المؤلفون: Brian L. Goodall, Carl Larson, Donald C. Hofer, Greg Breyta, Juliann Opitz, Karen A. Hullihen, Larry F. Rhodes, Philip Brock, Ratnam Sooriyakumaran, Richard A. DiPietro, Richard Vicari, Robert A. Shick, Robert D. Allen, Saikumar Jayaraman, Thomas I. Wallow

المصدر: Journal of Photopolymer Science and Technology. 1998, 11(3):475

المؤلفون: Debra-Fenzel Alexander, Greg Breyta, Hiroshi Ito

المصدر: Journal of Photopolymer Science and Technology. 1997, 10(3):397

المؤلفون: Dave Seeger, Donald C. Hofer, Greg Breyta, Hiroshi Ito, Holger Moritz, Karen Petrillo, Thomas Fischer

المصدر: Journal of Photopolymer Science and Technology. 1994, 7(3):449

المؤلفون: David SEEGER, Don HOFER, Greg BREYTA, Hiroshi ITO, Karen PETRILLO, R. SOORIYAKUMARAN

المصدر: Journal of Photopolymer Science and Technology. 1994, 7(3):433

المؤلفون: Don HOFER, Greg BREYTA, Hiroshi ITO, R. SOORIYAKUMARAN

المصدر: Journal of Photopolymer Science and Technology. 1995, 8(4):505

المؤلفون: Debra FENZEL-ALEXANDER, Don HOFER, Greg BREYTA, Hiroshi ITO, Jim THACKERAY, Pete HAGERTY, Rick DIPIETRO, Ron NUNES, Steve HOLMES, Will CONLEY

المصدر: Journal of Photopolymer Science and Technology. 1996, 9(4):557

المؤلفون: Donald C. Hofer, Greg Breyta, Greg Wallraff, Hiroshi Ito, Phil Brock, Rick DiPietro, Robert Allen, Will Conley

المصدر: Journal of Photopolymer Science and Technology. 1996, 9(3):387

المؤلفون: Greg Breyta, Wakamatsu Goji, Krishna M. Bajjuri, Anuja DeSilva, Noel Arellano, Ananthakrishnan Sankaranarayanan, Tooru Kimura, Tomoki Nagai, Yoshikazu Yamaguchi, Carl E. Larson, Yoshio Takimoto, Luisa D. Bozano, Martin Glodde, Yoshi Hishiro, Tsutomu Shimokawa, Srinivasan Balakrishnan, Daniel P. Sanders, Kazuhiko Komura

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, business.industry, Thermal resistance, Chemical-mechanical planarization, Deposition (phase transition), Optoelectronics, Nanotechnology, Substrate (printing), Chemical vapor deposition, Photoresist, Material properties, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::701fd6c39eb0e5fc3215bb38976f19e4
https://doi.org/10.1117/12.2046357

المؤلفون: R. Sooriyakumaran, Greg Breyta, Andrew E. Pomerantz, Charlie Dalby, Rikiya Sato, Hiroshi Ito, Kip Guy, Mark H. Sherwood

المصدر: Macromolecules. 33:5080-5089

مصطلحات موضوعية: Tert butyl, Acrylate, Polymers and Plastics, Organic Chemistry, Kinetics, Meth, Methacrylate, Inorganic Chemistry, chemistry.chemical_compound, Monomer, chemistry, Polymer chemistry, Materials Chemistry, Copolymer, Organic chemistry, Reactivity (chemistry)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b1e5f945a2c3886a9e69c27567d740c1
https://doi.org/10.1021/ma9919357

المؤلفون: Chung-Hsi Wu, Sen Liu, Kangguo Cheng, Maud Vinet, Steven J. Holmes, Wu-Song Huang, Qing Liu, Kuang-Jung Chen, Scott Luning, Matt Colburn, Bruce B. Doris, Ranee Kwong, Laurent Grenouillet, Greg Breyta

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Resist, business.industry, Optoelectronics, Silicon on insulator, Nanotechnology, Process window, Wafer, Reactive-ion etching, Photoresist, business, Lithography, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c31bb8ef1330cfcf6841b35ffffaa7c0
https://doi.org/10.1117/12.2011515

المؤلفون: Greg Breyta, Masayuki Motonari, Yoshi Hishiro, Taiichi Furukawa, Goji Wakamatsu, Luisa D. Bozano, Satoru Murakami, Ratnam Sooriyakumaran, Noel Arellano, Martin Glodde, Carl E. Larson, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Kentaro Goto, Anuja DeSilva

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Resist, Semiconductor device fabrication, law, Chemical-mechanical planarization, Thermal resistance, Extreme ultraviolet lithography, Multiple patterning, Nanotechnology, Chemical vapor deposition, Photolithography, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1a1c8cf7db597584dffd1b176cff64f9
https://doi.org/10.1117/12.915698

المؤلفون: Greg Breyta, William D. Hinsberg, Ratnam Sooriyakumaran, Linda K. Sundberg, Anuja De Silva, Luisa D. Bozano, Masaki Fujiwara

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Resist, Extreme ultraviolet lithography, High resolution, Nanotechnology, Resorcinarene, Casting, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c35ff6e779398503cd7a8333417f4e0c
https://doi.org/10.1117/12.881735

المؤلفون: Hiroshi Ito, Don Hofer, Karen Petrillo, David E. Seeger, Greg Breyta, Andrew Pomerene

المصدر: ACS Symposium Series ISBN: 9780841233775
Irradiation of Polymers: Fundamentals and Technological Applications

مصطلحات موضوعية: Materials science, Resist, business.industry, Chemical amplification, Optoelectronics, X-ray lithography, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3df38c5642492cc64a9c75d4446c80e4
https://doi.org/10.1021/bk-1996-0620.ch030

المؤلفون: Greg Breyta, R. Sooriyakumaran, Hiroshi Ito, Donald C. Hofer

المصدر: ACS Symposium Series ISBN: 9780841233324
Microelectronics Technology: Polymers for Advanced Imaging and Packaging

مصطلحات موضوعية: Materials science, Resist, business.industry, Annealing (metallurgy), Optoelectronics, Chemical amplification, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::323e6c6c63df4330e8c0b65af120382d
https://doi.org/10.1021/bk-1995-0614.ch002

المؤلفون: Shom Ponoth, Dave Horak, Satya Nitta, Matthew Colburn, Greg Breyta, Elbert Huang, Jeanne Tania Sucharitaves, Howard Landis, Anthony Lisi, Xiao Liu, Tuan Vo, Richard Johnson, Wai-kin Li, Sampath Purushothaman, Stephan Cohen, Chao-Kun Hu, Ho-Cheol Kim, Larry Clevenger, Nicholas Fuller, Takeshi Nogami, Terry Spooner, Dan Edelstein

المصدر: ECS Meeting Abstracts. :2074-2074

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dfde0fa5bdc2eb933e8a3c5b663f6681
https://doi.org/10.1149/ma2008-02/28/2074

المؤلفون: Greg Breyta, Matthias Steffen, Tad Hogg, Wim van Dam, Isaac L. Chuang

المصدر: Scopus-Elsevier

مصطلحات موضوعية: Physics, Quantum network, Quantum Physics, General Physics and Astronomy, FOS: Physical sciences, Adiabatic quantum computation, 01 natural sciences, 010305 fluids & plasmas, Open quantum system, Classical mechanics, Quantum error correction, 0103 physical sciences, Quantum phase estimation algorithm, Quantum algorithm, Statistical physics, Quantum information, 010306 general physics, Quantum Physics (quant-ph), Quantum computer

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9605ccfbd4d53eb4ad846afdd2c00a5e
http://www.scopus.com/inward/record.url?eid=2-s2.0-0037435837&partnerID=MN8TOARS

المؤلفون: ELSA REICHMANIS, CHRISTOPHER K. OBER, SCOTT A. MACDONALD, TAKAO IWAYANAGI, TADATOMI NISHIKUBO, O. Nalamasu, A. G. Timko, F. M. Houlihan, Anthony E. Novembre, R. Tarascon, N. Münzel, S. G. Slater, Hiroshi Ito, Greg Breyta, Donald C. Hofer, R. Sooriyakumaran, C. Mertesdorf, P. Falcigno, H. J. Kirner, B. Nathal, H. T. Schacht, R. Schulz, A. Zettler, C. A. Mack, Jiro Nakamura, Hiroshi Ban, Akinobu Tanaka, E. Chin, J. M. Kometani, R. Harley, James W. Thackeray, Mark D. Denison, Theodore H. Fedynyshyn, Doris Kang, Roger Sinta, Toshio Sakamizu, Hiroshi Shiraishi, Takumi Ueno, J. E. Hanson, K. H. Jensen, N. Gargiulo, D. Motta, D. A. Pingor, David A. Mixon, C. Knurek, Alexander M. Vekselman, Chunhao Zhang, Graham D. Darling, Sharon A. Heffner, Mary E. Galvin, Linda Gerena, Peter A. Mirau, Thomas X. Neenan, E. A. Chandross, F. M Houlihan, Ying Jiang, John Maher, David Bassett, Tohru Ushirogouchi, Takuya Naito, Koji Asakawa, Naomi Shida, Makoto Nakase, Tsukasa Tada, Robert D. Allen, I- Y. Wan, Gregory M. Wallraff, Richard A. DiPietro, Roderick R. Kunz, Susan C. Pa

Resource Type: eBook.

الموضوعات: Microelectronic packaging--Materials--Congress, Polymers--Congresses, Photoresists--Congresses

Categories: TECHNOLOGY & ENGINEERING / Materials Science / General, TECHNOLOGY & ENGINEERING / Textiles & Polymers