المؤلفون: Roy, Syamashree, Thiam, Arame, Sah, Kaushik, Feurprier, Yannick, Fukui, Nobuyuki, Nafus, Kathleen, Miyaguchi, Kenichi, Van den Heuvel, Dieter, Baskaran, Balakumar, Bekaert, Joost, Cross, Andrew J., Dusa, Mircea, Blanco Carballo, Victor M.

المساهمون: Burkhardt, Martin, van Lare, Claire

المصدر: Optical and EUV Nanolithography XXXVII

الاتاحة: http://dx.doi.org/10.1117/12.3010868

المؤلفون: Dinh, Cong Que, Nagahara, Seiji, Cho, Kayoko, Tomori, Hikari, Kuwahara, Yuhei, Onitsuka, Tomoya, Okada, Soichiro, Kawakami, Shinichiro, Hara, Arisa, Fujimoto, Seiji, Muramatsu, Makoto, Tsuzuki, Reiko, Liu, Xiang, Thiam, Arame, Feurprier, Yannick, Nafus, Kathleen, Carcasi, Michael A., Huli, Lior, Kato, Kanzo, Krawicz, Alexandra, Kocsis, Michael, De Schepper, Peter, McQuade, Lauren, Kasahara, Kazuki, Garcia Santaclara, Jara G., Hoefnagels, Rik, La Fontaine, Bruno, Miyakawa, Ryan H., Anderson, Chris N., Naulleau, Patrick P.

المساهمون: Guerrero, Douglas, Amblard, Gilles R.

المصدر: Advances in Patterning Materials and Processes XLI

الاتاحة: http://dx.doi.org/10.1117/12.3010207

المؤلفون: Nagahara, Seiji, Dauendorffer, Arnaud, Thiam, Arame, Liu, Xiang, Kuwahara, Yuhei, Dinh, Cong Que, Okada, Soichiro, Kawakami, Shinichiro, Genjima, Hisashi, Nagamine, Noriaki, Muramatsu, Makoto, Shimura, Satoru, Tsuboi, Atsushi, Nafus, Kathleen, Feurprier, Yannick, Demand, Marc, Ramaneti, Rajesh, Foubert, Philippe, De Simone, Danilo, Vandenberphe, Geert

المساهمون: Guerrero, Douglas, Amblard, Gilles R.

المصدر: Advances in Patterning Materials and Processes XL

الاتاحة: http://dx.doi.org/10.1117/12.2657432

المؤلفون: Burkhardt, Martin, van Lare, Claire, Roy, Syamashree, Thiam, Arame, Sah, Kaushik, Feurprier, Yannick, Fukui, Nobuyuki, Nafus, Kathleen, Miyaguchi, Kenichi, Van den Heuvel, Dieter, Baskaran, Balakumar, Bekaert, Joost, Cross, Andrew, Dusa, Mircea, Blanco Carballo, Victor M.

المصدر: Proceedings of SPIE; April 2024, Vol. 12953 Issue: 1 p129530X-129530X-9, 1165780p

المؤلفون: van Haren, Richard J. F., Yildirim, Oktay, Mouraille, Orion, van Dijk, Leon, Kumar, Kaushik, Feurprier, Yannick, Jehoul, Christiane, Hermans, Jan

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2614255

المؤلفون: Raley, Angélique, Huli, Lior, Grzeskowiak, Steven, Lutker-Lee, Katie, Krawicz, Alexandra, Feurprier, Yannick, Liu, Eric, Kato, Kanzo, Nafus, Kathleen, Dauendorffer, Arnaud, Bae, Nayoung, LaRose, Josh, Metz, Andrew, Hetzer, Dave, Honda, Masanobu, Nishizuka, Tetsuya, Ko, Akiteru, Okada, Soichiro, Ido, Yasuyuki, Onitsuka, Tomoya, Kawakami, Shinichiro, Fujimoto, Seiji, Shimura, Satoru, Dinh, Cong Que, Muramatsu, Makoto, Biolsi, Peter, Mochiki, Hiromasa, Nagahara, Seiji

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2613063

المؤلفون: Nagahara, Seiji, Dauendorffer, Arnaud, Liu, Xiang, Onitsuka, Tomoya, Genjima, Hisashi, Nagamine, Noriaki, Kuwahara, Yuhei, Kamei, Yuya, Kawakami, Shinichiro, Muramatsu, Makoto, Shimura, Satoru, Nafus, Kathleen, Oikawa, Noriaki, Feurprier, Yannick, Demand, Marc, Thibaut, Sophie, Krawicz, Alexandra, Grzeskowiak, Steven, Lutker-Lee, Katie, Liu, Eric, Catano, Christopher, LaRose, Joshua D., Shearer, Jeffrery C., Huli, Lior, Foubert, Philippe, De Simone, Danilo

المساهمون: Ronse, Kurt G., Gargini, Paolo A., Naulleau, Patrick P., Itani, Toshiro

المصدر: International Conference on Extreme Ultraviolet Lithography 2022

الاتاحة: http://dx.doi.org/10.1117/12.2642941

المؤلفون: Onitsuka, Tomoya, Kawakami, Shinichiro, Dauendorffer, Arnaud, Shimura, Satoru, Nafus, Kathleen, Feurprier, Yannick, Foubert, Philippe, De Simone, Danilo

المساهمون: Felix, Nelson M., Lio, Anna

المصدر: Extreme Ultraviolet (EUV) Lithography XII

الاتاحة: http://dx.doi.org/10.1117/12.2583809

المؤلفون: van Haren, Richard, Mouraille, Orion, Yildirim, Oktay, van Dijk, Leon, Kumar, Kaushik, Feurprier, Yannick, Hermans, Jan

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning X

الاتاحة: http://dx.doi.org/10.1117/12.2584311

المؤلفون: Dauendorffer, Arnaud, Onitsuka, Tomoya, Tadatomo, Hiroki, Yoshida, Keisuke, Shiozawa, Takahiro, Genjima, Hisashi, Nagamine, Noriaki, Kamei, Yuya, Okada, Soichiro, Kawakami, Shinichiro, Muramatsu, Makoto, Shimura, Satoru, Nafus, Kathleen, Oikawa, Noriaki, Feurprier, Yannick, Demand, Marc, Romo Negreira, Ainhoa, Nagahara, Seiji, Dinh, Congque, Kljucar, Luka, De Simone, Danilo, Foubert, Philippe

المساهمون: Ronse, Kurt G., Gargini, Paolo A., Hendrickx, Eric, Naulleau, Patrick P., Itani, Toshiro

المصدر: International Conference on Extreme Ultraviolet Lithography 2021

الاتاحة: http://dx.doi.org/10.1117/12.2600860

المؤلفون: van Haren, Richard, Yildirim, Oktay, Mouraille, Orion, van Dijk, Leon, Kumar, Kaushik, Feurprier, Yannick, Hermans, Jan

المساهمون: Labelle, Catherine B., Wise, Richard S.

المصدر: Advanced Etch Technology for Nanopatterning IX

الاتاحة: http://dx.doi.org/10.1117/12.2552051

المؤلفون: Guerrero, Douglas, Amblard, Gilles R., Nagahara, Seiji, Dauendorffer, Arnaud, Thiam, Arame, Liu, Xiang, Kuwahara, Yuhei, Dinh, Cong Que, Okada, Soichiro, Kawakami, Shinichiro, Genjima, Hisashi, Nagamine, Noriaki, Muramatsu, Makoto, Shimura, Satoru, Tsuboi, Atsushi, Nafus, Kathleen, Feurprier, Yannick, Demand, Marc, Ramaneti, Rajesh, Foubert, Philippe, De Simone, Danilo, Vendenberghe, Geert

المصدر: Proceedings of SPIE; May 2023, Vol. 12498 Issue: 1 p124981G-124981G-10, 12373130p