المؤلفون: Jaehong Park, Taejung Lee, Woojin Rim, Geum-Jong Bae, Hoonki Kim, Taeyeong Kim, Jong-Hoon Jung, Dong-Won Kim, S. D. Kwon, Hakchul Jung, Hyung-Tae Kim, Taejoong Song, Soon-Moon Jung, Sanghoon Baek, Keun Hwi Cho, Jongwook Kye

المصدر: ISSCC

مصطلحات موضوعية: Random access memory, Hardware_MEMORYSTRUCTURES, Computer science, Transistor, Hardware_PERFORMANCEANDRELIABILITY, Dual (category theory), Power (physics), law.invention, law, Logic gate, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Static random-access memory, Electronic circuit

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::39061cc23ae105d92382e833936d1627
https://doi.org/10.1109/isscc42613.2021.9365988

المؤلفون: Mark S. Rodder, Mong-song Liang, Cheol Kim, Taek-Soo Jeon, Dong-Won Kim, Sunjung Kim, Kittl Jorge A, Jae Hoo Park, Wookje Kim, Jongwook Jeon, Sun-Ghil Lee, Myung-Geun Song, Kab-Jin Nam, Seung-Hun Lee, Yeon-Cheol Heo, Sean Lian, Sang-Woo Lee, Uihui Kwon, Geum-Jong Bae, Dong-il Bae, Kang-ill Seo, Krishna Kumar Bhuwalka, Ki-Hyun Hwang, Yihwan Kim, E. S. Jung, Jae-Young Park

المصدر: 2016 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: 010302 applied physics, Electron mobility, Materials science, business.industry, Electrical engineering, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Threshold voltage, Silicon-germanium, chemistry.chemical_compound, CMOS, Stack (abstract data type), chemistry, Logic gate, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business, Common gate, Metal gate

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::10d564c76bd5f4f0442e06af3b149592
https://doi.org/10.1109/iedm.2016.7838496

المؤلفون: Eun-ae Chung, Geum-Jong Bae, Nakanishi Toshiro, Maria Toledano-Luque, Jin-soak Kim, Guangfan Jiao, Thomas Kauerauf, Ki-Hyun Hwang, Dong-Won Kim, Seung-Hun Lee, Kab-Jin Nam, Dong-il Bae

المصدر: 2016 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: 010302 applied physics, Negative-bias temperature instability, Materials science, Silicon, business.industry, Electrical engineering, Oxide, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Acceptor, Silicon-germanium, Stress (mechanics), chemistry.chemical_compound, Reliability (semiconductor), chemistry, Electric field, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3c82966025039e6ec19c2953dd33bcc1
https://doi.org/10.1109/iedm.2016.7838518

المؤلفون: Philip J. Oldiges, Hemanth Jagannathan, Kangguo Cheng, Christopher Prindle, C.-C. Yeh, R. Divakaruni, S. Kanakasabaphthy, Derrick Liu, Sean D. Burns, P. Montanini, T. Gow, Huiming Bu, Abhijeet Paul, Terry A. Spooner, Richard G. Southwick, Jin Cho, M. Celik, Mukesh Khare, Donald F. Canaperi, Young-Kwan Park, H. Mallela, Ravikumar Ramachandran, Bomsoo Kim, Dinesh Gupta, Balasubramanian S. Pranatharthi Haran, R. Kambhampati, M. Weybright, W. Yang, Vamsi Paruchuri, Tae-Chan Kim, R. Sampson, K. Kim, D. Chanemougame, John Iacoponi, Jay W. Strane, Ruilong Xie, D.I. Bae, Injo Ok, Matthew E. Colburn, T. Hook, Kang-ill Seo, Lars W. Liebmann, V. Sardesai, Hoon Kim, Neeraj Tripathi, H. Shang, M. Mottura, Reinaldo A. Vega, B. Hamieh, D. McHerron, Theodorus E. Standaert, Ju-Hwan Jung, S. Nam, E. Alptekin, Soon-Cheon Seo, Dechao Guo, J. G. Hong, Gen Tsutsui, Andreas Scholze, J. Jenq, Xiao Sun, Walter Kleemeier, James H. Stathis, Geum-Jong Bae

المصدر: 2014 12th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT).

مصطلحات موضوعية: Materials science, CMOS, Dopant, business.industry, Electronic engineering, Optoelectronics, Silicon on insulator, Static random-access memory, business, Lithography, Random dopant fluctuation, Communication channel, Power (physics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2fdd9e37b1ad7ef1b69d8d55e103e9fa
https://doi.org/10.1109/icsict.2014.7021207

المؤلفون: Jeffrey C. Shearer, Philip J. Oldiges, Soon-Cheon Seo, Terry A. Spooner, Matthew E. Colburn, Ravikumar Ramachandran, V. Sardesai, Kang-ill Seo, Dinesh Gupta, Richard G. Southwick, Xiao Sun, S. Stieg, H. Cai, S. Kanakasabaphthy, Vamsi Paruchuri, R. Sampson, Lars W. Liebmann, Walter Kleemeier, Kisik Choi, Deok-Hyung Lee, Christopher Prindle, R. Divakaruni, H. Shang, Abhijeet Paul, T. Gow, D. McHerron, Dechao Guo, Fee Li Lie, J. Nam, Neeraj Tripathi, Ruilong Xie, R. Kambhampati, Muthumanickam Sankarapandian, Balasubramanian S. Pranatharthi Haran, Carol Boye, James H. Stathis, B. Hamieh, John Iacoponi, Christopher J. Waskiewicz, Geum-Jong Bae, Derrick Liu, Sanjay Mehta, Reinaldo A. Vega, Terence B. Hook, Min Gyu Sung, Jay W. Strane, D.I. Bae, Robin Chao, Hoon Kim, F. Nelson, Theodorus E. Standaert, L. Jang, Erin Mclellan, M. Celik, S. Nam, Tae-Chan Kim, C.-C. Yeh, Sean D. Burns, P. Montanini, Charan V. V. S. Surisetty, Raghavasimhan Sreenivasan, Ju-Hwan Jung, B. Lherron, S.-B. Ko, E. Alptekin, Huiming Bu, Injo Ok, Jin Cho, Mukesh Khare, J. G. Hong, Gen Tsutsui, Andreas Scholze, Bomsoo Kim, D. Chanemougame, M. Mottura, M. Weybright, H. Mallela, K. Kim, Hemanth Jagannathan, Chanro Park, J. Jenq, Donald F. Canaperi, Young-Kwan Park, R. Jung, Kangguo Cheng

المصدر: 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers.

مصطلحات موضوعية: Materials science, Dopant, business.industry, Limit (music), Gate stack, Electrical engineering, Silicon on insulator, Optoelectronics, Static random-access memory, business, Lithography, Communication channel, Power (physics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d4d82166b734af3db83f196d83853ba5
https://doi.org/10.1109/vlsit.2014.6894342

المؤلفون: Ho Lee, Hwa Sung Rhee, Ueno, T., Myung Sun Kim, Ji Hye Yi, Cho, H.S., Youngsu Chung, Seulgi Kim, Hion Suck Baik, Feng, L., Yun Wang, Hautala, J., Skinner, W., Geum-Jong Bae, Nae-In Lee, Ho-yu Kang

المصدر: 2006 International Workshop on Junction Technology ; page 44-47

الاتاحة: http://dx.doi.org/10.1109/iwjt.2006.220857
http://xplorestaging.ieee.org/ielx5/11071/34954/01669444.pdf?arnumber=1669444

المؤلفون: Sang-Su Kim, Tae-Hee Choe, Hwa-Sung Rhee, Geum-Jong Bae, Kyung-Wook Lee, Nae-In Lee, Fujihara, K., Ho-Kyu Kang, Ju-Tae Moon

المصدر: 2000 IEEE International SOI Conference. Proceedings (Cat. No.00CH37125) ; page 74-75

الاتاحة: http://dx.doi.org/10.1109/soi.2000.892776
http://xplorestaging.ieee.org/ielx5/7145/19242/00892776.pdf?arnumber=892776

المؤلفون: Sunae Seo, Nae-In Lee, Ki-chul Kim, Jin-Hee Kim, Geum-Jong Bae, Younseok Jeong, Chung-woo Kim, Myung-Yoon Um, Byoung-Jin Lee, Jae-woong Hyun, In-Wook Cho, Chae Hee-Soon

المصدر: Japanese Journal of Applied Physics. 45:L998-L1000

مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), Silicon, business.industry, General Engineering, Oxide, General Physics and Astronomy, chemistry.chemical_element, Charge loss, Nitride, Threshold voltage, chemistry.chemical_compound, chemistry, Optoelectronics, Silicon oxide, business, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::41a8d0d77e2ab8d5c15fe99cc07000c0
https://doi.org/10.1143/jjap.45.l998

المؤلفون: Tetsuji Ueno, Lucia Feng, Ho-Kyu Kang, Geum-Jong Bae, J. Hautala, Hionsuck Baik, Yun Wang, Nae-In Lee, Ji Hye Yi, Hwa-Sung Rhee, W. Skinner, Seul-Gi Kim, Myung Sun Kim, Youngsu Chung, Hyunkyu Cho, Ho Lee

المصدر: 2006 International Workshop on Junction Technology.

مصطلحات موضوعية: Materials science, Ion implantation, Dopant, Gas cluster ion beam, Annealing (metallurgy), business.industry, Doping, Analytical chemistry, Optoelectronics, Field-effect transistor, business, Capacitance, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5684eb907ca5f7e35803ae6f298faca2
https://doi.org/10.1109/iwjt.2006.1669444

المؤلفون: Hyun-Woo Lee, Tetsuji Ueno, Ho Lee, Heungsik Park, Cheol Kyu Lee, Hyunkyu Cho, Geum-Jong Bae, Hwa-Sung Rhee, Youn Hwa Jung, Nae-In Lee, Hion Suck Baik, Myung Sun Kim

المصدر: 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

مصطلحات موضوعية: Materials science, Hydrogen, business.industry, Scattering, chemistry.chemical_element, Noise (electronics), PMOS logic, Stress (mechanics), Compressive strength, CMOS, chemistry, Electronic engineering, Optoelectronics, business, NMOS logic

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::08f4c034dc52a318e94af7f286cd0f08
https://doi.org/10.1109/vlsit.2006.1705238

المؤلفون: K.C. Kim, Kwang Pyuk Suh, Nae-In Lee, S.T. Kang, Sun-Ghil Lee, Jung-hyeon Kim, Suk-pil Kim, I.S. Park, M.C. Kim, Seo Minwoong, H.-K. Kang, Geum-Jong Bae, I.W. Cho, Sei-jin Kim, Kwang-Ok Koh

المصدر: 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407).

مصطلحات موضوعية: Materials science, business.industry, Process (computing), Embedded memory, Threshold voltage, Non-volatile memory, chemistry.chemical_compound, Reliability (semiconductor), Silicon nitride, chemistry, CMOS, Electronic engineering, Optoelectronics, System on a chip, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::306aed91b1f4411ae059631ad62bfcfe
https://doi.org/10.1109/vlsit.2003.1221071

المؤلفون: Jung-hyeon Kim, S.D. Chae, C.W. Kim, S.A. Seo, Suk-pil Kim, Nae-In Lee, Hwang So-Hee, I.W. Cho, Geum-Jong Bae, Seung-Kwon Kim, B.R. Lim, M.C. Kim, B.J. Lee, H.-K. Kang, D.Y. Lee, K.C. Kim, Seo Minwoong, Sei-jin Kim, Kwang-Ok Koh

المصدر: Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004..

مصطلحات موضوعية: Dynamic random-access memory, business.industry, Sense amplifier, Computer science, Semiconductor memory, law.invention, Non-volatile memory, law, Optoelectronics, Racetrack memory, Bubble memory, Non-volatile random-access memory, business, Computer hardware, Computer memory

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::28c5dbefc441e2019896deee3319fc8a
https://doi.org/10.1109/vlsit.2004.1345502

المؤلفون: Kwang Pyuk Suh, Hee-Soo Kang, Kyong Taek Lee, H.J. Yu, Chang Bong Oh, Kyoung-Soo Kim, Jung-Chak Ahn, Won-sang Song, Y.G. Wee, K.S. Jung, M.K. Jung, Geum-Jong Bae, Nae-In Lee, Deok-Hyung Lee, T.S. Park, Moon-han Park, Sangjoo Lee, Y.G. Ko, S.H. Liu, Chang-Hoon Jeon, Young Wug Kim, Byung Jun Oh

المصدر: Digest. International Electron Devices Meeting.

مصطلحات موضوعية: Materials science, business.industry, Transistor, Copper interconnect, Electrical engineering, Silicon on insulator, Capacitance, PMOS logic, law.invention, Gate oxide, law, Low-power electronics, Optoelectronics, business, NMOS logic

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::03770676f50bf22edbea0b3fe37525b4
https://doi.org/10.1109/iedm.2002.1175781

المؤلفون: T.H. Choe, Geum-Jong Bae, K.W. Lee, K.D. Kim, K. Fujihara, N.I. Lee, H.S. Rhee, Y.W. Kim, Y.K. Park, S.S. Kim, H.S. Kang, J.T. Moon, H.K. Kang

المصدر: International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).

مصطلحات موضوعية: Materials science, Ion implantation, Dopant, business.industry, MOSFET, Electronic engineering, Optoelectronics, Rectangular potential barrier, Silicon on insulator, Breakdown voltage, business, NMOS logic, PMOS logic

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e49b137ac181ab627b1ba33d3292160c
https://doi.org/10.1109/iedm.2000.904407

المؤلفون: Kong-Soo Chung, Hee-Sung Kang, Ki-Mun Nam, Geum-Jong Bae, Nae-In Lee, Kwang-Pyuk Suh, Young-Wug Kim

المصدر: Extended Abstracts of the 2001 International Conference on Solid State Devices and Materials.

مصطلحات موضوعية: Microprocessor, Materials science, law, business.industry, MOSFET, Optoelectronics, Silicon on insulator, business, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::08dd5f69f6b63e0603450306a3ec9753
https://doi.org/10.7567/ssdm.2001.c-5-3

المؤلفون: Gi–Ho Cha, Il-Kwon Kim, Moonyong Lee, Ki–Hong Lee, Geum–Jong Bae, Sang-In Lee, Kyung Wook Lee

المصدر: Japanese Journal of Applied Physics. 38:3487

مصطلحات موضوعية: Wire bonding, Materials science, business.industry, Wafer bonding, General Engineering, Process (computing), General Physics and Astronomy, Silicon on insulator, Thermocompression bonding, Stress (mechanics), Anodic bonding, Optoelectronics, Wafer, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a87ee51fec57bc357cd585fbaf2b147f
https://doi.org/10.1143/jjap.38.3487

المؤلفون: Ueno, T., Hwa Sung Rhee, Ho Lee, Myung Sun Kim, Cho, H.S., Hion Suck Baik, Youn Hwa Jung, Hyun Woo Lee, Heung Sik Park, Cheol Kyu Lee, Geum-Jong Bae, Nae-In Lee

المصدر: 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.; 2006, p104-105, 2p

المؤلفون: Hwa Sung Rhee, Jung Il Lee, Sang Su Kim, Geum Jong Bae, Nae-In Lee, Do Hyung Kim, Jung In Hong, Ho-Kyu Kang, Kwang Pyuk Suh

المصدر: 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303); 2002, p126-127, 2p

المؤلفون: Sang-Su Kim, Tae-Hee Choe, Hwa-Sung Rhee, Geum-Jong Bae, Kyung-Wook Lee, Nae-In Lee, Fujihara, K., Ho-Kyu Kang, Ju-Tae Moon

المصدر: 2000 IEEE International SOI Conference. Proceedings (Cat. No.00CH37125); 2000, p74-75, 2p