. Yang, Shui-Jinn Wang

المصدر: 68th Device Research Conference.

مصطلحات موضوعية: Materials science, business.industry, Inorganic chemistry, Gate dielectric, Equivalent oxide thickness, Dielectric, chemistry.chemical_compound, Atomic layer deposition, Lanthanum oxide, chemistry, CMOS, Gate oxide, Optoelectronics, business, High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b666e560984d4f4138bf797fe1d682e9
https://doi.org/10.1109/drc.2010.5551940

المؤلفون: Juan-Yuan Wu, Jeng Yu Fang, Art Yu, Chia-Lin Hsu, Climbing Huang, Dung-Ching Perng, Jack Lin

المصدر: 2009 IEEE International Interconnect Technology Conference.

مصطلحات موضوعية: Materials science, Colloidal silica, Chemical-mechanical planarization, Abrasive, Metallurgy, Surface roughness, Dielectric, Surface finish, Composite material, Porous medium, Porosity

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f129b01657825371ea12e950f9cbaff6
https://doi.org/10.1109/iitc.2009.5090365

المؤلفون: Sheng-Min Chiu, Chin-Fu Lin, Yu-Ren Wang, Zhiming Jiang, Chao-Yu Cheng, Juli Cheng, Zhengquan Tan, Chien-Jen Huang, Getin Raphael, Tsuo-Wen Lu, Shao-Ju Chang, Juan-Yuan Wu, Tsai-Yu Wen

المصدر: ECS Meeting Abstracts. :1802-1802

مصطلحات موضوعية: Materials science, chemistry, business.industry, Calculus, Spectroscopic ellipsometry, Optoelectronics, chemistry.chemical_element, business, Boron, Energy (signal processing), Line (formation)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::87ed29b7a4014c24260549ffad1651be
https://doi.org/10.1149/ma2014-02/35/1802

المؤلفون: Chao-Hui Huang, Chien-Hung Chen, Jen-Kon Chen, Teng-Chun Tsai, Juan-Yuan Wu, Yung-Tsung Wei, Tri-Rung Yew, Yimin Huang, Ming-Sheng Yang, Hsueh-Chung Chen

المصدر: Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No.01EX461).

مصطلحات موضوعية: Interconnection, Materials science, Yield (engineering), Metallurgy, chemistry.chemical_element, Hardware_PERFORMANCEANDRELIABILITY, Copper, Corrosion, carbohydrates (lipids), Reduction (complexity), chemistry, Chemical-mechanical planarization, Trench, Slurry

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e4f1567c4abadb403da864903ec27fb0
https://doi.org/10.1109/iitc.2001.930004

المؤلفون: Hsueh-Chung Chen, Teng-Chun Tsai, Yi-Min Huang, Chao-Hui Huang, Chien-Hung Chen, Yung-Tsung Wei, Ming-Sheng Yang, Juan-Yuan Wu, Tri-Rung Yew, Jen-Kon Chen

المصدر: Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No.01EX461); 2001, p21-23, 3p