المؤلفون: Syuhei Shigaki, Ho Bang Ching, Yaguchi Hiroaki, Ryuji Onishi, Suguru Sassa, Endo Takafumi, Noriaki Fujitani, Rikimaru Sakamoto

المصدر: ECS Transactions. 60:263-271

مصطلحات موضوعية: Materials science, Silicon, business.industry, Extreme ultraviolet lithography, chemistry.chemical_element, Substrate (electronics), Photoresist, Optics, chemistry, Stack (abstract data type), Resist, Etching (microfabrication), Optoelectronics, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::345c909f4f4f1a5288a4459d80b0c5ef
https://doi.org/10.1149/06001.0263ecst

المؤلفون: Shibayama, Wataru, Shigaki, Shuhei, Sakamoto, Rikimaru, Onishi, Ryuji, Yaguchi, Hiroaki, Ho, Bang Ching

المساهمون: Naulleau, Patrick P.

المصدر: Extreme Ultraviolet (EUV) Lithography IV ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2011441

المؤلفون: Sakamoto, Rikimaru, Sakaida, Yasushi, Ho, Bang-Ching

المساهمون: Somervell, Mark H.

المصدر: SPIE Proceedings ; Advances in Resist Materials and Processing Technology XXX ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2011511

المؤلفون: Fujitani, Noriaki, Sakamoto, Rikimaru, Endo, Takafumi, Onishi, Ryuji, Nishita, Tokio, Yaguchi, Hiroaki, Ho, Bang-Ching

المساهمون: Somervell, Mark H.

المصدر: SPIE Proceedings ; Advances in Resist Materials and Processing Technology XXX ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2011489