المؤلفون: Fernando C. Rufino, Aline M. Pascon, Luana C.J. Espindola, Frederico H. Cioldin, Dunieskys R.G. Larrudé, José A. Diniz

المصدر: Carbon Trends, Vol 4, Iss , Pp 100056- (2021)

مصطلحات موضوعية: Graphene, Photolithography, Oxygen Plasma Ashing, GFET technology, Chemistry, QD1-999

وصف الملف: electronic resource

Relation: http://www.sciencedirect.com/science/article/pii/S266705692100033X; https://doaj.org/toc/2667-0569

URL الوصول: https://doaj.org/article/ed7feb0d933d41f2a204af7a402a9da6