المؤلفون: Mariadriana Creatore, Jon Henri, Adriana Szeghalmi, Harm C. M. Knoops, Saurabh Karwal, Marcel A. Verheijen, Vivek Beladiya, Akhil Sharma, Dennis M. Hausmann, Tahsin Faraz, Wilhelmus M. M. Kessels, Cristian A. A. van Helvoirt

المساهمون: Plasma & Materials Processing, Interfaces in future energy technologies, Atomic scale processing, Processing of low-dimensional nanomaterials, Center for Quantum Materials and Technology Eindhoven

المصدر: ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces, 10(15), 13158-13180. American Chemical Society

مصطلحات موضوعية: ion bombardment, nitrides, Materials science, thin film, plasma ALD, Oxide, 02 engineering and technology, Substrate (electronics), Nitride, 01 natural sciences, SiNx, Atomic layer deposition, chemistry.chemical_compound, TiN, 0103 physical sciences, TiO2, General Materials Science, Thin film, Plasma processing, HfO2, 010302 applied physics, business.industry, tuning material properties, HfNx, Biasing, ion energy control, 021001 nanoscience & nanotechnology, substrate biasing, chemistry, atomic layer deposition, oxides, Optoelectronics, SiO2, 0210 nano-technology, Material properties, business, Research Article

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ed804ac20abb215bc902857beb35c9c5
https://research.tue.nl/en/publications/fbf8d40f-039f-43bf-b1d2-cc56e1d649f0

المؤلفون: Shun-ichiro Ohmi, Yeyuan Liu

المصدر: IEICE Electronics Express. 2015, 12(24):20150969