المؤلفون: Crespo Villanueva, Adrián, Gallenberger, Julia, De Santis, M., Langlais, Veronique, Carla, Francesco, Caicedo Roque, Jose Manuel, Rius Palleiro, Jordi, Torrelles Albareda, Xavier

مصطلحات موضوعية: Annealing temperatures, Diffraction sensitivity, Growth process, Micro-strain, Molecular-beam epitaxy, Out-of-plane lattice parameters, Pulsed-laser deposition, Surface sensitivity, Surface terraces, X- ray diffractions

وصف الملف: application/pdf

Relation: Ministerio de Ciencia e Innovación CEX2019-000917-S; Ministerio de Ciencia e Innovación PID2021-123276OB-I00; Ministerio de Ciencia e Innovación CEX2021-001214-S; Applied surface science; Vol. 632 (September 2023), art. 157586; https://ddd.uab.cat/record/287080; urn:10.1016/j.apsusc.2023.157586; urn:oai:ddd.uab.cat:287080; urn:scopus_id:85162745101; urn:articleid:01694332v632p157586; urn:icn2uab:6599470

الاتاحة: https://ddd.uab.cat/record/287080