المؤلفون: Burger, S., Zschiedrich, L., Schmidt, F., Evanschitzky, P., Erdmann, A.

المصدر: Proc. SPIE 7122 (2008) 71221S

مصطلحات موضوعية: Physics - Optics, Physics - Computational Physics

URL الوصول: http://arxiv.org/abs/0906.1896

المؤلفون: Erdmann, A., Mesilhy, H., Evanschitzky, P., Saadeh, Q., Soltwisch, V., Bihr, S., Zimmermann, J., Philipsen, V.

Time: 670, 620, 530

Relation: International Conference on Extreme Ultraviolet Lithography 2021; https://publica.fraunhofer.de/handle/publica/417135

الاتاحة: https://publica.fraunhofer.de/handle/publica/417135
https://doi.org/10.1117/12.2600931

المؤلفون: Mesilhy, H., Evanschitzky, P., Bottiglieri, G., Setten, E. van, Fliervoet, T., Erdmann, A.

Time: 670, 620, 530

Relation: Conference "Extreme Ultraviolet (EUV) Lithography" 2020; Extreme Ultraviolet (EUV) Lithography XI; https://publica.fraunhofer.de/handle/publica/408513

الاتاحة: https://publica.fraunhofer.de/handle/publica/408513
https://doi.org/10.1117/12.2551870

المؤلفون: Evanschitzky, P., Auth, N., Heil, T., Hermanns, C.F., Erdmann, A.

Time: 670, 537, 553, 620, 530

Relation: Journal of micro/nanolithography, MEMS and MOEMS; https://publica.fraunhofer.de/handle/publica/416067

الاتاحة: https://publica.fraunhofer.de/handle/publica/416067
https://doi.org/10.1117/1.JMM.20.4.041205

المؤلفون: Mesilhy, H., Evanschitzky, P., Bottiglieri, G., Lare, C. Van, Setten, E. Van, Erdmann, A.

Time: 670, 537, 553, 620, 530

Relation: Journal of micro/nanolithography, MEMS and MOEMS; https://publica.fraunhofer.de/handle/publica/270920

الاتاحة: https://publica.fraunhofer.de/handle/publica/270920
https://doi.org/10.1117/1.JMM.20.2.021004

المؤلفون: Awad, A., Brendel, P., Evanschitzky, P., Woldeamanual, D.S., Rosskopf, A., Erdmann, A.

Time: 670, 537, 553, 620, 530

Relation: Journal of micro/nanolithography, MEMS and MOEMS; https://publica.fraunhofer.de/handle/publica/416066

الاتاحة: https://publica.fraunhofer.de/handle/publica/416066
https://doi.org/10.1117/1.JMM.20.4.043201

المؤلفون: Roeder, G., Liu, S., Aygün, Gülnur, Evanschitzky, P., Erdmann, A., Schellenberger, M., Pfitzner, L

مصطلحات موضوعية: Dill parameters, Simulation, Spectroscopic ellipsometry, Thick resist, Computer simulation

جغرافية الموضوع: 10.1016/j.tsf.2010.11.068

Relation: Thin Solid Films; Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı; Roeder, G., Liu, S., Aygün, G., Evanschitzky, P., Erdmann, A., Schellenberger, M., and Pfitzner, L. (2011). Determination of the Dill parameters of thick positive resist for use in modeling applications. Thin Solid Films, 519(9), 2978-2984. doi:10.1016/j.tsf.2010.11.068; https://doi.org/10.1016/j.tsf.2010.11.068; http://hdl.handle.net/11147/5108; 519; 2978; 2984; WOS:000289174200090; 2-s2.0-79952620550; Q1

الاتاحة: http://hdl.handle.net/11147/5108
https://doi.org/10.1016/j.tsf.2010.11.068

المؤلفون: Philipsen, V., Vu Luong, K., Opsomer, K., Detavernier, C., Hendrickx, E., Erdmann, A., Evanschitzky, P., van de Kruijs, R.W.E., Heidarnia Fathabad, Z., Scholze, F., Laubis, C.

مصطلحات موضوعية: Large scale facilities for research with photons neutrons and ions

Relation: http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=101234

الاتاحة: http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=101234

المؤلفون: Philipsen, V., Luong, K.V., Opsomer, K., Souriau, L., Rip, J., Detavernier, C., Erdmann, A., Evanschitzky, P., Laubis, C., Hoenicke, P., Soltwisch, V., Hendrickx, E.

مصطلحات موضوعية: Large scale facilities for research with photons neutrons and ions

Relation: http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=100375

الاتاحة: http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=100375

المؤلفون: Erdmann, A., Evanschitzky, P., Bottiglieri, G., Setten, E. van, Fliervoet, T.

Time: 670, 620, 530

Relation: Conference "Extreme Ultraviolet (EUV) Lithography" 2019; Extreme Ultraviolet (EUV) Lithography X; https://publica.fraunhofer.de/handle/publica/406080

الاتاحة: https://publica.fraunhofer.de/handle/publica/406080
https://doi.org/10.1117/12.2515678

المؤلفون: Erdmann, A., Mesilhy, H., Evanschitzky, P., Philipsen, V., Timmermans, F., Bauer, M.

Time: 670, 537, 553, 620, 530

Relation: Journal of micro/nanolithography, MEMS and MOEMS; https://publica.fraunhofer.de/handle/publica/269717

الاتاحة: https://publica.fraunhofer.de/handle/publica/269717
https://doi.org/10.1117/1.JMM.19.4.041001

المؤلفون: Erdmann, A., Evanschitzky, P., Mesilhy, H., Philipsen, V., Hendrickx, E., Bauer, M.

Time: 670, 620, 530

Relation: Conference "Extreme Ultraviolet (EUV) Lithography" 2018; Advanced Lithography Symposium 2018; Extreme Ultraviolet (EUV) Lithography IX; https://publica.fraunhofer.de/handle/publica/402641

الاتاحة: https://publica.fraunhofer.de/handle/publica/402641
https://doi.org/10.1117/12.2299648

المؤلفون: Philipsen, V., Luong, K.V., Opsomer, K., Detavernier, C., Hendrickx, E., Erdmann, A., Evanschitzky, P., Kruijs, R.W.E. van de, Heidarnia-Fathabad, Z., Scholze, F., Laubis, C.

Time: 670, 620, 530

Relation: California "Photomask Technology" 2018; Photomask Technology 2018; https://publica.fraunhofer.de/handle/publica/407074

الاتاحة: https://publica.fraunhofer.de/handle/publica/407074
https://doi.org/10.1117/12.2501799

المؤلفون: Dejkameh, A., Erdmann, A., Evanschitzky, P., Ekinci, Y.

Time: 670, 620, 530

Relation: Conference "Computational Optics" 2018; Computational Optics II; https://publica.fraunhofer.de/handle/publica/402710

الاتاحة: https://publica.fraunhofer.de/handle/publica/402710
https://doi.org/10.1117/12.2311332

المؤلفون: Ismail, M., Evanschitzky, P., Erdmann, A., Bottiglieri, G., Setten, E. van, Fliervoet, T.F.

Time: 670, 620, 530

Relation: Conference "Computational Optics" 2018; Computational Optics II; https://publica.fraunhofer.de/handle/publica/402775

الاتاحة: https://publica.fraunhofer.de/handle/publica/402775
https://doi.org/10.1117/12.2315091

المؤلفون: Erdmann, A., Evanschitzky, P., Mesilhy, H., Philipsen, V., Hendrickx, E., Bauer, M.

Time: 670, 537, 553, 620, 530

Relation: Journal of micro/nanolithography, MEMS and MOEMS; https://publica.fraunhofer.de/handle/publica/258327

الاتاحة: https://publica.fraunhofer.de/handle/publica/258327
https://doi.org/10.1117/1.JMM.18.1.011005

المؤلفون: Evanschitzky, Petra, Lohr, Christina, Hille, Katrin

المصدر: Diskurs Kindheits- und Jugendforschung / Discourse. Journal of Childhood and Adolescence Research, 3, 4, 469-481

مصطلحات موضوعية: Primary education (elementary education), Primar- und Elementarbildung, Elementary Education Sector, Bildungswesen Elementarbereich, Bundesrepublik Deutschland, Lernprozess, Kindergarten, berufliche Weiterbildung, Wirkung, Kind, Baden-Württemberg, Erzieher, Kindertagesstätte, Interesse, technische Bildung, Modellversuch, Naturwissenschaft, Mathematik, interest, day nursery, Federal Republic of Germany, learning process, effect, technical education, pilot project, mathematics, kindergarten, child, educator, natural sciences, advanced vocational education, empirisch, empirisch-quantitativ, anwendungsorientiert, Evaluation, evaluation, empirical, applied research, quantitative empirical

URL الوصول: http://www.ssoar.info/ssoar/handle/document/26951

المؤلفون: Evanschitzky, P., Erdmann, A.

Time: 670, 620, 530

Relation: International Conference on Extreme Ultraviolet Lithography 2017; https://publica.fraunhofer.de/handle/publica/401202

الاتاحة: https://publica.fraunhofer.de/handle/publica/401202
https://doi.org/10.1117/12.2280535

المؤلفون: Philipsen, V., Luong, K.V., Souriau, L., Hendrickx, E., Erdmann, A., Xu, D., Evanschitzky, P., Kruijs, R.W.E. van de, Edrisi, A., Scholze, F., Laubis, C., Irmscher, M., Naasz, S., Reuter, C.

Time: 670

Relation: Conference "Extreme Ultraviolet (EUV) Lithography" 2017; Extreme Ultraviolet (EUV) Lithography VIII; https://publica.fraunhofer.de/handle/publica/397718

الاتاحة: https://publica.fraunhofer.de/handle/publica/397718
https://doi.org/10.1117/12.2257929

المؤلفون: Erdmann, A., Xu, D., Evanschitzky, P., Philipsen, V., Luong, V., Hendrickx, E.

Time: 670

Relation: Advanced Optical Technologies; https://publica.fraunhofer.de/handle/publica/249052

الاتاحة: https://publica.fraunhofer.de/handle/publica/249052
https://doi.org/10.1515/aot-2017-0019