المؤلفون: Yoel Feler, Diana Shaphirov, Mark Ghinovker, Katya Gordon, Ido Ashuah, Yunhua Wu, Penny Lin

المصدر: Metrology, Inspection, and Process Control XXXVII.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::383190a390b0d7c52546266ec8595ea6
https://doi.org/10.1117/12.2657850

المؤلفون: Xiaolei Liu, Yoav Grauer, Raviv Yohanan, Mark Ghinovker, Diana Shaphirov, Yasuhisa Iwata, Koichi Imura, Kosuke Ito

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9f32212e678f46c56f9d756102e3f492
https://doi.org/10.1117/12.2614129

المؤلفون: Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, DongSub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, DongYoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee

المصدر: Metrology, Inspection, and Process Control XXXVI.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::87c2c7efc3be8f8bbcc7e2039896893f
https://doi.org/10.1117/12.2608053

المؤلفون: Katya Gordon, Hedvi Spielberg, Diana Shaphirov, Xiaolei Liu, Eltsafon Ashwal, Eitan Hajaj, Philippe Leray, Mark Ghinovker, Chen Dror, Raviv Yohanan, Zephyr Liu, Dieter Van den Heuvel, Roel Gronheid

المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

مصطلحات موضوعية: Reduction (complexity), Feature (computer vision), Computer science, Robustness (computer science), Process (computing), Electronic engineering, Overlay, Moiré pattern, Grid, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7a71df7b888ddfb6580f81ecc9e7b9d1
https://doi.org/10.1117/12.2585876

المؤلفون: Mark Ghinovker, Katya Gordon, Eltsafon Ashwal, Eitan Hajaj, Isaac Salib, Raviv Yohanan, Xiaolei Liu, Chen Dror, Zephyr Liu, Diana Shaphirov

المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

مصطلحات موضوعية: Reduction (complexity), Process variation, Computer science, Robustness (computer science), Process (computing), Calibration, Electronic engineering, Design process, Overlay, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3138996e91dd72b952a0be9774c46313
https://doi.org/10.1117/12.2584525

المؤلفون: Chanha Park, Xiaolei Liu, Dongyoung Lee, Chen Dror, Eltsafon Ashwal, Dongsoo Kim, Sanghuck Jeon, Zephyr Liu, Katya Gordon, Honggoo Lee, Eitan Hajaj, Mark Ghinovker, Diana Shaphirov, Sang-Ho Lee, Dongsub Choi, Dohwa Lee, Raviv Yohanan

المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

مصطلحات موضوعية: Reduction (complexity), business.industry, Robustness (computer science), Computer science, Receiver autonomous integrity monitoring, Process (computing), Overlay, business, Grid, Computer hardware, Dram, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0c6be2fb79531aea498fc923d2afaeb1
https://doi.org/10.1117/12.2584524