المؤلفون: Anuja De Silva, Ashim Dutta, Dario L. Goldfarb, Jennifer Church, Jing Guo, Luciana Meli, Nelson M. Felix

المصدر: Journal of Photopolymer Science and Technology. 2019, 32(1):169

المؤلفون: Phillip Kerr, Nerine Cherepy, Jennifer Church, Gary Guethlein, Jim Hall, Colby McNamee, Sean O’Neal, Kyle Champley, Andy Townsend, Mayuki Sasagawa, Anthony Hardy, Saphon Hok

المصدر: Radiation Detection Technology and Methods. 6:234-243

مصطلحات موضوعية: Nuclear and High Energy Physics, Nuclear Energy and Engineering

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7a66b5c4305473a42dade5d0cdb86327
https://doi.org/10.1007/s41605-022-00315-7

المؤلفون: Jennifer Church

المصدر: Ethical Theory and Moral Practice. 25:37-51

مصطلحات موضوعية: Value theory, Value (ethics), Philosophy, Property (philosophy), Notice, Philosophy of medicine, Sociology, Political philosophy, Obligation, Objectivity (science), Social Sciences (miscellaneous), Epistemology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f07795c4c544488643a54b451f21eb0d
https://doi.org/10.1007/s10677-021-10234-z

المؤلفون: Mary A. Breton, Karen Petrillo, Jennifer Church, Luciana Meli, Jennifer Fullam, Stuart Sieg, Romain Lallement, Nelson M. Felix, Shimon Levi, Susan Zollinger, Felix Levitov, Sean Hand, Jason Osborne, Weijie Wang

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8c92deb71005e7569268d7156eb153bf
https://doi.org/10.1117/12.2614219

المؤلفون: Jennifer Church, Luciana Meli

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4ddd5ef8c40d102eb238fee1c32a755c
https://doi.org/10.1117/12.2613102

المؤلفون: Romain Lallement, Graham Jensen, Jennifer Church, Andrew Cross, Luciana Meli

المصدر: International Conference on Extreme Ultraviolet Lithography 2021.

مصطلحات موضوعية: Yield (engineering), Optics, Materials science, business.industry, Extreme ultraviolet lithography, Predictive capability, Optical noise, Line edge roughness, business, Critical dimension, Hard mask

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::98585676fea533598d996046c6575dbc
https://doi.org/10.1117/12.2600877

المؤلفون: Mayuki Ssasagawa, Kyle Champley, Andrew Townsend, Gary Guethlein, Sean O'Neal, Anthony J. Hardy, Colby J. McNamee, Nerine J. Cherepy, Jennifer Church, Phillip Kerr, J Hall

المصدر: Hard X-Ray, Gamma-Ray, and Neutron Detector Physics XXIII.

مصطلحات موضوعية: Physics, business.industry, Astrophysics::High Energy Astrophysical Phenomena, Neutron imaging, Nuclear Theory, Digital imaging, Neutron scattering, Scintillator, Signal, Neutron temperature, Optics, Neutron generator, Neutron, Nuclear Experiment, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::43b0a7d06fa73fb61887c9f5d380d956
https://doi.org/10.1117/12.2596473

المؤلفون: Felix Levitov, Paz Yabbo, Brad Austin, Omri Baum, Nathaniel Mowell, Jennifer Church, DukKyun Moon, Uri Smolyan, Alex Joseph Varghese, Teresa A. Esposito, Luciana Meli

المصدر: 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

مصطلحات موضوعية: Computer science, Extreme ultraviolet lithography, Process (computing), 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Characterization (materials science), Reliability engineering, 010309 optics, 0103 physical sciences, 0210 nano-technology, Focus (optics), Reduction (mathematics), Throughput (business)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::94cd6620cec7a30ee0b9b7e357112241
https://doi.org/10.1109/asmc51741.2021.9435687

المؤلفون: Jennifer Church, Angelique Raley, Eric R. Miller, Xinghua Sun, Junling Sun

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning X.

مصطلحات موضوعية: Back end of line, Materials science, Stack (abstract data type), Resist, business.industry, Optoelectronics, Deposition (phase transition), Wafer, Edge (geometry), business, Lithography, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a055fc003b95459a6c99b657371cc2af
https://doi.org/10.1117/12.2583666

المؤلفون: Mary Breton, Anuja De Silva, Jing Guo, Karen Petrillo, Nelson Felix, Jennifer Church, Martin Burkhardt, Luciana Meli, Allen H. Gabor, Cody Murray, Lijuan Zou

المصدر: Extreme Ultraviolet (EUV) Lithography XII.

مصطلحات موضوعية: Interconnection, Scanner, Materials science, Stack (abstract data type), Resist, business.industry, Etching (microfabrication), Extreme ultraviolet lithography, Optoelectronics, Node (circuits), Performance improvement, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a879bbeb6cadd42b19242c8ff84854a9
https://doi.org/10.1117/12.2582563

المؤلفون: Tao Li, Chris A. Mack, Frougier Julien, Andrew M. Greene, Daniel J. Dechene, Chris Waskiewicz, Veeraraghavan S. Basker, Jingyun Zhang, Stuart A. Sieg, Carl J. Radens, Prateek Hundekar, Tsung-Sheng Kang, Indira Seshadri, Nelson Felix, Jennifer Church, Eric R. Miller, Mary Breton

المصدر: Extreme Ultraviolet (EUV) Lithography XII.

مصطلحات موضوعية: Materials science, Resist, business.industry, Extreme ultraviolet lithography, Multiple patterning, Optoelectronics, Node (circuits), business, Critical dimension, Scaling, AND gate, Nanosheet

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ecd35b8cc836ad368baf97505bac549a
https://doi.org/10.1117/12.2583897

المؤلفون: Anuja De Silva, Romain Lallement, Dario L. Goldfarb, Jennifer Church, Karen Petrillo, Dallas Lea, Cody Murray, Martin Burkhardt, Stuart A. Sieg, Nelson Felix, Luciana Meli

المصدر: Extreme Ultraviolet (EUV) Lithography XII.

مصطلحات موضوعية: Computer science, law, Extreme ultraviolet lithography, Transistor, Audio time-scale/pitch modification, Process (computing), Electronic engineering, Node (circuits), IBM, Chip, Line (electrical engineering), law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5d9ccacda2530d3d00ca8ba13b262b01
https://doi.org/10.1117/12.2583566

المؤلفون: Curtis Durfee, Frougier Julien, Daniel Schmidt, Andrew M. Greene, Veeraraghavan S. Basker, Jennifer Church, Nelson Felix, Indira Seshadri, Mary Breton

المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

مصطلحات موضوعية: Semiconductor industry, Technology readiness, law, Computer science, Transistor, Systems engineering, Node (circuits), Architecture, Cmos scaling, law.invention, Metrology, Nanosheet

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9c6a4ecf9f0ad6d25b631e6567243b1c
https://doi.org/10.1117/12.2583636

المؤلفون: Nerine J. Cherepy, P Kerr, Gary Guethlein, Jennifer Church, J Hall

مصطلحات موضوعية: medicine.medical_specialty, Engineering, business.industry, Neutron imaging, medicine, Medical physics, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::84fc9c9e43f2256f715fd13314b7761f
https://doi.org/10.2172/1708984

المؤلفون: Juntao Li, Yasir Sulehria, Nicholas A. Lanzillo, Devika Sil, Joe Lee, James J. Kelly, Raghuveer R. Patlolla, Hosadurga Shobha, Anuja DeSilva, Prasad Bhosale, Takeshi Nogami, Oleg Gluschenkov, Lawrence A. Clevenger, Son Nguyen, Jennifer Church, Huai Huang, Balasubramanian S. Haran, Yann Mignot, James J. Demarest, Andrew H. Simon, Brown Peethala Dan Edelstein

المصدر: 2020 IEEE International Interconnect Technology Conference (IITC).

مصطلحات موضوعية: Grain growth, Materials science, Electrical resistivity and conductivity, Scattering, Volume fraction, Copper interconnect, Nanowire, Analytical chemistry, Grain boundary, Electron scattering

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b22fcf1415d54c5bfb077d80ab9af1cc
https://doi.org/10.1109/iitc47697.2020.9515628

المؤلفون: Jennifer Church

المصدر: Why It’s OK to Be of Two Minds ISBN: 9781003021544

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7cdfec557037d6de40f2c76fa9a470eb
https://doi.org/10.4324/9781003021544-1

المؤلفون: Jennifer Church

المصدر: Why It’s OK to Be of Two Minds ISBN: 9781003021544
Why It’s OK to Be of Two Minds

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e623e89209b18dbe859b38d98d238acf
https://doi.org/10.4324/9781003021544-5

المؤلفون: Jennifer Church

المصدر: Why It’s OK to Be of Two Minds ISBN: 9781003021544
Why It’s OK to Be of Two Minds

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d60f31f40923b6ed47d9e007aa37068b
https://doi.org/10.4324/9781003021544-2

المؤلفون: Jennifer Church

المصدر: Why It’s OK to Be of Two Minds ISBN: 9781003021544

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fa73cf6d808b42faf2d2712a9a29198d
https://doi.org/10.4324/9781003021544-3

المؤلفون: Jennifer Church

المصدر: Why It’s OK to Be of Two Minds ISBN: 9781003021544
Why It’s OK to Be of Two Minds

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::32daed4a634d557d90ef2dfab4902fb7
https://doi.org/10.4324/9781003021544-6