يعرض 1 - 20 نتائج من 595 نتيجة بحث عن '"Himmerlich, A."', وقت الاستعلام: 0.61s تنقيح النتائج
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    المصدر: Krkotić , P , Calatroni , S , Himmerlich , M , Neupert , H , Perez-Fontenla , A T , Wackerow , S & Abdolvand , A 2024 , ' RF Characterisation of Laser Treated Copper Surfaces for the Mitigation of Electron Cloud in Accelerators ' , Journal of Physics: Conference Series , vol. 2687 , no. 8 , 082029 . https://doi.org/10.1088/1742-6596/2687/8/082029

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    مصطلحات موضوعية: Amorphous carbon, Particle accelerators, SEY, XPS, Raman spectroscopy

    وصف الملف: application/pdf

    Relation: info:eu-repo/grantAgreement/FCT/3599-PPCDT/CERN%2FFIS-TEC%2F0039%2F2019/PT; info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDB%2F00068%2F2020/PT; info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDP%2F00068%2F2020/PT; info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDB%2F04565%2F2020/PT; info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDP%2F04565%2F2020/PT; LA/P/0140/2020; IST-ID/131/2018; https://www.mdpi.com/1422-0067/24/16/12999; Bundaleski, N.; Adame, C.F.; Alves, E.; Barradas, N.P.; Cerqueira, M.F.; Deuermeier, J.; Delaup, Y.; Ferraria, A.M.; Ferreira, I.M.M.; Neupert, H.; et al. The Role of Hydrogen Incorporation into Amorphous Carbon Films in the Change of the Secondary Electron Yield. Int. J. Mol. Sci. 2023, 24, 12999. https://doi.org/10.3390/ijms241612999; https://hdl.handle.net/1822/87238; 12999

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    المصدر: Bez , E , Himmerlich , M , Beaudou , B , Reascos Portilla , A K , Wackerow , S , Rimoldi , M , Pfeiffer , S , Wiesendanger , M , Benabid , F , Taborelli , M , Abdolvand , A & Chiggiato , P 2023 , ' Picosecond pulsed 532 nm laser system for roughening and secondary electron yield reduction of inner surfaces of up to 15 m long tubes ' , Review of Scientific Instruments , vol. 94 , no. 10 , 103007 . https://doi.org/10.1063/5.0166156

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    المصدر: Uren , R , Din , A , Wackerow , S , Bez , E , Pfeiffer , S , Rimoldi , M , Himmerlich , M , Taborelli , M & Abdolvand , A 2023 , ' Out of focus ultrafast processing of metals for reduced secondary electron yield ' , Optical Materials Express , vol. 13 , no. 5 , pp. 1228-1240 . https://doi.org/10.1364/OME.484235

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    المساهمون: DF – Departamento de Física, CeFITec – Centro de Física e Investigação Tecnológica, DCM - Departamento de Ciência dos Materiais, CENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)

    Relation: Funding Information: info:eu-repo/grantAgreement/FCT/3599-PPCDT/CERN%2FFIS-TEC%2F0039%2F2019/PT; info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDB%2F00068%2F2020/PT; info:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UIDP%2F00068%2F2020/PT; PURE: 75754497; PURE UUID: 66d4aea9-eefd-4b63-b999-6e6b15b53671; Scopus: 85163747241; WOS: 001031341000001; ORCID: /0000-0002-8838-0364/work/151368139; ORCID: /0000-0002-3424-2847/work/151385473; http://hdl.handle.net/10362/159761; https://doi.org/10.1116/6.0002759