المؤلفون: Hoffmann, Karl E., Asteiner, Michael, Speckbacher, Peter

المصدر: Microelectronic Engineering ; volume 143, page 1-4 ; ISSN 0167-9317

الاتاحة: http://dx.doi.org/10.1016/j.mee.2014.12.010
https://api.elsevier.com/content/article/PII:S0167931714005334?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0167931714005334?httpAccept=text/plain

المؤلفون: Rommel, Marcus, Hoffmann, Karl E., Reindl, Thomas, Weis, Jürgen, Unal, Nezih, Hofmann, Ulrich

المصدر: Microelectronic Engineering ; volume 98, page 202-205 ; ISSN 0167-9317

الاتاحة: http://dx.doi.org/10.1016/j.mee.2012.07.032
https://api.elsevier.com/content/article/PII:S0167931712003140?httpAccept=text/xml
https://api.elsevier.com/content/article/PII:S0167931712003140?httpAccept=text/plain

المؤلفون: Asteiner, Michael, Schlemmer, Christian, Speckbacher, Peter, Hoffmann, Karl E.

المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Jul/Aug2016, Vol. 34 Issue 4, p1-5, 5p

مصطلحات موضوعية: ELECTRON beam lithography, GAUSSIAN beams, SILICONES, PHOTOMASKS, MONTE Carlo method

المؤلفون: Hoffmann, Karl E., Schmoranzer, Hans

المصدر: Scanning Electron Microscopy

مصطلحات موضوعية: Transport equation, elastic electron scattering, inelastic electron scattering, electron multiple scattering, electron matter interaction, electron energy deposition, electron backscattering, energy distribution of backscattered electrons, Biology

وصف الملف: application/pdf

Relation: https://digitalcommons.usu.edu/electron/vol1982/iss1/18; https://digitalcommons.usu.edu/context/electron/article/1109/viewcontent/WDCcenterselec1982HoffmanSchmoranzer_InelasticElasticMultiple.pdf

الاتاحة: https://digitalcommons.usu.edu/electron/vol1982/iss1/18
https://digitalcommons.usu.edu/context/electron/article/1109/viewcontent/WDCcenterselec1982HoffmanSchmoranzer_InelasticElasticMultiple.pdf