المؤلفون: Arjun Aryal, Sidhant Tiwari, Darren W. Branch, Aleem Siddiqui, Tito Busani

المصدر: Scientific Reports, Vol 14, Iss 1, Pp 1-8 (2024)

مصطلحات موضوعية: RF acoustic devices, Electromechanical coupling, Spurious modes suppression, Edge treatment, Etch process, Lamb wave devices, Medicine, Science

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2045-2322

URL الوصول: https://doaj.org/article/2941d75b01ca43bf9976f21b2e64bec5

المؤلفون: V. Arpitha, A. K. Pani

المصدر: Chemical and Biochemical Engineering Quarterly, Vol 36, Iss 1, Pp 1-16 (2022)

مصطلحات موضوعية: metal etch process, semiconductor manufacturing, machine learning, process monitoring, fault detection, Chemical engineering, TP155-156

وصف الملف: electronic resource

Relation: http://silverstripe.fkit.hr/cabeq/assets/Uploads/01-1-2022.pdf; https://doaj.org/toc/0352-9568; https://doaj.org/toc/1846-5153

URL الوصول: https://doaj.org/article/6f128203ac8a49d180e6a133539be3b2

المؤلفون: So-Won Kim, Hwan-Seok Lee, Deok-Sung Jun, Seong-Eui Lee, Joung-Ho Lee, Hee-Chul Lee

المصدر: Materials; Volume 16; Issue 14; Pages: 5112

مصطلحات موضوعية: plasma resistant glass, LAS glass, alkaline earth oxide, low dielectric constant, low coefficient of thermal expansion, nonvolatile fluoride, semiconductor etch process

وصف الملف: application/pdf

Relation: Electronic Materials; https://dx.doi.org/10.3390/ma16145112

الاتاحة: https://doi.org/10.3390/ma16145112

المؤلفون: Do-Hyeon Choi, In-Jun Yang, Min-Ki Hong, Dong-Hoon Jung, Won-Ho Kim

المصدر: Machines, Vol 11, Iss 11, p 991 (2023)

مصطلحات موضوعية: permanent motor, torque ripple, tapering, IPMSM, ETCH process, semiconductor, Mechanical engineering and machinery, TJ1-1570

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2075-1702/11/11/991; https://doaj.org/toc/2075-1702

URL الوصول: https://doaj.org/article/4a50acd4d0bb4d0ebb1a65ce8668baba

المؤلفون: Vijay Shirhatti (8612184), Suresh Nuthalapati (8612187), Vaishakh Kedambaimoole (8612178), Saurabh Kumar (4471585), Mangalore Manjunatha Nayak (8612190), Konandur Rajanna (9080356)

مصطلحات موضوعية: Medicine, Biotechnology, Infectious Diseases, Plant Biology, Environmental Sciences not elsewhere classified, Chemical Sciences not elsewhere classified, Information Systems not elsewhere classified, vital health parameters, ultrathin percolative layer, reported work marks, pattern gold thin, limb movement tracker, integrating multiple sensors, flexible nanoelectronic devices, excellent strain resolution, etch process used, current pandemic scenario, conventional banal devices, based devices suited, 3 × 10, biomonitoring fashion accessory, sensor also served, attractive accessory, world service, wearable band, still distant, sensor displays, rate performance, practical nanomaterial, patterned electrode

Relation: https://figshare.com/articles/journal_contribution/Multifunctional_Graphene_Sensor_Ensemble_as_a_Smart_Biomonitoring_Fashion_Accessory/17102786

الاتاحة: https://doi.org/10.1021/acssensors.1c01393.s001

المساهمون: Hanoka, J

المصدر: Other Information: Work performed by Evergreen Solar, Marlboro, Massachusetts

وصف الملف: Medium: ED; Size: 51 pp.

URL الوصول: http://www.osti.gov/scitech/servlets/purl/15020503

المساهمون: Hanoka, J

المصدر: Other Information: PBD: 1 Oct 2004; Other Information: Work performed by Evergreen Solar, Inc., Marlboro, Massachusetts

وصف الملف: Medium: ED; Size: 26 pp. pages

URL الوصول: http://www.osti.gov/scitech/servlets/purl/15009940

المساهمون: Southimath, B

المصدر: Other Information: PBD: 1 Mar 2002; Other Information: Work performed by ASE Americas, Billerica, Massachusetts

وصف الملف: Medium: ED; Size: 42 pages

URL الوصول: http://www.osti.gov/scitech/servlets/purl/15000365

المؤلفون: Zakour, Sihem Ben, Taleb, Hassen

مصطلحات موضوعية: ddc:650, Plasma etch process, Endpoint detection, Multivariate control charts, Monitoring profiles, Windowed regression

Relation: gbv-ppn:1009825143; Journal: Journal of Industrial Engineering International; Volume: 13; Year: 2017; Issue: 3; Pages: 307-322; Heidelberg: Springer; http://hdl.handle.net/10419/172565

الاتاحة: http://hdl.handle.net/10419/172565
https://doi.org/10.1007/s40092-017-0186-x

المؤلفون: Park, Seolhye, Seong, Jaegu, Jang, Yunchang, Roh, Hyun-Joon, Kwon, Ji-Won, Lee, Jinyoung, Ryu, Sangwon, Song, Jaemin, Roh, Ki-Baek, Noh, Yeongil, Park, Yoona, Jang, Yongsuk, Cho, Taeyoung, Yang, Jae-Ho, Kim, Gon-Ho

المساهمون: Kim, Gon-Ho

مصطلحات موضوعية: OPTICAL-EMISSION SPECTROSCOPY, PRINCIPAL COMPONENT ANALYSIS, ELECTRON-ENERGY DISTRIBUTION, FAULT-DETECTION, ETCH PROCESS, PARAMETERS, DISCHARGE, APC (advanced process control), CVD (chemical vapor deposition), Etching, FDC (fault detection and classification), Mass production, OLED (organic light-emitting diode), PI (plasma information) parameter, Virtual metrology

Relation: Journal of the Korean Physical Society, Vol.80 No.8, pp.647-669; https://hdl.handle.net/10371/183701; 000764580200005; 2-s2.0-85126009336; 160635; ART002834289

الاتاحة: https://hdl.handle.net/10371/183701
https://doi.org/10.1007/s40042-022-00452-8

المؤلفون: Sui, Wenxiaoshan

المساهمون: Xie, Xing, Chen, Yongsheng, Yiacoumi, Sotira, Civil and Environmental Engineering

مصطلحات موضوعية: Water disinfection, water, chlorine, CECIC, bacteria, chemical etch process

وصف الملف: application/pdf

Relation: https://hdl.handle.net/1853/72407

الاتاحة: https://hdl.handle.net/1853/72407

المؤلفون: Sihem Ben Zakour, Hassen Taleb

مصطلحات موضوعية: Figuring, Polynomial regression, 0209 industrial biotechnology, Multivariate statistics, Monitoring profiles, Multivariate control charts, 02 engineering and technology, 01 natural sciences, Industrial and Manufacturing Engineering, 010104 statistics & probability, Noise, 020901 industrial engineering & automation, Wavelet, Endpoint detection, Statistics, ddc:650, Control chart, Plasma etch process, Mean-shift, 0101 mathematics, Windowed regression, Statistic, Mathematics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7097cc966db4d82924e54c7848bdf9f6
https://hdl.handle.net/10419/172565

المؤلفون: Shurui Wang, Milan Dado, Jean Lapointe, Dan-Xia Xu, Siegfried Janz, Jens H. Schmid, Daniel Benedikovic, Pavel Cheben, Boris Lamontagne, Alejandro Ortega-Moñux, Robert Halir

المصدر: Optics express. 23(17)

مصطلحات موضوعية: Optical fiber, Materials science, optical fibers, fundamental component, Silicon on insulator, silicon-on- insulators (SOI), Grating, photonic integration technology, photonic integrated circuits, law.invention, photonic devices, Optics, law, Blazed grating, Diffraction grating, refractive index, silicon on insulator technology, business.industry, Photonic integrated circuit, Metamaterial, silicon on insulator waveguide, Atomic and Molecular Physics, and Optics, fiber chip coupling, surface grating couplers, single etch process, efficiency, engineered surfaces, Photonics, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::26c4254b19ef72a46f640f7db42adf23
https://pubmed.ncbi.nlm.nih.gov/26368230

المؤلفون: Benedikovic, Daniel, Cheben, Pavel, Schmid, Jens H., Xu, Dan-Xia, Lamontagne, Boris, Wang, Shurui, Lapointe, Jean, Halir, Robert, Ortega-Moñux, Alejandro, Janz, Siegfried, Dado, Milan

مصطلحات موضوعية: efficiency, optical fibers, photonic devices, photonic integration technology, refractive index, engineered surfaces, fiber chip coupling, fundamental component, photonic integrated circuits, silicon on insulator waveguide, silicon-on- insulators (SOI), single etch process, surface grating couplers, silicon on insulator technology

وصف الملف: text

Relation: Optics Express, Volume: 23, Issue: 17, Publication date: 2015-08-19, Pages: 22628–22635

الاتاحة: https://doi.org/10.1364/OE.23.022628
https://nrc-publications.canada.ca/eng/view/object/?id=e2f01bd7-e863-4d77-b50c-f8f8f9bdc747
https://nrc-publications.canada.ca/fra/voir/objet/?id=e2f01bd7-e863-4d77-b50c-f8f8f9bdc747

المؤلفون: Halir, R., Zavargo-Peche, L., Xu, D.-X., Cheben, P., Ma, R., Schmid, J. H., Janz, S., Densmore, A., Ortega-Moñux, A., Molina-Fernández, Í., Fournier, M., Fédeli, J.-M.

مصطلحات موضوعية: fiber-to-chip grating coupler, deep ultraviolet lithography, single etch process

وصف الملف: text

Relation: Optical and Quantum Electronics, Volume: 44, Issue: 12-13, Publication date: 2012-02-24, Pages: 521–526; pii:9563

الاتاحة: https://doi.org/10.1007/s11082-012-9563-2
https://nrc-publications.canada.ca/eng/view/object/?id=3ae6e66a-103d-4df0-8445-37629981b59d
https://nrc-publications.canada.ca/fra/voir/objet/?id=3ae6e66a-103d-4df0-8445-37629981b59d

المؤلفون: Lam, EY, Mak, GY, Choi, HW

مصطلحات موضوعية: Etch process, Bottom surfaces, Ablation thresholds, Fluences, Device isolation

Relation: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures; http://www.scopus.com/mlt/select.url?eid=2-s2.0-77950563661&selection=ref&src=s&origin=recordpage; Journal Of Vacuum Science And Technology B: Microelectronics And Nanometer Structures, 2010, v. 28 n. 2, p. 380-385; 385; 175225; WOS:000276275100022; http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1071-1023&volume=28&issue=2&spage=380&epage=385&date=2010&atitle=Precision+laser+micromachining+of+trenches+in+GaN+on+sapphire; eid_2-s2.0-77950563661; 380; http://hdl.handle.net/10722/124682; 28

الاتاحة: https://doi.org/10.1116/1.3359593
http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1071-1023&volume=28&issue=2&spage=380&epage=385&date=2010&atitle=Precision+laser+micromachining+of+trenches+in+GaN+on+sapphire
http://hdl.handle.net/10722/124682

المؤلفون: Jens H. Schmid, Pavel Cheben, L. Zavargo-Peche, Adam Densmore, M. Fournier, Íñigo Molina-Fernández, Dan-Xia Xu, J-M. Fedeli, Rubin Ma, Siegfried Janz, Robert Halir, Alejandro Ortega-Moñux

مصطلحات موضوعية: Optical fiber, Fabrication, Materials science, 02 engineering and technology, Grating, 01 natural sciences, law.invention, 010309 optics, Planar, Optics, law, fiber-to-chip grating coupler, 0103 physical sciences, Electrical and Electronic Engineering, Lithography, Electronic circuit, Coupling, business.industry, 021001 nanoscience & nanotechnology, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, single etch process, deep ultraviolet lithography, Optoelectronics, 0210 nano-technology, business, Waveguide

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::56e61d0105594441f3ddd3a563aa8e39
https://nrc-publications.canada.ca/eng/view/object/?id=3ae6e66a-103d-4df0-8445-37629981b59d

المؤلفون: G. Brandt, R. Moritz, W. Rothemund, H. Ennen

المساهمون: Publica

المصدر: Journal of Crystal Growth. 101:226-231

مصطلحات موضوعية: Materials science, fungi, Doppelätzprozeß, technology, industry, and agriculture, Analytical chemistry, Mineralogy, Cathodoluminescence, macromolecular substances, extended defects, Condensed Matter Physics, Crystallographic defect, Isotropic etching, Cadmium telluride photovoltaics, Characterization (materials science), Präzipitate, Inorganic Chemistry, double etch process, Versetzungsbündel, stomatognathic system, Etch pit density, Etching (microfabrication), Materials Chemistry, precipitates, Dislocation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ed5db98b4ecbaec87a88897a85dd39e7
https://doi.org/10.1016/0022-0248(90)90971-m

المؤلفون: Naureen, Shagufta, Rajagembu, Perumal, Sanatinia, Reza, Shahid, Naeem, Li, Mingyu, Anand, S

المصدر: Conference Proceedings - International Conference on Indium Phosphide and Related Materials

مصطلحات موضوعية: Keywords: Close packed, Close packed structures, Colloidal lithography, Colloidal masks, Colloidal particle, Cost-effective methods, Different heights, Different sizes, Etch process, Hexagonal structures, ICP etching, InP, Lag effects, Nano-structuring, Nanopillars

جغرافية الموضوع: Berlin

Relation: 2011 Compound Semiconductor Week and 23rd International Conference on Indium Phosphide and Related Materials, CSW/IPRM 2011; http://hdl.handle.net/1885/65927; https://openresearch-repository.anu.edu.au/bitstream/1885/65927/5/Naeem_Nanostructuring_of_InP_2011.pdf.jpg; https://openresearch-repository.anu.edu.au/bitstream/1885/65927/7/01_Naureen_Nanostructuring_of_InP_by_2011.pdf.jpg

الاتاحة: http://hdl.handle.net/1885/65927
https://openresearch-repository.anu.edu.au/bitstream/1885/65927/5/Naeem_Nanostructuring_of_InP_2011.pdf.jpg
https://openresearch-repository.anu.edu.au/bitstream/1885/65927/7/01_Naureen_Nanostructuring_of_InP_by_2011.pdf.jpg

المؤلفون: Zappa, Diego, Fazio, Giuseppe, Colombo, Roberto

مصطلحات موضوعية: Settore SECS-S/01 - STATISTICA, Quality control, Plasma etch process, Microelettronics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=od______2601::6988da64c279e60b3bcc9d9c402df2b3
http://hdl.handle.net/10807/15462