المؤلفون: Jinhao Zhu, Liwan Yue, Qiang Wu, Yanli Li

المصدر: Alexandria Engineering Journal, Vol 109, Iss , Pp 871-883 (2024)

مصطلحات موضوعية: Bi-line/tri-line, Negative Tone Development, Multiple Patterning Technology, ArF immersion lithography, OPC, Process simulation, Engineering (General). Civil engineering (General), TA1-2040

وصف الملف: electronic resource

Relation: http://www.sciencedirect.com/science/article/pii/S1110016824011384; https://doaj.org/toc/1110-0168

URL الوصول: https://doaj.org/article/05fafb7bb61549f58c501386d5ac1854

المؤلفون: Kurt Ronse

المصدر: Micro and Nano Engineering, Vol 23, Iss , Pp 100263- (2024)

مصطلحات موضوعية: Optical lithography, Extreme ultra-violet lithography (EUV), Immersion lithography (ArFi), Resist, Scaling, Moore's law, Electronics, TK7800-8360, Technology (General), T1-995

وصف الملف: electronic resource

Relation: http://www.sciencedirect.com/science/article/pii/S2590007224000261; https://doaj.org/toc/2590-0072

URL الوصول: https://doaj.org/article/fc691179b70643f6adf827dd6659b684

المؤلفون: Kut King Kan, Warren, Guerber, Sylvain, Garcia, Stéphanie, Fowler, Daivid, Alonso-Ramos, Carlos

المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Centre de Nanosciences et de Nanotechnologies (C2N), Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), European Project

المصدر: Optical Wireless Communication Conference ; https://hal.science/hal-04598641 ; Optical Wireless Communication Conference, Dec 2023, Eindhoven, Netherlands

مصطلحات موضوعية: Silicon photonics, Optical phased array (OPA), Optical antenna, Free space communications, Immersion lithography, [PHYS]Physics [physics]

جغرافية الموضوع: Eindhoven, Netherlands

Relation: hal-04598641; https://hal.science/hal-04598641; https://hal.science/hal-04598641/document; https://hal.science/hal-04598641/file/KutKingKan_Antenna_for_a_two-dimensional_integrated_Optical_Phased_Array.pdf

الاتاحة: https://hal.science/hal-04598641
https://hal.science/hal-04598641/document
https://hal.science/hal-04598641/file/KutKingKan_Antenna_for_a_two-dimensional_integrated_Optical_Phased_Array.pdf

المؤلفون: Kan, Warren Kut King, Toxqui-Rodriguez, Sara, Medina-Quiroz, David, Nuño-Ruano, Paula, Melati, Daniele, Cassan, Eric, Marris-Morini, Delphine, Vivien, Laurent, Cheben, Pavel, Adelmini, Laeticia, Fowler, Daivid, Alonso-Ramos, Carlos

المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Centre de Nanosciences et de Nanotechnologies (C2N), Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), National Research Council of Canada (NRC), European Project

المصدر: 2023 Photonics North (PN)
https://hal.science/hal-04598612
2023 Photonics North (PN), Jun 2023, Montreal, Canada. pp.1-1, ⟨10.1109/PN58661.2023.10222958⟩

مصطلحات موضوعية: Silicon photonics, subwavelength grating nanostructures, ultra-broadband MMI, immersion lithography, [PHYS]Physics [physics]

جغرافية الموضوع: Montreal

Time: Montreal, Canada

Relation: hal-04598612; https://hal.science/hal-04598612; https://hal.science/hal-04598612/document; https://hal.science/hal-04598612/file/Published_Paper_MMI_SWG_imm_litho_2023_06.pdf

الاتاحة: https://hal.science/hal-04598612
https://hal.science/hal-04598612/document
https://hal.science/hal-04598612/file/Published_Paper_MMI_SWG_imm_litho_2023_06.pdf
https://doi.org/10.1109/PN58661.2023.10222958

المؤلفون: Hu, Liang¹, Wu, Min¹, Chen, Wenyu¹, Xie, Haibo¹ hbxie@zju.edu.cn, Fu, Xin¹

المصدر: Experimental Thermal & Fluid Science. Oct2017, Vol. 87, p50-59. 10p.

مصطلحات موضوعية: *GAS-liquid interfaces, *IMMERSION lithography, *IMMERSION in liquids, *INTERFACES (Physical sciences), *SEA surface microlayer

المؤلفون: Fu, Xin¹, Huang, Yao¹, Hu, Liang¹ cmeehuli@zju.edu.cn, Xie, Haibo¹, Chen, Wenyu¹

المصدر: Flow Measurement & Instrumentation. Mar2017 Part B, Vol. 53 Issue Part B, p190-203. 14p.

مصطلحات موضوعية: *ELECTRONIC behavior control, *IMMERSION lithography, *SEMICONDUCTORS, *INDUSTRIAL contamination, *MENISCUS (Liquids)

المؤلفون: Li, Xiaoping¹, Zhao, Yiwen¹, Lei, Min¹ leimin2521@hotmail.com

المصدر: Flow Measurement & Instrumentation. Mar2017 Part B, Vol. 53 Issue Part B, p317-325. 9p.

مصطلحات موضوعية: *AUTOMATIC control systems, *IMMERSION lithography, *TIME delay systems, *ROBUST control, *TEMPERATURE control

المؤلفون: Boogaard, Arjen¹, Smith, Ian², Mouraille, Orion¹, Knaapen, Thijs¹, Stegen, Raf¹

المصدر: IEEE Transactions on Semiconductor Manufacturing. Aug2013, Vol. 26 Issue 3, p423-429. 7p.

مصطلحات موضوعية: IMMERSION lithography, SEMICONDUCTOR equipment, ACQUISITION of data, PHOTOLITHOGRAPHY, PREDICTION models

المؤلفون: French, Roger H.¹ roger.h.french@usa.dupont.com, Tran, Hoang V.¹

المصدر: Annual Review of Materials Research. 2009, Vol. 39 Issue 1, p93-126. 24p.

مصطلحات موضوعية: IMMERSION lithography, REFRACTIVE index, LIQUIDS, PHOTORESISTS, MATERIALS testing, LITHOGRAPHY

المؤلفون: Khorram, Hamid R.¹, Nakano, Katsushi², Sagawa, Natsuko², Fujiwara, Tomoharu², Iriuchijima, Yasuhiro², Sei, Toshihiko², Takahiro, Tomioka², Nakamura, Keichi², Shiraishi, Kenichi², Hayashi, Tsunehito²

المصدر: IEEE Transactions on Semiconductor Manufacturing. Feb2012, Vol. 25 Issue 1, p63-71. 9p.

مصطلحات موضوعية: IMMERSION lithography, SWITCHING circuits, PHOTORESISTS, POINT defects, LITHOGRAPHY, CONTACT angle, SILICON, WATER pollution

المؤلفون: Khorram, Hamid R.¹, Nakano, Katsushi¹, Sagawa, Natsuko¹, Fujiwara, Tomoharu¹, Iriuchijima, Yasuhiro¹, Sei, Toshi¹, Takahiro, Tomioka¹, Nakamura, Keichi¹, Shiraishi, Kenichi¹, Hayashi, Tsunehito¹

المصدر: IEEE Transactions on Semiconductor Manufacturing. 05/01/2011, Vol. 24 Issue 2, p173-181. 9p.

مصطلحات موضوعية: *SEMICONDUCTOR industry, IMMERSION lithography, PHOTORESISTS, IMAGING systems, WATER pollution, ADHESIVES, CONTACT angle, SEMICONDUCTOR wafers

المؤلفون: Matsui, Yoshinori yoshinori.matsui@necel.com, Onoda, Naka, Nagahara, Seiji, Uchiyama, Takayuki

المصدر: IEEE Transactions on Semiconductor Manufacturing. Nov2009, Vol. 22 Issue 4, p438-442. 5p. 2 Black and White Photographs, 1 Chart, 2 Graphs.

مصطلحات موضوعية: IMMERSION lithography, THIN films, SEMICONDUCTOR wafers, CHEMICAL vapor deposition, SOLID state electronics

المؤلفون: Liang Hu¹, Mingbo Li¹, Wenyu Chen¹, Haibo Xie¹ hbxie@zju.edu.cn, Xin Fu¹

المصدر: Physics of Fluids. 2016, Vol. 28 Issue 8, p1-20. 20p. 1 Color Photograph, 4 Diagrams, 1 Chart, 10 Graphs.

مصطلحات موضوعية: *IMMERSION lithography, *POROUS materials, *PERMEABILITY, *FLUID flow, *BUBBLES, *FLUID mechanics

المؤلفون: Benedikovic, Daniel, Alonso-Ramos, Carlos, Guerber, Sylvain, Dupre, Cecilia, Szelag, Bertrand, Le Roux, Xavier, Cheben, Pavel, Fowler, Daivid, Marcaud, Guillaume, Vakarin, Vladyslav, Perez-Galacho, Diego, Marris-Morini, Delphine, Cassan, Eric, Baudot, Charles, Boeuf, Frédéric, Vivien, Laurent

المساهمون: Centre de Nanosciences et Nanotechnologies (C2N (UMR_9001)), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), Centre de Nanosciences et de Nanotechnologies Orsay (C2N), Université Paris-Sud - Paris 11 (UP11)-Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), Centre de Nanosciences et de Nanotechnologies Marcoussis (C2N), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), STMicroelectronics Crolles (ST-CROLLES), Institut d'électronique fondamentale (IEF), National Research Council of Canada (NRC), European Project: 647342,H2020,ERC-2014-CoG,POPSTAR(2015)

المصدر: SPIE OPTO Smart Photonic and Optoelectronic Integrated Circuits XXII ; https://hal.science/hal-02539636 ; SPIE OPTO Smart Photonic and Optoelectronic Integrated Circuits XXII, Jan 2020, San Francisco, California, United States. ⟨10.1117/12.2543489⟩

مصطلحات موضوعية: silicon photonics, complementary metal-oxide semiconductor technology, fiber-chip optical interface, surface grating couplers, sub-wavelength grating metamaterials, deep-ultraviolet lithography, immersion lithography, [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics

جغرافية الموضوع: San Francisco, California, United States

Relation: info:eu-repo/grantAgreement//647342/EU/Low power consumption silicon optoelectronics based on strain and refractive index engineering/POPSTAR; hal-02539636; https://hal.science/hal-02539636; https://hal.science/hal-02539636/document; https://hal.science/hal-02539636/file/011C_Benedikovic%20et%20al.%20-%202020%20-%20SPIE%20Photonics%20West%20A.pdf

الاتاحة: https://hal.science/hal-02539636
https://hal.science/hal-02539636/document
https://hal.science/hal-02539636/file/011C_Benedikovic%20et%20al.%20-%202020%20-%20SPIE%20Photonics%20West%20A.pdf
https://doi.org/10.1117/12.2543489

المؤلفون: Ronse, Kurt¹, Jansen, Philippe¹ philippe.jansen@imec.be, Gronheid, R.¹, Hendrickx, Eric¹, Maenhoudt, M.¹, Wiaux, Vincent¹, Goethals, Anne-Marie¹, Jonckheere, R.¹, Vandenberghe, G.¹

المصدر: IEEE Transactions on Circuits & Systems. Part I: Regular Papers. Aug2009, Vol. 56 Issue 8, p1883-1890. 8p.

مصطلحات موضوعية: *COST effectiveness, IMMERSION lithography, OPTICAL materials, ULTRAVIOLET radiation, RETICLES

المؤلفون: Brandt, Pieter¹ pieter.brandt@mapperlithography.com, Sardana, Charu² csardana@altera.com, Ibbotson, Dale², Wieland, Marco¹, Fay, Aurelien³

المصدر: Journal of Micro/Nanolithography, MEMS & MOEMS. Jul2015, Vol. 14 Issue 3, p1-6. 6p.

مصطلحات موضوعية: *IMMERSION lithography, *MICROELECTRONICS research, *IMMERSION in liquids, *LITHOGRAPHY, *WATER immersion

المؤلفون: Jao, Pit Fee¹, Franca, Eric W.², Fang, Sheng-Po², Wheeler, Bruce C.², Yoon, Yong-Kyu¹

المصدر: Journal of Microelectromechanical Systems. Jun2015, Vol. 24 Issue 3, p703-715. 13p.

مصطلحات موضوعية: *IMMERSION lithography, *PHOTOLITHOGRAPHY, *CARBON nanofibers, *MICROELECTRODES, *ELECTRIC conductivity, *OPTICAL diffraction, *BIOCOMPATIBILITY

المؤلفون: VOGLER, DEBRA¹

المصدر: Solid State Technology. Jun2014, Vol. 57 Issue 4, p14-16. 3p.

مصطلحات موضوعية: *SEMICONDUCTOR industry, IMMERSION lithography, IMMERSION in liquids, ELECTRON beams

الشركة/الكيان: NIKON Corp.

المؤلفون: Kut King Kan, Warren

المساهمون: Centre de Nanosciences et de Nanotechnologies (C2N), Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), Université Paris-Saclay, Carlos Alonso-Ramos, Daivid Fowler

المصدر: https://theses.hal.science/tel-04805235 ; Micro and nanotechnologies/Microelectronics. Université Paris-Saclay, 2024. English. ⟨NNT : 2024UPAST099⟩.

مصطلحات موضوعية: Subwavelength grating metamaterials, Silicon photonics, Immersion lithography, Multi-Mode interference (MMI) coupler, Grating coupler, Optical phased array (OPA), Métamatériau sub-Longueur d'onde, Photonique sur silicium, Lithographie à immersion, Interféromètre multi-Mode, Réseau de couplage, Antennes optiques à réseau de phase, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic

Relation: NNT: 2024UPAST099

الاتاحة: https://theses.hal.science/tel-04805235
https://theses.hal.science/tel-04805235v1/document
https://theses.hal.science/tel-04805235v1/file/130490_KUT_KING_KAN_2024_archivage.pdf

المؤلفون: Savage, Neil

المصدر: Communications of the ACM; Nov2017, Vol. 60 Issue 11, p12-14, 3p, 1 Diagram

مصطلحات موضوعية: BLOCK copolymers, TRANSISTOR design & construction, MOLECULAR self-assembly, IMMERSION lithography, EXTREME ultraviolet lithography, PHOTOLITHOGRAPHY