المؤلفون: Yaniv Abramovitz, Jeong-Ho Yeo, Taekwon Jee, Honggoo Lee, Sangho Lee, Chanha Park

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7ad42fa189535291ad28f6d54e31f1b6
https://doi.org/10.1117/12.2613931

المؤلفون: Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, DongSub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, DongYoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::87c2c7efc3be8f8bbcc7e2039896893f
https://doi.org/10.1117/12.2608053

المؤلفون: Philip Groeger, Ulrich Denker, Robin Zech, Stefan Buhl, Matthias Ruhm, Mingyu Kim, Hongseok Jang, Chunsoo Kang, DongYoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee, Chanha Park, DongSub Choi, Jeonghoon Lee

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9448f397f1a5148d5ab98e8292243c56
https://doi.org/10.1117/12.2607571

المؤلفون: Vladimir Levinski, Yuri Paskover, Sharon Aharon, Daria Negri, Nadav Gutman, Nireekshan Reddy Kothakapu, Jeongpyo Lee, Hedvi Spielberg, DongYoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Hongseok Jang, Honggoo Lee, Sangho Lee

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8e3f04d821d4b9f0b6190cd4e899c118
https://doi.org/10.1117/12.2613981

المؤلفون: Moran Zaberchik, Scott Beatty, Sanghuck Jeon, Nir BenDavid, Chanha Park, Sang Ho Lee, Dongsub Choi, Dongyoung Lee, Telly Koffas, Chen Li, Ramkumar Karur-Shanmugam, Dongsoo Kim, Honggoo Lee, Jae Young Park, Hedvi Spielberg, Efi Megged, Dohwa Lee

المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

مصطلحات موضوعية: Normalization (statistics), Reduction (complexity), Maxima and minima, Computer science, Brute-force search, Process optimization, Overlay, Statistical process control, Algorithm, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::40281cffdd759f39620381e8b04e1092
https://doi.org/10.1117/12.2583638

المؤلفون: Chanha Park, Xiaolei Liu, Dongyoung Lee, Chen Dror, Eltsafon Ashwal, Dongsoo Kim, Sanghuck Jeon, Zephyr Liu, Katya Gordon, Honggoo Lee, Eitan Hajaj, Mark Ghinovker, Diana Shaphirov, Sang-Ho Lee, Dongsub Choi, Dohwa Lee, Raviv Yohanan

المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

مصطلحات موضوعية: Reduction (complexity), business.industry, Robustness (computer science), Computer science, Receiver autonomous integrity monitoring, Process (computing), Overlay, business, Grid, Computer hardware, Dram, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0c6be2fb79531aea498fc923d2afaeb1
https://doi.org/10.1117/12.2584524

المؤلفون: Anna Golotsvan, Efi Megged, Roie Volkivich, Dohwa Lee, Dongsub Choi, Jaesun Woo, Sanghuck Jeon, Jin-Soo Kim, Seongjae Lee, Dongyoung Lee, Honggoo Lee, Chunsoo Kang, Chanha Park, Shlomit Katz

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.

مصطلحات موضوعية: Computer science, Electronic engineering, NAND gate, Tuner, Node (circuits), Overlay, Grating, Lithography, Dram, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7036c662aaea6e4c5a3625f36eb48f37
https://doi.org/10.1117/12.2541933

المؤلفون: Ik-Hyun Jeong, Sanghuck Jeon, Liran Yerushalmi, Dongsub Choi, Honggoo Lee, Ohad Bachar, Boaz Ophir, Hyun-Sok Kim, Seung-Woo Koo, Dong-Jin Lee, Jeongpyo Lee, Alexander Verner

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.

مصطلحات موضوعية: Ground truth, Accuracy and precision, Computer science, business.industry, Computation, Total measurement, Overlay, Machine learning, computer.software_genre, Metrology, Node (circuits), Artificial intelligence, business, computer, Dram

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::83c1af938611bc489c437d241b6a6b12
https://doi.org/10.1117/12.2551850

المؤلفون: Jun-Yeob Kim, Dongyoung Lee, Sangjun Han, Aileen Soco, Nang-Lyeom Oh, Chanha Park, Tjitte Nooitgedagt, Dong-Hak Lee, Arno van Leest, Honggoo Lee, Jaap Karssenberg, Mir Shahrjerdy

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.

مصطلحات موضوعية: Scanner, Stack (abstract data type), Computer science, Electronic engineering, NAND gate, Overlay, Lithography, Signal, Communication channel, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0f9f52b2fdc4cec90bd1e0ff7c1730fe
https://doi.org/10.1117/12.2515299

المؤلفون: Chanha Park, Minhyung Hong, Sangjun Han, John C. Robinson, Jieun Lee, Tal Marciano, Zephyr Liu, Dana Klein, Dongsub Choi, Roie Volkovich, Ahlin Choi, Hao Mei, Eitan Hajaj, Dohwa Lee, Lilach Saltoun, Jung-Tae Lee, Eitan Herzel, Wayne (Wei) Zhou, Dongyoung Lee, Anna Golotsvan, Jeongpyo Lee, Honggoo Lee, Eran Amit, Sanghuck Jeon, Seongjae Lee

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.

مصطلحات موضوعية: Computer science, Robustness (computer science), Extreme ultraviolet lithography, Electronic engineering, Process control, NAND gate, Overlay, Dram, Metrology, Numerical aperture

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a8a0933a14a7bfd8a38c5715b72d8f3f
https://doi.org/10.1117/12.2515015

المؤلفون: Honggoo, Lee, Aharon, Sharon, Ben-Dov, Guy, Golotsvan, Anna, Klein, Dana, Marciano, Tal, Saltoun, Lilach, Kang, Yoonshik, Shim, Kyuchan, Hong, Minhyung, Han, Sangjun, Kim, Seungyoung, Lee, Jieun, Lee, Dongyoung, Oh, Eungryong, Choi, Ahlin, Kim, Youngsik, Hajaj, Eitan, Serero, Dan

المساهمون: Adan, Ofer, Ukraintsev, Vladimir A.

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII

الاتاحة: http://dx.doi.org/10.1117/12.2300153

المؤلفون: Roie Volkovich, Eran Amit, Jungtae Lee, Einat Peled, Sangjun Han, Sanghuck Jeon, Minhyung Hong, Jieun Lee, Seungyoung Kim, Seongjae Lee, Tal Yaziv, Honggoo Lee, Dana Klein, Dongsub Choi, Anat Marchelli, Alexander Svizher, Dongyoung Lee, Dohwa Lee, Yuval Lamhot, Aaron Cheng, Ahlin Choi, Eungryong Oh, Jeongpyo Lee, John C. Robinson, Zephyr Liu

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.

مصطلحات موضوعية: Process variation, Apodization, Robustness (computer science), law, Computer science, Electronic engineering, Wafer, Overlay, Laser, Tunable laser, Metrology, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2790de4e8c4d0bdd133a3ff51e49279a
https://doi.org/10.1117/12.2300507

المؤلفون: Sangjun Han, Seungyoung Kim, Rovira Pablo, Markus Mengel, Nakyoon Kim, Getin Raphael Jean Michel Marie, Dongsub Choi, Sanghuck Jeon, Minhyung Hong, Honggoo Lee, Jieun Lee, Ahlin Choi, Sungchul Yoo, Dongyoung Lee, Eungryong Oh, John C. Robinson

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.

مصطلحات موضوعية: Scanner, Signal-to-noise ratio, Computer science, Electronic engineering, Node (circuits), Focus (optics), Lithography, Noise (electronics), Critical dimension, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9956046e15695445bb7657cca6b6efce
https://doi.org/10.1117/12.2299976

المؤلفون: Seungyoung Kim, Sangjun Han, Hyowon Park, Minhyung Hong, Sanghuck Jeon, Stilian Ivanov Pandev, Waley Liang, Ahlin Choi, Jieun Lee, Dongyoung Lee, Jeongpyo Lee, Eungryong Oh, Nakyoon Kim, John C. Robinson, Honggoo Lee, Dongsub Choi

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.

مصطلحات موضوعية: Computer science, Semiconductor device fabrication, Control system, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Process control, Wafer, Overlay, Feedback loop, Dram, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::636aeb5a1687df3dca41b199e91a19f5
https://doi.org/10.1117/12.2300946

المؤلفون: Michael E. Adel, Mark D. Smith, Sangjun Han, Dongsub Choi, Myungjun Lee, Efi Megged, Anna Golotsvan, Joonseuk Lee, Tal Itzkovich, Amnon Manassen, Yuri Paskover, Victoria Naipak, Dohwa Lee, Tom Leviant, Honggoo Lee, Zephyr Liu, Vladimir Levinski, Mi-Rim Jung, Young-Sik Kim

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer science, business.industry, Process (computing), 02 engineering and technology, Overlay, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, 010309 optics, Process variation, Optics, 0103 physical sciences, Process window, 0210 nano-technology, business, Lithography, Computer hardware

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::305ceb1659a85f9daa6b6d66fd9b6170
https://doi.org/10.1117/12.2258376

المؤلفون: Dongsub Choi, Sangjun Han, Mark D. Smith, Junbeom Park, Sanghuck Jeon, Jaeson Woo, Pradeep Vukkadala, Kevin Huang, Fatima Anis, Hoyoung Heo, Chang-Rock Song, Honggoo Lee, John C. Robinson

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Semiconductor device fabrication, Computer science, NAND gate, Geometry, 02 engineering and technology, Overlay, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, 010309 optics, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Process control, Wafer testing, Wafer, 0210 nano-technology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::252bfb06ec97907356c947a266a2d111
https://doi.org/10.1117/12.2257834

المؤلفون: Seungyoung Kim, Honggoo Lee, Sangjun Han, Seop Kim, Stefan Buhl, Boris Habets, Wan-Soo Kim, Jaesun Woo

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Semiconductor, Computer science, Process (engineering), business.industry, Deposition (phase transition), Nanotechnology, Wafer, business, Process engineering, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::483207d892a9936403103a9ec343d032
https://doi.org/10.1117/12.2257978

المؤلفون: Irina Brinster, Dongyoung Lee, Dongsub Choi, Honggoo Lee, Jaeson Woo, Hoyoung Heo, Chang-Rock Song, Sangjun Han, John C. Robinson

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Computer science, Node (networking), Real-time computing, Process (computing), 02 engineering and technology, Overlay, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, 010309 optics, Sampling (signal processing), 0103 physical sciences, Process control, 0210 nano-technology, Throughput (business)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2b6376ef2b5f84a7c5a8b70e0ecafbd4
https://doi.org/10.1117/12.2257836

المؤلفون: Kou Weitian, Sangjun Han, Jaesun Woo, Honggoo Lee, Alexander Ypma, Junghwan Moon, Hank Han, Paul Böcker, Daan Slotboom, Marc Hauptmann, Hyun-Woo Yu, Michiel Kupers, Chang-Rock Song

المصدر: SPIE Proceedings.

مصطلحات موضوعية: business.industry, Computer science, Rework, ComputerApplications_COMPUTERSINOTHERSYSTEMS, 02 engineering and technology, Overlay, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, Metrology, 010309 optics, Set (abstract data type), law, 0103 physical sciences, Electronic engineering, Wafer, Photolithography, 0210 nano-technology, business, Computer network

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::755f1205ad3b2ba7fe68cc625dc93e60
https://doi.org/10.1117/12.2259846

المؤلفون: Dongsub Choi, Myungjun Lee, Zephyr Liu, Vladimir Levinski, Michael E. Adel, Tal Itzkovich, Sangjun Han, Mi-Rim Jung, Young-Sik Kim, Kangsan Lee, Mark D. Smith, Ady Levy, Dohwa Lee, Honggoo Lee, Joonseuk Lee

المصدر: SPIE Proceedings.

مصطلحات موضوعية: business.industry, Computer science, Process (computing), 02 engineering and technology, Overlay, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, Metrology, 010309 optics, Optics, law, Dimensional metrology, 0103 physical sciences, Electronic engineering, Process window, Photolithography, 0210 nano-technology, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e44c54bc168e356e764d66526b929b5c
https://doi.org/10.1117/12.2218653