المؤلفون: Quanxin Jiang, Donglin Ma, Yantao Li, Changzi Chen

المصدر: Materials, Vol 16, Iss 23, p 7294 (2023)

مصطلحات موضوعية: high-power pulsed magnetron sputtering technology (HPPMS/HiPIMS), Ti film, stress, corrosion resistance, friction and wear resistance, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85

Relation: https://www.mdpi.com/1996-1944/16/23/7294; https://doaj.org/toc/1996-1944; https://doaj.org/article/4a2eb1f4cf19441c818ac27195caec8b

الاتاحة: https://doi.org/10.3390/ma16237294
https://doaj.org/article/4a2eb1f4cf19441c818ac27195caec8b

المؤلفون: Greczynski, Grzegorz, Zhirkov, Igor, Petrov, Ivan, Greene, Joseph E, Rosén, Johanna

المصدر: Thin Solid Films. 642:36-40

مصطلحات موضوعية: High power impulse magnetron sputtering, High power pulsed magnetron sputtering, Physical vapor deposition, Sputtering, Gas rarefaction, Transition metals

وصف الملف: electronic

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-142963
https://liu.diva-portal.org/smash/get/diva2:1156573/FULLTEXT01.pdf

المؤلفون: Donglin Ma, Qiaoyuan Deng, Huaiyuan Liu, Yongxiang Leng

المصدر: Coatings; Volume 11; Issue 5; Pages: 579

مصطلحات موضوعية: high power pulsed magnetron sputtering, Ti-N, ion energy, microstructure, residual stress, adhesion strength

وصف الملف: application/pdf

Relation: https://dx.doi.org/10.3390/coatings11050579

الاتاحة: https://doi.org/10.3390/coatings11050579

المؤلفون: Samuelsson, Mattias, Jensen, Jens, Helmersson, Ulf, Hultman, Lars, Högberg, Hans

المصدر: Thin Solid Films. 526:163-167

مصطلحات موضوعية: Zirconium diboride, Thin films, High power impulse magnetron sputtering, High power pulsed magnetron sputtering, Compound target, Industrial scale deposition system, Crystalline films, TECHNOLOGY, TEKNIKVETENSKAP

وصف الملف: electronic

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-79305
https://liu.diva-portal.org/smash/get/diva2:540327/FULLTEXT01.pdf

المؤلفون: Greczynski, Grzegorz, Jensen, Jens, Hultman, Lars

المصدر: Thin Solid Films. 519(19):6354-6361

مصطلحات موضوعية: High power impulse magnetron sputtering, High power pulsed magnetron sputtering, Chromium, Ionized physical vapor deposition, TECHNOLOGY, TEKNIKVETENSKAP

وصف الملف: electronic

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-69790
https://liu.diva-portal.org/smash/get/diva2:433582/FULLTEXT01.pdf

المؤلفون: Greczynski, Grzegorz, Jensen, Jens, Bohlmark, J, Hultman, Lars

المصدر: SURFACE and COATINGS TECHNOLOGY. 205(1):118-130

مصطلحات موضوعية: High power pulsed magnetron sputtering, HPPMS, High power impulse magnetron sputtering, HIPIMS, CrN, Magnetron sputtering, TECHNOLOGY, TEKNIKVETENSKAP

وصف الملف: electronic

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-60689
https://liu.diva-portal.org/smash/get/diva2:359878/FULLTEXT01.pdf

المؤلفون: Greczynski, Grzegorz, Jensen, Jens, Hultman, Lars

المصدر: IEEE TRANSACTIONS ON PLASMA SCIENCE. 38(11):3046-3056

مصطلحات موضوعية: CrN, high-power impulse magnetron sputtering (HiPIMS), high-power pulsed magnetron sputtering, magnetron sputtering, TECHNOLOGY, TEKNIKVETENSKAP

وصف الملف: electronic

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-63154
https://liu.diva-portal.org/smash/get/diva2:376664/FULLTEXT01.pdf

المؤلفون: Greczynski, Grzegorz, Hultman, Lars

المصدر: VACUUM. 84(9):1159-1170

مصطلحات موضوعية: High power pulsed magnetron sputtering, HPPMS, High power impulse magnetron sputtering, HIPIMS, Ion mass spectroscopy, Ion energy distribution, Plasma diagnostics, Ion flux, TECHNOLOGY, TEKNIKVETENSKAP

وصف الملف: electronic

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-56516
https://liu.diva-portal.org/smash/get/diva2:320077/FULLTEXT01.pdf

المؤلفون: Fuminori Misaizu, Hiroaki Yamamoto, Hiroshi Nishida, Keijiro Ohshimo, Keizo Tsukamoto, Kiyokazu Fuke, Masahide Tona, Masaomi Sanekata, Naoyuki Hirata, Nobuo Nishimiya, Yuki Nakagomi, 中込 雄基, 冨宅 喜代一, 塚本 恵三, 大下 慶次郎, 實方 真臣, 山本 宏晃, 平田 直之, 戸名 正英, 美齊津 文典, 西宮 信夫, 西田 寛

المصدر: JSAP Annual Meetings Extended Abstracts. 2020, :1114

المؤلفون: Bobzin, Kirsten, Kalscheuer, Christian, Carlet, Marco, Schulze, Christoph Franz Robert

المصدر: Thin solid films 742, 139028 (2022). doi:10.1016/j.tsf.2021.139028

مصطلحات موضوعية: info:eu-repo/classification/ddc/660, High Power pulsed magnetron sputtering, Hybrid deposition process, Optical emission

جغرافية الموضوع: DE

Relation: info:eu-repo/semantics/altIdentifier/issn/0040-6090; info:eu-repo/semantics/altIdentifier/wos/WOS:000784382300001; info:eu-repo/semantics/altIdentifier/issn/1879-2731; https://publications.rwth-aachen.de/record/844474; https://publications.rwth-aachen.de/search?p=id:%22RWTH-2022-03949%22

الاتاحة: https://publications.rwth-aachen.de/record/844474
https://publications.rwth-aachen.de/search?p=id:%22RWTH-2022-03949%22

المؤلفون: Geiser, Jürgen, Blankenburg, Sven

مصطلحات موضوعية: DC sputtering, High power pulsed magnetron sputtering, MAX-phases, mean free path, scattering angle probability distribution, moving targets, Particle-In-Cell-Monte-Carlo-Collisions, PIC-MCC, Monte-Carlo-Markov-Chain, 510 Mathematik, ddc:510

وصف الملف: application/pdf

Relation: http://edoc.hu-berlin.de/18452/3467; urn:nbn:de:kobv:11-100193115; http://dx.doi.org/10.18452/2815; 2075199-0

الاتاحة: http://edoc.hu-berlin.de/18452/3467
https://nbn-resolving.org/urn:nbn:de:kobv:11-100193115
https://doi.org/10.18452/2815

المؤلفون: Geiser, Jürgen

مصطلحات موضوعية: Monte Carlo simulations, DC sputtering, High power pulsed magnetron sputtering, Hard sphere interaction, Screened Coulomb, viral expansion, implantation model, 510 Mathematik, ddc:510

وصف الملف: application/pdf

Relation: http://edoc.hu-berlin.de/18452/3475; urn:nbn:de:kobv:11-100193394; http://dx.doi.org/10.18452/2823; 2075199-0

الاتاحة: http://edoc.hu-berlin.de/18452/3475
https://nbn-resolving.org/urn:nbn:de:kobv:11-100193394
https://doi.org/10.18452/2823

المؤلفون: Koranda, Tomáš, Rezek, Jiří

المساهمون: Lukeš, Vladimír, Byrtus, Miroslav

مصطلحات موضوعية: oxid zirkoničitý, vysokovýkonové pulzní magnetronové naprašování, oxide zirconium, high-power pulsed magnetron sputtering

وصف الملف: 2 s.; application/pdf

Relation: BYRTUS, Miroslav ed.; LUKEŠ, Vladimír ed. Studentská vědecká konference: magisterské a doktorské programy, sborník rozšířených abstraktů, 1. červen 2010, Plzeň. Plzeň: Západočeská univerzita v Plzni, 2010, s. 75-76. ISBN 978-80-7043-903-6.; http://svk.fav.zcu.cz/download/sbornik_svk_2010.pdf; http://hdl.handle.net/11025/21057

الاتاحة: http://hdl.handle.net/11025/21057
http://svk.fav.zcu.cz/download/sbornik_svk_2010.pdf

المؤلفون: Ma, D. L., Liu, H. Y., Deng, Q. Y., Yang, W. M., Silins, Kaspars, 1987, Huang, N., Leng, Y. X.

المصدر: Vacuum. 160:410-417

مصطلحات موضوعية: High power pulsed magnetron sputtering, Aluminum nitride, Sputtering modes, Sputtering power, Microstructure, Texture

وصف الملف: print

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-376727

المؤلفون: Huaiyuan Liu, Yongxiang Leng, Donglin Ma, Qiaoyuan Deng

المصدر: Coatings, Vol 11, Iss 579, p 579 (2021)
Coatings
Volume 11
Issue 5

مصطلحات موضوعية: Materials science, Ti-N, microstructure, residual stress, Surfaces and Interfaces, Sputter deposition, Microstructure, Engineering (General). Civil engineering (General), Titanium nitride, high power pulsed magnetron sputtering, adhesion strength, Surfaces, Coatings and Films, ion energy, chemistry.chemical_compound, chemistry, Residual stress, Materials Chemistry, Surface roughness, High-power impulse magnetron sputtering, Composite material, Thin film, TA1-2040, Layer (electronics)

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::97b653e516a1ffc83e8dbf8315937fb1
https://www.mdpi.com/2079-6412/11/5/579

المؤلفون: Böhlmark, Johan, 1975

المساهمون: Helmersson, Ulf, Anders, André, Dr.

المصدر: Linköping Studies in Science and Technology. Dissertations.

مصطلحات موضوعية: Plasma, Pulsed plasma, High Power Pulsed Magnetron Sputtering, Plasma Characterization, NATURAL SCIENCES, Physics, NATURVETENSKAP, Fysik

وصف الملف: electronic

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-7359
https://liu.diva-portal.org/smash/get/diva2:22370/FULLTEXT01.pdf

المؤلفون: Grudinin, V. A., Bleykher, G. A., Sidelev, D. V., Krivobokov, V. P., Valery, P., Bestetti, M., Vicenzo, A., Franz, S.

مصطلحات موضوعية: Materials science, High power pulsed magnetron sputtering (HPPMS), Cr films and coatings, Hot target, Sublimation, Film growth, Sublimation, chemistry.chemical_element, 02 engineering and technology, 01 natural sciences, Chromium, 0103 physical sciences, Cr films and coatings, Materials Chemistry, Surface roughness, Composite material, 010302 applied physics, Surfaces and Interfaces, General Chemistry, Sputter deposition, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Surfaces, Coatings and Films, Hot target, chemistry, Duty cycle, High power pulsed magnetron sputtering (HPPMS), Cavity magnetron, Film growth, Sublimation (phase transition), High-power impulse magnetron sputtering, 0210 nano-technology, Order of magnitude

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1b38fa6381532d1fd10e85c0453d2b71
http://hdl.handle.net/11311/1098351

المؤلفون: V. A. Grudinin, G. A. Bleykher, D. V. Sidelev, V. P. Krivobokov, Valery P., M. Bestetti, A. Vicenzo, S. Franz

المساهمون: Grudinin, V. A., Bleykher, G. A., Sidelev, D. V., Krivobokov, V. P., P., Valery, Bestetti, M., Vicenzo, A., Franz, S.

مصطلحات موضوعية: High power pulsed magnetron sputtering (HPPMS), Cr films and coatings, Hot target, Sublimation, Film growth

وصف الملف: STAMPA

Relation: info:eu-repo/semantics/altIdentifier/wos/WOS:000488409900035; volume:375; firstpage:352; lastpage:362; numberofpages:11; journal:SURFACE & COATINGS TECHNOLOGY; http://hdl.handle.net/11311/1098351; info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-85069876776; https://www.sciencedirect.com/science/article/pii/S0257897219307455?via=ihub

الاتاحة: http://hdl.handle.net/11311/1098351
https://doi.org/10.1016/j.surfcoat.2019.07.025
https://www.sciencedirect.com/science/article/pii/S0257897219307455?via=ihub

المؤلفون: Meškinis, Š., Vasiliauskas, A., Andrulevičius, M., Jurkevičiūtė, A., Peckus, D., Tamulevičius, S.

المصدر: Thin solid films, Amsterdam : Elsevier, 2019, vol. 673, p. 1-6 ; ISSN 0040-6090

مصطلحات موضوعية: copper, diamond-like carbon, high-power pulsed magnetron sputtering, nanoclusters, optical properties, pulse length, structure, x-ray photoelectron spectroscopy

Relation: http://ktu.lvb.lt/KTU:ELABAPDB34007258&prefLang=en_US

الاتاحة: http://ktu.lvb.lt/KTU:ELABAPDB34007258&prefLang=en_US

المؤلفون: Bobzin, Kirsten, Brögelmann, Tobias, Kruppe, Nathan Christopher, Arghavani, Mostafa, Engels, Martin Gottfried

المصدر: Surface and coatings technology 349, 1130-1136 (2018). doi:10.1016/j.surfcoat.2018.06.065

مصطلحات موضوعية: info:eu-repo/classification/ddc/620, Artificial Neural Networks (ANN), Hard Coatings (Cr,Al)ON, High Power Pulsed Magnetron Sputtering (HPPMS/HiPIMS), Industrial Coating Process Development, Physical Vapor Deposition (PVD), Substrate-oriented Plasma Diagnostics

جغرافية الموضوع: DE

Relation: info:eu-repo/semantics/altIdentifier/issn/0257-8972; info:eu-repo/semantics/altIdentifier/wos/WOS:000441492600118; info:eu-repo/semantics/altIdentifier/issn/1879-3347; https://publications.rwth-aachen.de/record/730572; https://publications.rwth-aachen.de/search?p=id:%22RWTH-2018-226944%22

الاتاحة: https://publications.rwth-aachen.de/record/730572
https://publications.rwth-aachen.de/search?p=id:%22RWTH-2018-226944%22