المؤلفون: Hiroaki Kikuchi, Chihiro Sumida, Hiroaki Uetake, Shin Yabukami, Shuichiro Hashi, Kazushi Ishiyama

المصدر: AIP Advances, Vol 7, Iss 5, Pp 056617-056617-6 (2017)

مصطلحات موضوعية: Physics, QC1-999

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2158-3226

URL الوصول: https://doaj.org/article/f558fd3a051a4339a956ff640d959e7c

المؤلفون: Hiroaki Kikuchi, Suguru Oe, Hiroaki Uetake, Shin Yabukami

المصدر: AIP Advances, Vol 7, Iss 5, Pp 056602-056602-5 (2017)

مصطلحات موضوعية: Physics, QC1-999

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2158-3226

URL الوصول: https://doaj.org/article/a9990c1f72b949b99c1eb698471d757e

المؤلفون: T. Moriizumi, Ryoichi Utsumi, T. Ozawa, K. Kusunoki, Hiroaki Uetake, Shin Yabukami, H. Yamada, Yutaka Shimada

المصدر: Journal of the Magnetics Society of Japan. 41:25-28

مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Microstrip, Electronic, Optical and Magnetic Materials, 0103 physical sciences, Permeability measurements, Optoelectronics, Electrical and Electronic Engineering, Thin film, 0210 nano-technology, business, Instrumentation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::355fc3ab1d8f54f0dc239096bc7f0c7b
https://doi.org/10.3379/msjmag.1701r002

المؤلفون: Takuya Shima, Shin Yabukami, Hiroaki Kikuchi, Hiroaki Uetake

المصدر: IEEE Magnetics Letters. 7:1-5

مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Magnetic susceptibility, Electronic, Optical and Magnetic Materials, Hysteresis, Nuclear magnetic resonance, 0103 physical sciences, Optoelectronics, Thin film, Magnetic force microscope, 0210 nano-technology, business, Anisotropy, Image resolution, Electrical impedance, Magneto impedance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6c5134da9658be48984fd96adcebba52
https://doi.org/10.1109/lmag.2016.2614795

المؤلفون: Y. Miyazawa, Shin Yabukami, H. Yamada, T. Ozawa, Yutaka Shimada, Hiroaki Uetake, K. Kusunoki

المصدر: Journal of the Magnetics Society of Japan. 39:111-115

مصطلحات موضوعية: Materials science, Permeability (electromagnetism), Permeability measurements, Magnetic films, Skin effect, Electrical and Electronic Engineering, Composite material, Condensed Matter Physics, Instrumentation, Microstrip, Electronic, Optical and Magnetic Materials

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f95d4d8eabb3d0365029a8836de1df05
https://doi.org/10.3379/msjmag.1504r005

المؤلفون: Shin Yabukami, Nobukiyo Kobayashi, T. Ozawa, Ken Ichi Arai, Toshiya Kawakami, Hiroaki Uetake

المصدر: IEEE Transactions on Magnetics. 50:1-4

مصطلحات موضوعية: Nuclear magnetic resonance, Materials science, business.industry, Thin film sensor, Optoelectronics, Electrical and Electronic Engineering, business, Line (electrical engineering), Electronic, Optical and Magnetic Materials, Highly sensitive

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::76dc10d35fffcd5ffaafd4c9e7f0bc8b
https://doi.org/10.1109/tmag.2014.2331676

المؤلفون: T. Kawakami, Hiroaki Uetake, Kenta Moriya, Shin Yabukami, T. Ozawa

المصدر: IEEE Transactions on Magnetics. 51:1-3

مصطلحات موضوعية: Carrier signal, Nuclear magnetic resonance, Materials science, Condensed matter physics, Sputtering, Sensitivity (control systems), Electrical and Electronic Engineering, Thin film, Electronic, Optical and Magnetic Materials, Line (formation), Magnetic field, Highly sensitive, Amorphous solid

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a507c6bb40f0413bf4bb8bb7146418dc
https://doi.org/10.1109/tmag.2015.2448552

المؤلفون: N. Kobayashi, T. Ozawa, T. Chiba, H. Suzuki, Hiroaki Uetake, Shin Yabukami, Ken Ichi Arai

المصدر: Journal of the Magnetics Society of Japan. 38:83-86

مصطلحات موضوعية: Permittivity, Materials science, business.industry, Phase (waves), Dielectric, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Magnetic field, Sensor array, Nondestructive testing, Optoelectronics, Electrical and Electronic Engineering, Thin film, business, Instrumentation, Electrical conductor

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8f4e5eae8d8a9876f772b3206298c4df
https://doi.org/10.3379/msjmag.1404r002

المؤلفون: Junichi Murota, Takashi Matsuura, Hiroaki Uetake, Shoichi Ono, Tadahiro Ohmi, Koichi Fukuda

المصدر: Applied Physics Letters. 59(22):2853-2855

مصطلحات موضوعية: Physics and Astronomy (miscellaneous), Silicon, Plasma-enhanced chemical vapor deposition, Chemistry, Analytical chemistry, chemistry.chemical_element, Plasma, Substrate (electronics), Chemical vapor deposition, Epitaxy, Plasma processing, Electron cyclotron resonance

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::42c13d6ab4f1d2d7b02396a3a319020e
http://hdl.handle.net/10097/47683

المؤلفون: Takashi Matsuura, Nobuo Mikoshiba, Koichi Fukuda, Hiroaki Uetake, Tadahiro Ohmi, Junichi Murota

المصدر: Applied Physics Letters. 57(6):596-598

مصطلحات موضوعية: Plasma etching, Physics and Astronomy (miscellaneous), Silicon, Chemistry, Plasma etcher, fungi, technology, industry, and agriculture, Analytical chemistry, chemistry.chemical_element, macromolecular substances, engineering.material, Electron cyclotron resonance, Polycrystalline silicon, stomatognathic system, X-ray photoelectron spectroscopy, Etching, engineering, Reactive-ion etching

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8e520b10754c100b260c324c5681c56e
http://hdl.handle.net/10097/47969

المؤلفون: Junichi Murota, Yoshihiro Yamashita, Kawashima Tadashi, Koichi Fukuda, Hiroaki Uetake, Takashi Matsuura, Tadahiro Ohmi, Nobuo Mikoshiba

المصدر: Applied Physics Letters. 56:1339-1341

مصطلحات موضوعية: Plasma etching, Physics and Astronomy (miscellaneous), Silicon, business.industry, Plasma etcher, technology, industry, and agriculture, Analytical chemistry, chemistry.chemical_element, engineering.material, Electron cyclotron resonance, Polycrystalline silicon, chemistry, Etching (microfabrication), engineering, Optoelectronics, Wafer, Reactive-ion etching, business

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f711d8b468579a4dbdb0d5d5d54b48d6
https://doi.org/10.1063/1.103203

المؤلفون: Hiroaki Uetake, Tadahiro Ohmi, Gang Su Jong

المصدر: Extended Abstracts of the 1993 International Conference on Solid State Devices and Materials.

مصطلحات موضوعية: Materials science, Standardization, Electronic engineering, Dual frequency, Plasma processing, Excitation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ab0e67c929bd6ec32dbf4357232c3ce4
https://doi.org/10.7567/ssdm.1993.pc-1-28

المؤلفون: Hiroaki Uetake, Nobuo Mikoshiba, Takashi Matsuura, Tadahiro Ohmi, Koichi Fukuda, Junichi Murota

المصدر: Extended Abstracts of the 1990 International Conference on Solid State Devices and Materials.

مصطلحات موضوعية: Materials science, chemistry, Chemisorption, Etching (microfabrication), Inorganic chemistry, High selectivity, Chlorine, chemistry.chemical_element, Plasma, Anisotropy, Nitrogen

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1c96528bfc9e1c387baa9bd8104c48b5
https://doi.org/10.7567/ssdm.1990.c-3-1

المؤلفون: Hiroaki Kikuchi, Kazushi Ishiyama, Hiroaki Uetake, Shin Yabukami, Suguru Oe, Tomoo Nakai, Shuichiro Hashi

المصدر: Physics Procedia. :1271-1278

مصطلحات موضوعية: Materials science, Uniform distribution (continuous), Condensed matter physics, Demagnetizing field, Physics and Astronomy(all), sensitivity, Ellipsoid, Nuclear magnetic resonance, thin-film, demagnetizing field distribution, Miniaturization, Sensitivity (control systems), Thin film, Magnetoimpedance, Electrical impedance

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::941a410f7b6ed647a40a208f96b62adb

المؤلفون: Hiroaki Uetake, Kouichi Fukuda, Kawashima Tadashi, Takashi Matsuura, Yoshihiro Yamashita, Nobuo Mikoshiba, Junichi Murota, Tadahiro Ohmi

المصدر: Extended Abstracts of the 1989 Conference on Solid State Devices and Materials.

مصطلحات موضوعية: Materials science, Silicon, chemistry, Etching (microfabrication), chemistry.chemical_element, Nanotechnology, Plasma, Selectivity

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6c9ee1667ff635efabc4350d51fced9b
https://doi.org/10.7567/ssdm.1989.b-1-1