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1Academic Journal
المؤلفون: Saidjafarzoda Ilhom (10125078), Adnan Mohammad (10125081), Deepa Shukla (186127), John Grasso (10125084), Brian G. Willis (1642648), Ali Kemal Okyay (3979202), Necmi Biyikli (1515286)
مصطلحات موضوعية: Biochemistry, Medicine, Biotechnology, Ecology, Developmental Biology, Cancer, Infectious Diseases, Chemical Sciences not elsewhere classified, Physical Sciences not elsewhere classified, film crystallinity, XPS, hollow-cathode plasma source, layer deposition, substrate temperature, plasma power range, GPC, β- Ga 2 O 3 crystal phase, Ar plasma exposure, metal precursor, bandgap oxide semiconductors, TEG pulse, Ar plasma annealing treatment, Ar plasma annealing step, Ga 2 O 3 films, Plasma-Enhanced Atomic Layer Deposition, Growth experiments, Ar plasma annealing process, X-ray diffraction, XRD, post-deposition annealing treatment
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2Academic Journal
المؤلفون: Mariya Aleksandrova, Tatyana Ivanova, Frank Hamelmann, Velichka Strijkova, Kostadinka Gesheva
المصدر: Coatings, Vol 10, Iss 650, p 650 (2020)
مصطلحات موضوعية: energy harvesting, piezoelectric oxide, RF sputtering, flexible substrate, ZnO:Ga 2 O 3 films, Engineering (General). Civil engineering (General), TA1-2040
Relation: https://www.mdpi.com/2079-6412/10/7/650; https://doaj.org/toc/2079-6412; https://doaj.org/article/d9dd9709cc744a46ba13df5d2d17f7b8