المؤلفون: F G Kuper, J Th M de Hosson, J F Verwey

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5eae5993651f252cf62082ff24f62363
https://doi.org/10.1201/9781003069621-112

المؤلفون: MENEGHESSO, GAUDENZIO, J. R. M. Luchies, F. G. Kuper, A. J. Mouthaan

المساهمون: Meneghesso, Gaudenzio, J. R. M., Luchie, F. G., Kuper, A. J., Mouthaan

مصطلحات موضوعية: Electrostatic discharge (ESD), turn-on-speed, Charged Device Model (CDM), ggNMOSFET

وصف الملف: STAMPA

Relation: 7th Annual RCJ Reliability Symposium; firstpage:27; lastpage:32; numberofpages:6; http://hdl.handle.net/11577/2523028

الاتاحة: http://hdl.handle.net/11577/2523028

المؤلفون: G. Meneghesso, J. R. M. Luchies, F. G. Kuper, A. J. Mouthaan, Ae Nijmegen, The Netherl

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://doc.utwente.nl/56009/1/00888204.pdf.

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.577.2535; http://doc.utwente.nl/56009/1/00888204.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.577.2535
http://doc.utwente.nl/56009/1/00888204.pdf

المؤلفون: G. Meneghesso L, J. R. M. Luchies, F. G. Kuper, A. J. Mouthaan, Ae Nijmegen, The Netherl

المساهمون: The Pennsylvania State University CiteSeerX Archives

المصدر: http://doc.utwente.nl/15124/1/Meneghesso96turn.pdf.

وصف الملف: application/pdf

Relation: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.573.7144; http://doc.utwente.nl/15124/1/Meneghesso96turn.pdf

الاتاحة: http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.573.7144
http://doc.utwente.nl/15124/1/Meneghesso96turn.pdf

المؤلفون: J. F. Verwey, J.Th.M. De Hosson, F. G. Kuper

المساهمون: Zernike Institute for Advanced Materials

المصدر: Journal of Applied Physics, 60(3), 985-990. AMER INST PHYSICS

مصطلحات موضوعية: chemistry.chemical_compound, Ion implantation, Silicon, chemistry, Impurity, Nuclear reaction analysis, Oxidizing agent, Kinetics, Inorganic chemistry, Fluorine, Oxide, General Physics and Astronomy, chemistry.chemical_element

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a2e4e2d71718e83dfd96e375449b0877
https://hdl.handle.net/11370/f6576f46-a2fb-4485-8127-9d82758c78f8

المؤلفون: M. H. J. Hottenhuis, F. G. Kuper, L. Wolterbeek

المصدر: Review of Scientific Instruments. 53:1058-1060

مصطلحات موضوعية: Monatomic gas, Materials science, Mathematical model, Silicon, business.industry, Glass fiber, chemistry.chemical_element, Cleavage (crystal), Surface finish, Crystal, Optics, chemistry, Bundle, business, Instrumentation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::958781434302cf0d0e8dc0ad624e9acc
https://doi.org/10.1063/1.1137087

المؤلفون: J.Th.M. De Hosson, J. F. Verwey, F. G. Kuper

المساهمون: Zernike Institute for Advanced Materials

المصدر: Journal of Applied Physics, 61(12), 5475-5477. AMER INST PHYSICS

مصطلحات موضوعية: Materials science, Passivation, Silicon, business.industry, Electron beam-induced current, General Physics and Astronomy, Mineralogy, chemistry.chemical_element, Silicon on insulator, Grain size, Ion implantation, chemistry, Optoelectronics, Grain boundary, Thin film, business

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::32426bc8d7d0dd24cbc1b276e4ba1344
https://research.rug.nl/en/publications/981b7409-473a-49fc-bea3-9b55e8274a41