المؤلفون: B. Amon, G. Spoldi, Mathias Rommel, V. Yanev, S. Beuer, Lothar Frey, A.J. Bauer, S. Petersen, J. D. Jambreck

المساهمون: Publica

المصدر: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:595-607

مصطلحات موضوعية: focused ion beam, Materials science, SPM, Analytical chemistry, scanning probe microscopy, Focused ion beam, FIB damage, Scanning probe microscopy, FIB, Ion beam deposition, Microscopy, Materials Chemistry, Electrical and Electronic Engineering, Electron beam-induced deposition, SSRM, Instrumentation, business.industry, Process Chemistry and Technology, Scanning confocal electron microscopy, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, SCM, Transmission electron microscopy, Scanning ion-conductance microscopy, Optoelectronics, business

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::20d54c29f48e54e1a4297747ec1c9e37
https://doi.org/10.1116/1.3431085

المؤلفون: L. Di Piazza, I. Mica, L. Laurin, F. Sammiceli, M. Mariani, A. G. Mauri, E. Ricci, M. L. Polignano, G. Spoldi

المصدر: Materials Science and Engineering: B. :168-172

مصطلحات موضوعية: Materials science, Annealing (metallurgy), Mechanical Engineering, Doping, chemistry.chemical_element, Chemical vapor deposition, Condensed Matter Physics, Epitaxy, Crystallography, Ion implantation, chemistry, Mechanics of Materials, Transmission electron microscopy, General Materials Science, Wafer, Composite material, Boron

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::98ba05fd876bd9e19aa8c3f4b024f515
https://doi.org/10.1016/j.mseb.2008.05.022

المؤلفون: F. Cazzaniga, G. Pavia, A. G. Mauri, F. Sammiceli, M. Mariani, M. L. Polignano, G. Spoldi, I. Mica, V. Bontempo

المصدر: Journal of Materials Science: Materials in Electronics. 19:182-188

مصطلحات موضوعية: Materials science, Silicon, business.industry, Annealing (metallurgy), chemistry.chemical_element, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Ion implantation, chemistry, Shallow trench isolation, Trench, Forensic engineering, Optoelectronics, Wafer, Electrical measurements, Kinetic Monte Carlo, Electrical and Electronic Engineering, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::86e8dd24ab0c78002f98f32abd0685cf
https://doi.org/10.1007/s10854-008-9630-4

المؤلفون: G. Spoldi, Anton J. Bauer, V. Yanev, S. Beuer, Heiner Ryssel, Mathias Rommel

مصطلحات موضوعية: Materials science, Spreading resistance profiling, Silicon, Scanning electron microscope, business.industry, chemistry.chemical_element, Scanning capacitance microscopy, Condensed Matter Physics, Focused ion beam, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Optics, Ion implantation, chemistry, Microscopy, Optoelectronics, Irradiation, Electrical and Electronic Engineering, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cc9acaea360919f0fea0a25adc34cbee