المؤلفون: Badger, Karen D., Yonetani, Masashi, Toda, Yusuke, Kagawa, Masayuki, Isogawa, Takeshi, Heumann, Jan

المساهمون: Rankin, Jed H., Gallagher, Emily E.

المصدر: Photomask Technology 2018

الاتاحة: http://dx.doi.org/10.1117/12.2502560

المؤلفون: Seki, Kazunori, Badger, Karen, Yonetani, Masashi, Birnstein, Anka, Heumann, Jan, Isogawa, Takeshi, Konishi, Toshio, Kodera, Yutaka

المساهمون: Takehisa, Kiwamu

المصدر: Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology

الاتاحة: http://dx.doi.org/10.1117/12.2502006

المؤلفون: Faure, Thomas, Sakamoto, Yoshifumi, Toda, Yusuke, Badger, Karen, Seki, Kazunori, Lawliss, Mark, Isogawa, Takeshi, Zweber, Amy, Kagawa, Masayuki, Wistrom, Richard, Xu, Yongan, Lobb, Granger, Viswanathan, Ramya, Hu, Lin, Inazuki, Yukio, Nishikawa, Kazuhiro

المساهمون: Yoshioka, Nobuyuki

المصدر: SPIE Proceedings ; Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2241480

المؤلفون: Zweber, Amy, Toda, Yusuke, Sakamoto, Yoshifumi, Faure, Thomas, Rankin, Jed, Nash, Steven, Kagawa, Masayuki, Fahrenkopf, Michael, Isogawa, Takeshi, Wistrom, Richard

المساهمون: Kasprowicz, Bryan S., Buck, Peter D.

المصدر: SPIE Proceedings ; Photomask Technology 2016 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2243683

المؤلفون: Seki, Kazunori, Badger, Karen, Zhengqing John Qi, Hibbs, Michael, Rankin, Jed, Isogawa, Takeshi, Narita, Eisuke, Akima, Shinji, Bonam, Ravi, Halle, Scott

الاتاحة: https://dx.doi.org/10.13140/rg.2.1.3674.8883
http://rgdoi.net/10.13140/RG.2.1.3674.8883

المؤلفون: Seki, Kazunori, Isogawa, Takeshi, Kagawa, Masayuki, Akima, Shinji, Kodera, Yutaka, Badger, Karen, Qi, Zhengqing John, Lawliss, Mark, Rankin, Jed, Bonam, Ravi

المساهمون: Yoshioka, Nobuyuki

المصدر: Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2197763

المؤلفون: Isogawa, Takeshi, Seki, Kazunori, Lawliss, Mark, Qi, Zhengqing John, Rankin, Jed, Akima, Shinji

المساهمون: Hayashi, Naoya, Kasprowicz, Bryan S.

المصدر: SPIE Proceedings ; Photomask Technology 2015 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2197761

المؤلفون: Turley, Christina, Rankin, Jed, Kindt, Louis, Lawliss, Mark, Bolton, Luke, Collins, Kevin, Cheong, Lin, Bonam, Ravi, Poro, Richard, Isogawa, Takeshi, Narita, Eisuke, Kagawa, Masayuki

المساهمون: Yoshioka, Nobuyuki

المصدر: Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2197383

المؤلفون: Isogawa, Takeshi, Seki, Kazunori, Lawliss, Mark, Qi, Zhengqing John, Rankin, Jed, Akima, Shinji

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS ; volume 15, issue 2, page 021010 ; ISSN 1932-5150

الاتاحة: http://dx.doi.org/10.1117/1.jmm.15.2.021010
http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=2505663

المؤلفون: Seki, Kazunori, Isogawa, Takeshi, Kagawa, Masayuki, Akima, Shinji, Kodera, Yutaka, Badger, Karen, Qi, Zhengqing John, Lawliss, Mark, Rankin, Jed, Bonam, Ravi

المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS ; volume 15, issue 2, page 021004 ; ISSN 1932-5150

الاتاحة: http://dx.doi.org/10.1117/1.jmm.15.2.021004
http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=2489596

المؤلفون: Lawliss, Mark, Gallagher, Emily, Hibbs, Michael, Seki, Kazunori, Isogawa, Takeshi, Robinson, Tod, LeClaire, Jeff

المساهمون: Ackmann, Paul W., Hayashi, Naoya

المصدر: SPIE Proceedings ; Photomask Technology 2014 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2069787

المؤلفون: Gallagher, Emily, Wagner, Alfred, Lawliss, Mark, McIntyre, Gregory, Seki, Kazunori, Isogawa, Takeshi, Nash, Steven

المساهمون: Kato, Kokoro

المصدر: SPIE Proceedings ; Photomask and Next-Generation Lithography Mask Technology XXI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2070871

المؤلفون: Isogawa, Takeshi, Seki, Kazunori, Lawliss, Mark, Gallagher, Emily, Akima, Shinji, Konishi, Toshio

المساهمون: Kato, Kokoro

المصدر: SPIE Proceedings ; Photomask and Next-Generation Lithography Mask Technology XXI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2070251

المؤلفون: Wistrom, Richard, Sakamoto, Yoshifumi, Panton, Jeffery, Faure, Thomas, Isogawa, Takeshi, McGuire, Anne

المساهمون: Faure, Thomas B., Ackmann, Paul W.

المصدر: SPIE Proceedings ; Photomask Technology 2013 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2026853

المؤلفون: Fukugami, Norihito, Matsui, Kazuaki, Watanabe, Genta, Isogawa, Takeshi, Kondo, Shinpei, Kodera, Yutaka, Sakata, Yo, Akima, Shinji, Kotani, Jun, Morimoto, Hiroaki, Tanaka, Tsuyoshi

المساهمون: Kato, Kokoro

المصدر: SPIE Proceedings ; Photomask and Next-Generation Lithography Mask Technology XIX ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.965536

المؤلفون: Ando, Akihiko, Yonetani, Masashi, Badger, Karen, Rankin, Jed, Akima, Shinji, Toda, Yusuke, Yoshida, Itaru, Kagawa, Masayuki, Isogawa, Takeshi, Kodera, Yutaka, Heumann, Jan, Birnstein, Anka

المصدر: Proceedings of SPIE; June 2019, Vol. 11178 Issue: 1 p111780D-111780D-7, 1006028p

المؤلفون: Yutaka Kodera, Sakata Yo, Takagi Noriaki, Isogawa Takeshi, Kazuaki Matsui, Akima Shinji

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Engineering drawing, Fabrication, Materials science, business.industry, Fabrication methods, Extreme ultraviolet lithography, parasitic diseases, technology, industry, and agriculture, Optoelectronics, business, Multi layer, Blank, Characterization (materials science)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3fe3fd542967f7bd784ca0a38adc03a1
https://doi.org/10.1117/12.975824

المؤلفون: Takehisa, Kiwamu, Seki, Kazunori, Badger, Karen, Yonetani, Masashi, Birnstein, Anka, Heumann, Jan, Isogawa, Takeshi, Konishi, Toshio, Kodera, Yutaka

المصدر: Proceedings of SPIE; June 2018, Vol. 10807 Issue: 1 p108070D-108070D-8, 972639p

المؤلفون: Kasprowicz, Bryan S., Buck, Peter D., Zweber, Amy, Toda, Yusuke, Sakamoto, Yoshifumi, Faure, Thomas, Rankin, Jed, Nash, Steven, Kagawa, Masayuki, Fahrenkopf, Michael, Isogawa, Takeshi, Wistrom, Richard

المصدر: Proceedings of SPIE; October 2016, Vol. 9985 Issue: 1 p99851J-99851J-12, 9885262p

المؤلفون: Yoshioka, Nobuyuki, Seki, Kazunori, Isogawa, Takeshi, Kagawa, Masayuki, Akima, Shinji, Kodera, Yutaka, Badger, Karen, Qi, Zhengqing J., Lawliss, Mark, Rankin, Jed, Bonam, Ravi

المصدر: Proceedings of SPIE; July 2015, Vol. 9658 Issue: 1 p96580G-96580G-9, 869230p