نتائج البحث - "Haruka FUJIWARA"

1

Academic Journal

Learning from Participatory Budgeting in Portugal, Institutions and Practices. / ポルトガルにおける参加型予算の制度と実践

المصدر: 自治総研 / Monthly review of local government. 2023, 49(542):55

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2

Academic Journal

2. Damage of Satoyama Life Caused by the Fukushima Daiichi Nuclear Disaster and Policy Issues for its Restoration ('Impact of Radioactive Contamination on Diverse Forest Uses and Local Communities': Joint Symposium held by The Japanese Forest Economic Society, Japanese Association for Environmental Sociology, and The Society of Fukushima Forestry Research) A Case Study of Miyakoji, Tamura City / 第2報告原発事故による山の暮らしの被害とその再生に向けた政策的課題（林業経済学会主催、環境社会学会・福島林業研究会共催合同シンポジウム：多様な森林利用への放射能汚染の影響と地域社会）田村市都路町を事例に

المؤلفون: Haruka FUJIWARA, 藤原遥

المصدر: 林業経済 / FOREST ECONOMY. 2022, 75(3):20

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3

Academic Journal

福島原発事故10年，環境政策の視点から問う森林汚染対策 ―阿武隈地域の広葉樹林を中心に―

المؤلفون: Haruka Fujiwara, 藤原遥

المصدر: 環境経済・政策研究 / Review of Environmental Economics and Policy Studies. 2021, 14(2):68

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4

Academic Journal

Simultaneous Determination of Inorganic Anions and Cations in Water and Biological Samples by Capillary Electrophoresis with a Capacitive Coupled Contactless Conductivity Detector Using Capillary Filling Method

المؤلفون: Haruka FUJIWARA, Katsushi MARUYAMA, Mitsuhiro KINOSHITA, Sachio YAMAMOTO, Shigeo SUZUKI, Yoshihide TANAKA

المصدر: Analytical Sciences. 2019, 35(3):295

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5

Academic Journal

Characteristic change of GeO 2 / Ge interface by Hf-Post Metallization Annealing / Hf-Post Metallization AnnealingによるGeO2/Ge界面の特性変化

المؤلفون: Haruka Fujiwara, Mitaro Namiki, Tomo Ueno, Yamada Hiroshi, Yoshitaka Iwazaki, 上野智雄, 並木美太郎, 山田浩史, 岩崎好孝, 藤原遥香

المصدر: JSAP Annual Meetings Extended Abstracts. 2018, :2855

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6

Academic Journal

Characteristic change of GeO 2 / Ge interface by Hf-Post Matallization Annealing / Hf-Post Matallization AnnealingによるGeO2/Ge界面の特性変化

المؤلفون: Haruka Fujiwara, Hiroshi Yamada, Namiki Mitaro, Tomo Ueno, Yoshitaka Iwazaki, 上野智雄, 並木美太郎, 山田浩史, 岩崎好孝, 藤原遥香

المصدر: JSAP Annual Meetings Extended Abstracts. 2017, :2852

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7

Academic Journal

Practice of Elementary School Programming Education for 2nd and 3rd grade / 小学校2年生・3年生を対象とした教科学習における小学校プログラミング教育の実践

المؤلفون: Haruka Fujiwara, Hitoshi Nakagawa, Yuki Kobayashi, 中川一史, 小林祐紀, 藤原晴佳

المصدر: Proceedings of Japanese Society of Digital Textbook. 2017, :67

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8

Academic Journal

原発事故被災自治体の帰還政策に求められること

المؤلفون: Haruka Fujiwara, 藤原遥

المصدر: 環境経済・政策研究 / Review of Environmental Economics and Policy Studies. 2015, 8(2):67

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9

Characteristic Change of GeO2/Ge Interface by Hf-Post Metallization Annealing

المؤلفون: Tomo Ueno, Yoshitaka Iwazaki, Haruka Fujiwara

المصدر: ECS Transactions. 85:43-49

مصطلحات موضوعية: Materials science, Annealing (metallurgy), business.industry, Optoelectronics, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7a1b0585e0e2a6309c9b28b7d3032a29
https://doi.org/10.1149/08506.0043ecst

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10

Simultaneous Determination of Inorganic Anions and Cations in Water and Biological Samples by Capillary Electrophoresis with a Capacitive Coupled Contactless Conductivity Detector Using Capillary Filling Method

المؤلفون: Haruka Fujiwara, Shigeo Suzuki, Yoshihide Tanaka, Mitsuhiro Kinoshita, Sachio Yamamoto, Katsushi Maruyama

المصدر: Analytical sciences : the international journal of the Japan Society for Analytical Chemistry. 35(3)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e2045f5d1d450136ca6bd1802bcd24bf
https://pubmed.ncbi.nlm.nih.gov/30393239

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11

High performance gate stack fabrication process of Ge MOS structure for future electronic devices

المؤلفون: Hiroshi Yamada, Haruka Fujiwara, Tomo Ueno, Mitaro Namiki, Yoshitaka Iwazaki

المصدر: Eighth International Conference On Advances in Computing, Electronics and Electrical Technology - CEET 2018.

مصطلحات موضوعية: Materials science, Fabrication, business.industry, Gate stack, Process (computing), Optoelectronics, Electronics, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8190f49d9846c39c4012a23145970c24
https://doi.org/10.15224/978-1-63248-144-3-10

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12

Characteristic Change of GeO2 / Ge Interface By Hf-Post Metallization Annealing

المؤلفون: Haruka Fujiwara, Yoshitaka Iwazaki, Tomo Ueno

المصدر: ECS Meeting Abstracts. :1372-1372

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::08f863382e172a432df7f0c89e95865e
https://doi.org/10.1149/ma2018-01/22/1372

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