المؤلفون: Wieland, Christopher F., Kormondy, Kristy J., Beck, Annelise R., Smith, Britain J., Ghadiali, Firoz, Kim, Jun, Abboud, Frank E., Sendoda, Tetsuya, Kondo, Naonari, Imahoko, Tomohiro, Kim, Jeoung S., Kaga, Chikato, Goonesekera, Arosha, Cho, Wonil, Paninjath, Sankaranarayanan, Madhusudhan, Saikiran, Deep, Prakash, Nln, Shivam, Reddy, Sasidhara R., Peesapati, Ranganadh

المساهمون: Liang, Ted, Kim, Seong-Sue

المصدر: Photomask Technology 2023

الاتاحة: http://dx.doi.org/10.1117/12.2688267

المؤلفون: Todoroki, Toshiyuki, Gondaira, Ko, Goonesekera, Arosha, Miyai, Hiroki

المساهمون: Liang, Ted, Kim, Seong-Sue

المصدر: Photomask Technology 2023

الاتاحة: http://dx.doi.org/10.1117/12.2686350

المؤلفون: Goonesekera, Arosha, Miyai, Hiroki, Kohyama, Tsunehito, Todoroki, Toshiyuki

المساهمون: Kasprowicz, Bryan S., Liang, Ted

المصدر: Photomask Technology 2022

الاتاحة: http://dx.doi.org/10.1117/12.2643295

المؤلفون: Liphardt, Martin, Goonesekera, Arosha, Jones, Brian E., Ducharme, Stephen, Takacs, James M., Zhang, Lei

المصدر: Science, 1994 Jan . 263(5145), 367-369.

URL الوصول: https://www.jstor.org/stable/2882778

المؤلفون: Zachmann, Hendrik, Russell, Guy, Jenkins, David, Goonesekera, Arosha W., Dornbusch, Kay, Sargsyan, Vahagn, Buttgereit, Ute

المساهمون: Gallagher, Emily E., Buck, Peter D.

المصدر: Photomask Technology

الاتاحة: http://dx.doi.org/10.1117/12.2281884

المؤلفون: Goonesekera, Arosha, Ducharme, Stephen

المصدر: Journal of Applied Physics. 5/1/1999, Vol. 85 Issue 9, p6506. 9p. 2 Diagrams, 4 Charts, 9 Graphs.

مصطلحات موضوعية: *PHOTOREFRACTIVE materials, *POLYMERS, *ELECTRIC fields, *DIPOLE moments

المؤلفون: Goonesekera, Arosha, Buttgereit, Ute, Thaler, Thomas, Graitzer, Erez

المساهمون: Maurer, Wilhelm, Abboud, Frank E.

المصدر: SPIE Proceedings ; Photomask Technology 2011 ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.898892

المؤلفون: Goonesekera, Arosha, Ducharme, Stephen, Takacs, James M., Lei Zhang

المصدر: Journal of Chemical Physics. 11/22/1997, Vol. 107 Issue 20, p8709. 4p. 5 Graphs.

مصطلحات موضوعية: *TIME-of-flight mass spectrometry, *PHOTOREFRACTIVE materials

المؤلفون: Mu, Bo, Dayal, Aditya, Broadbent, Bill, Lim, Phillip, Goonesekera, Arosha, Chen, Chunlin, Yeung, Kevin, Pinto, Becky

المساهمون: Allgair, John A., Raymond, Christopher J.

المصدر: Metrology, Inspection, and Process Control for Microlithography XXIII ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.815574

المؤلفون: Mu, Bo, Dayal, Aditya, Goonesekera, Arosha, Lim, Phillip, Chen, Chunlin, Liu, Po, Yeung, Kevin, Pinto, Becky, Broadbent, Bill, Inderhees, Gregg

المساهمون: Hosono, Kunihiro

المصدر: SPIE Proceedings ; Photomask and Next-Generation Lithography Mask Technology XVI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.824325

المؤلفون: Gallagher, Emily, Badger, Karen, Lawliss, Mark, Kodera, Yutaka, Azpiroz, Jaione Tirapu, Pang, Song, Zhang, Hongqin, Eugenieva, Eugenia, Clifford, Chris, Goonesekera, Arosha, Tian, Yibin

المساهمون: Kawahira, Hiroichi, Zurbrick, Larry S.

المصدر: Photomask Technology 2008 ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.801945

المؤلفون: Goonesekera, Arosha, Schmalfuss, Heiko, Lee, Isaac, Guan, Chun, Dayal, Aditya, Schulmeyer, Thomas, Heumann, Jan

المساهمون: Horiuchi, Toshiyuki

المصدر: SPIE Proceedings ; Photomask and Next-Generation Lithography Mask Technology XV ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.793091

المؤلفون: Goonesekera, Arosha, Lee, Isaac, Mu, Bo, Dayal, Aditya

المساهمون: Horiuchi, Toshiyuki

المصدر: SPIE Proceedings ; Photomask and Next-Generation Lithography Mask Technology XV ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.793089

المؤلفون: Dayal, Aditya, Mu, Bo, Iyer, Venkat, Lim, Phillip, Goonesekera, Arosha, Broadbent, Bill

المساهمون: Kawahira, Hiroichi, Zurbrick, Larry S.

المصدر: Photomask Technology 2008 ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.801831

المؤلفون: Goonesekera, Arosha W., Ducharme, Stephen, Takacs, James M.

المساهمون: Ducharme, Stephen, Stasiak, James W.

المصدر: SPIE Proceedings ; Xerographic Photoreceptors and Organic Photorefractive Materials IV ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.328159

المؤلفون: Goonesekera, Arosha W., Ducharme, Stephen, Takacs, James M.

المساهمون: Ducharme, Stephen, Stasiak, James W.

المصدر: SPIE Proceedings ; Xerographic Photoreceptors and Organic Photorefractive Materials II ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.290240

المؤلفون: Goonesekera, Arosha W., Ducharme, Stephen, Takacs, James M., Zhang, Lei

المساهمون: Ducharme, Stephen, Stasiak, James W.

المصدر: SPIE Proceedings ; Organic Photorefractive Materials and Xerographic Photoreceptors ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.254249
http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1022506

المؤلفون: Goonesekera, Arosha W., Liphardt, Martin, Ducharme, Stephen, Takacs, James M., Zhang, Lei

المساهمون: Ducharme, Stephen, Borsenberger, Paul M.

المصدر: Xerographic Photoreceptors and Photorefractive Polymers ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.217309
http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1004433

المؤلفون: Goonesekera, Arosha, Wright, Daniel, Moerner, W. E.

المصدر: Applied Physics Letters ; volume 76, issue 23, page 3358-3360 ; ISSN 0003-6951 1077-3118

الاتاحة: http://dx.doi.org/10.1063/1.126647
https://pubs.aip.org/aip/apl/article-pdf/76/23/3358/18549937/3358_1_online.pdf

المؤلفون: Liang, Ted, Kim, Seong-Sue, Wieland, Christopher F., Kormondy, Kristy J., Beck, Annelise R., Smith, Britain J., Ghadiali, Firoz, Kim, Jun, Abboud, Frank E., Sendoda, Tetsuya, Kondo, Naonari, Imahoko, Tomohiro, Kim, Jeoung S., Kaga, Chikato, Goonesekera, Arosha, Cho, Wonil, Paninjath, Sankaranarayanan, Madhusudhan, Saikiran, Deep, Prakash, Nln, Shivam, Reddy, Sasidhara R., Peesapati, Ranganadh

المصدر: Proceedings of SPIE; November 2023, Vol. 12751 Issue: 1 p1275105-1275105-4