المؤلفون: Ceulemans, Karl, Shafahian, Ehsan, Struyf, Herbert, Devriendt, Katia, Deckers, Steven, Heylen, Nancy, Derakhshandeh, Jaber

المصدر: Japanese Journal of Applied Physics ; volume 63, issue 3, page 03SP39 ; ISSN 0021-4922 1347-4065

الاتاحة: http://dx.doi.org/10.35848/1347-4065/ad2135
https://iopscience.iop.org/article/10.35848/1347-4065/ad2135
https://iopscience.iop.org/article/10.35848/1347-4065/ad2135/pdf

المؤلفون: Tao, Zheng, Li, Yisuo, Li, Waikin, Kim, Minsoo, Briggs, Basoene, Devriendt, Katia, Teugels, Lieve, Sebaai, Farid, Lorant, Christophe, Porret, Clement, Rosseel, Erik, Sepúlveda Márquez, Alfonso, Jourdan, Nicolas, Boemmels, Juergen, Mitard, Jerome, Matagne, Philippe, Altamirano-Sánchez, Efrain, Ragnarsson, Lars-Ake, Dangol, Anish, Batuk, Dmitry, Martinez Alanis, Gerardo Tadeo, Geypen, Jef, Kanazawa, Kenichi, Izawa, Testuo, Kakumu, Masakazu, Sakui, Koji, Harada, Nozomu

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2614772

المؤلفون: Gupta, Anshul, Tao, Zheng, Radisic, Dunja, Mertens, Hans, Pedreira, Olalla Varela, Demuynck, Steven, Boemmels, Juergen, Devriendt, Katia, Heylen, Nancy, Wang, Shouhua, Kenis, Karine, Teugels, Lieve, Sebaai, Farid, Lorant, Christophe, Jourdan, Nicolas, Chan, Boon Teik, Subramanian, Sujith, Schleicher, Filip, Peter, Antony, Rassoul, Nouredine, Siew, Yong Kong, Briggs, Basoene, Zhou, Dasiy, Rosseel, Erik, Capogreco, Elena, Mannaert, Geert, Sepúlveda Márquez, Alfonso, Dupuy, Emmanuel, Vandersmissen, Kevin, Chehab, Bilal, Murdoch, Gayle, Altamirano-Sánchez, Efrain, Biesemans, Serge, Tokei, Zsolt, Litta, Eugenio Dentoni, Horiguchi, Naoto

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2615641

المؤلفون: Chew, Soon-Aik, Iacovo, Serena, Fordor, Ferenc, Dewilde, Sven, Devriendt, Katia, De Vos, Joeri, Miller, Andy, Beyer, Gerald, Beyne, Eric

المصدر: 2022 IEEE 24th Electronics Packaging Technology Conference (EPTC)

الاتاحة: http://dx.doi.org/10.1109/eptc56328.2022.10013108
http://xplorestaging.ieee.org/ielx7/10012686/10013085/10013108.pdf?arnumber=10013108

المؤلفون: Hiblot, Gaspard, Rassoul, Nouredine, Teugels, Lieve, Devriendt, Katia, Chasin, Adrian Vaisman, van Setten, Michiel, Belmonte, Attilio, Delhougne, Romain, Kar, Gouri Sankar

المصدر: 2021 IEEE International Reliability Physics Symposium (IRPS)

الاتاحة: http://dx.doi.org/10.1109/irps46558.2021.9405201
http://xplorestaging.ieee.org/ielx7/9405068/9405088/09405201.pdf?arnumber=9405201

المؤلفون: Gupta, Anshul, Pedreira, Olalla Varela, Arutchelvan, Goutham, Zahedmanesh, Houman, Devriendt, Katia, Mertens, Hans, Tao, Zheng, Ritzenthaler, Romain, Wang, Shouhua, Radisic, Dunja, Kenis, Karine, Teugels, Lieve, Sebai, Farid, Lorant, Christophe, Jourdan, Nicolas, Chan, Boon Teik, Subramanian, Sujith, Schleicher, Filip, Hopf, Toby, Peter, Antony Premkumar, Rassoul, Nouredine, Debruyn, Haroen, Demonie, Ingrid, Siew, Yong Kong, Chiarella, Thomas, Briggs, Basoene, Zhou, Xiuju, Rosseel, Erik, De Keersgieter, An, Capogreco, Elena, Litta, Eugenio Dentoni, Boccardi, Guillaume, Baudot, Sylvain, Mannaert, Geert, Bontemps, Noemie, Sepulveda, A., Mertens, Sofie, Kim, Min-Soo, Dupuy, Emmanuel, Vandersmissen, Kevin, Paolillo, Sara, Yakimets, Dmitry, Chehab, Bilal, Favia, Paola, Drijbooms, Christel, Cousserier, Joris, Jaysankar, Manoj, Lazzarino, Frederic, Morin, Pierre, Altamirano, Efrain

المصدر: IEEE Transactions on Electron Devices ; volume 67, issue 12, page 5349-5354 ; ISSN 0018-9383 1557-9646

الاتاحة: http://dx.doi.org/10.1109/ted.2020.3033510
http://xplorestaging.ieee.org/ielx7/16/9269285/09257401.pdf?arnumber=9257401

المؤلفون: Ryu, Heon-Yul, Teugels, Lieve, Devriendt, Katia, Struyf, Herbert, Kim, Tae-Gon, Park, Jin-Goo

المصدر: ECS Journal of Solid State Science & Technology; Sep2021, Vol. 10 Issue 9, p190-195, 6p

المؤلفون: Veloso, Anabela, Altamirano Sanchez, Efrain, Brus, Stephan, Chan, BT, Cupak, Miroslav, Dehan, Morin, Delvaux, Christie, Devriendt, Katia, Eneman, Geert, Ercken, Monique, Huynh Bao, Trong, Ivanov, Tsvetan, Matagne, Philippe, Merckling, Clement, Paraschiv, Vasile, Ramesh, Siva, Rosseel, Erik, Rynders, Luc, Sibaja-Hernandez, Arturo, Suhard, Samuel, Tao, Zheng, Vecchio, Emma, Waldron, Niamh, Yakimets, Dmitry, De Meyer, Kristin, Mocuta, Dan, Collaert, Nadine, Thean, Aaron

Relation: Silicon Compatible Materials, Processes and Technologies for Advanced Integrated Circuits and Emerging Applications 6 pages:31-42; Silicon Compatible Materials, Processes and Technologies for Advanced Integrated Circuits and Emerging Applications 6 location:San Diego, CA USA date:2016-05-29; https://lirias.kuleuven.be/handle/123456789/566061; C33702

الاتاحة: https://lirias.kuleuven.be/handle/123456789/566061

المؤلفون: Mertens, Hans, Ritzenthaler, Romain, Vaisman Chasin, Adrian, Schram, Tom, Kunnen, Eddy, Hikavyy, Andriy, Ragnarsson, Lars-Ake, Dekkers, Harold, Hopf, Toby, Wostyn, Kurt, Devriendt, Katia, Chew, Soon Aik, Kim, Min-Soo, Kikuchi, Yoshiaki, Rosseel, Erik, Mannaert, Geert, Kubicek, Stefan, Demuynck, Steven, Dangol, Anish, Bosman, Niels, Geypen, Jef, Carolan, Patrick, Bender, Hugo, Barla, Kathy, Horiguchi, Naoto, Mocuta, Dan

Relation: IEEE International Electron Devices Meeting - IEDM pages:524-527; IEEE International Electron Devices Meeting - IEDM location:San Francisco, CA USA date:2016-12-03; https://lirias.kuleuven.be/handle/123456789/566310; C34415

الاتاحة: https://lirias.kuleuven.be/handle/123456789/566310

المؤلفون: Mertens, Hans, Ritzenthaler, Romain, Hikavyy, Andriy, Kim, Min-Soo, Tao, Zheng, Wostyn, Kurt, Chew, Soon Aik, De Keersgieter, An, Mannaert, Geert, Rosseel, Erik, Schram, Tom, Devriendt, Katia, Tsvetanova, Diana, Dekkers, Harold, Demuynck, Steven, Vaisman Chasin, Adrian, Van Besien, Els, Dangol, Anish, Godny, Stephane, Douhard, Bastien, Bosman, Niels, Richard, Olivier, Geypen, Jef, Bender, Hugo, Barla, Kathy, Mocuta, Dan, Horiguchi, Naoto, Thean, Aaron

Relation: IEEE Symposium on VLSI Technology pages:1-2; IEEE Symposium on VLSI Technology location:Honolulu, HI USA date:2016-06-13; https://lirias.kuleuven.be/handle/123456789/566114; C33539

الاتاحة: https://lirias.kuleuven.be/handle/123456789/566114

المؤلفون: Veloso, Anabela, Hellings, Geert, Cho, Moon Ju, Simoen, Eddy, Devriendt, Katia, Paraschiv, Vasile, Vecchio, Emma, Tao, Zheng, Versluijs, Janko, Souriau, Laurent, Dekkers, Harold, Brus, Stephan, Geypen, Jef, Lagrain, Pieter, Bender, Hugo, Eneman, Geert, Matagne, Philippe, De Keersgieter, An, Fang, W, Collaert, Nadine, Thean, Aaron

Relation: Symposium on VLSI Technology location:Kyoto Japan date:2015-06-15; https://lirias.kuleuven.be/handle/123456789/524584; C31411

الاتاحة: https://lirias.kuleuven.be/handle/123456789/524584

المؤلفون: Mertens, Hans, Ritzenthaler, Romain, Arimura, Hiroaki, Franco, Jacopo, Sebaai, Farid, Hikavyy, Andriy, Pawlak, Bartek, Machkaoutsan, Vladimir, Devriendt, Katia, Tsvetanova, Diana, Milenin, Alexey, Witters, Liesbeth, Dangol, Anish, Vancoille, Eric, Bender, Hugo, Badaroglu, Mustafa, Holsteyns, Frank, Barla, Kathy, Mocuta, Dan, Horiguchi, Naoto, Thean, Aaron

Relation: Symposium on VLSI Technology pages:142-143; Symposium on VLSI Technology location:Kyoto Japan date:2015-06-15; https://lirias.kuleuven.be/handle/123456789/524553; C31207

الاتاحة: https://lirias.kuleuven.be/handle/123456789/524553

المؤلفون: Tsvetanova, Diana, Devriendt, Katia, Ong, Patrick, Vandeweyer, Tom, Delande, Tinne, Chew, Soon Aik, Horiguchi, Naoto, Struyf, Herbert

المصدر: Proceedings of International Conference on Planarization/CMP Technology 2014 ; page 199-202

الاتاحة: http://dx.doi.org/10.1109/icpt.2014.7017279
http://xplorestaging.ieee.org/ielx7/6996093/7017221/07017279.pdf?arnumber=7017279

المؤلفون: Mertens, Hans, Ritzenthaler, Romain, Hikavyy, Andriy, Franco, Jacopo, Lee, Jae Woo, Brunco, David, Eneman, Geert, Witters, Liesbeth, Mitard, Jerome, Kubicek, Stefan, Devriendt, Katia, Tsvetanova, Diana, Milenin, Alexey, Vrancken, Christa, Geypen, Jef, Bender, Hugo, Groeseneken, Guido, Vandervorst, Wilfried, Barla, Kathy, Collaert, Nadine, Horiguchi, Naoto, Thean, Aaron

Relation: Symposium on VLSI Technology pages:58-59; Symposium on VLSI Technology location:Honolulu, HI USA date:2014-06-09; https://lirias.kuleuven.be/handle/123456789/477741; C29170

الاتاحة: https://lirias.kuleuven.be/handle/123456789/477741

المؤلفون: Veloso, Anabela, Boccardi, Guillaume, Ragnarsson, Lars-Ake, Higuchi, Yuichi, Arimura, Hiroaki, Lee, Jae Woo, Simoen, Eddy, Cho, Moon Ju, Roussel, Philippe, Paraschiv, Vasile, Shi, Xiaoping, Schram, Tom, Chew, Soon Aik, Brus, Stephan, Dangol, Anish, Vecchio, Emma, Sebaai, Farid, Kellens, Kristof, Heylen, Nancy, Devriendt, Katia, Dekkers, Harold, Van Ammel, Annemie, Witters, Thomas, Conard, Thierry, Vaesen, Inge, Richard, Olivier, Bender, Hugo, Athimulam, Raja, Chiarella, Thomas, Thean, Aaron, Horiguchi, Naoto

Relation: International Conference on Solid State Devices and Materials - SSDM pages:591-591; International Conference on Solid State Devices and Materials - SSDM location:Fukuoka Japan date:2013-09-24; https://lirias.kuleuven.be/handle/123456789/478084; C26918

الاتاحة: https://lirias.kuleuven.be/handle/123456789/478084

المؤلفون: Veloso, Anabela, Boccardi, Guillaume, Ragnarsson, Lars-Ake, Higuchi, Yuichi, Lee, Jae Won, Simoen, Eddy, Roussel, Philippe, Cho, Moon Ju, Chew, Soon Aik, Schram, Tom, Dekkers, Harold, Van Ammel, Annemie, Witters, Thomas, Brus, Stephan, Dangol, Anish, Paraschiv, Vasile, Vecchio, Emma, Shi, Xiaoping, Sebaai, Farid, Kellens, Kristof, Heylen, Nancy, Devriendt, Katia, Richard, Olivier, Bender, Hugo, Chiarella, Thomas, Arimura, Hiroaki, Thean, Aaron, Horiguchi, Naoto

Relation: Symposium on VLSI Technology pages:T194-T195; Symposium on VLSI Technology location:Kyoto Japan date:11/06/2013; C26487; https://lirias.kuleuven.be/handle/123456789/433689

الاتاحة: https://lirias.kuleuven.be/handle/123456789/433689

المؤلفون: Ragnarsson, Lars-Ake, Adelmann, Christoph, Higuchi, Yuichi, Opsomer, Karl, Veloso, Anabela, Chew, Soon Aik, Rohr, Erika, Vecchio, Emma, Shi, Xiaoping, Devriendt, Katia, Sebaai, Farid, Kauerauf, Thomas, Pawlak, Malgorzata Anna, Schram, Tom, Van Elshocht, Sven, Horiguchi, Naoto, Thean, Aaron

المصدر: 2012 Symposium on VLSI Technology (VLSIT) ; page 27-28

الاتاحة: http://dx.doi.org/10.1109/vlsit.2012.6242444
http://xplorestaging.ieee.org/ielx5/6235083/6242429/06242444.pdf?arnumber=6242444

المؤلفون: Sebaai, Farid, Veloso, Anabela, Claes, Martine, Devriendt, Katia, Brus, Stephan, Absil, Philippe, Mertens, Paul, De Gendt, Stefan

مصطلحات موضوعية: Replacement Gate, poly-silicon, dopants and contaminant species, poly-silicon opening, diluted ammonia and diluted TMAH solution

Relation: ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES X vol:187 pages:53-56; 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2010) location:Ostend: BELGIUM date:SEP 20-22, 2010; https://lirias.kuleuven.be/handle/123456789/391941; *****************

الاتاحة: https://lirias.kuleuven.be/handle/123456789/391941

المؤلفون: Witters, Liesbeth, Mitard, Jerome, Veloso, Anabela, Hikavyy, Andriy, Franco, Jacopo, Kauerauf, Thomas, Cho, Moon Ju, Schram, Tom, Sebaai, Farid, Yamaguchi, Shinpei, Takeoka, S, Fukuda, Masahiro, Wang, Wei-E, Duriez, Blandine, Eneman, Geert, Loo, Roger, Kellens, Kristof, Tielens, Hilde, Favia, Paola, Rohr, Erika, Hellings, Geert, Bender, Hugo, Roussel, Philippe, Crabbe, Yvo, Brus, Stephan, Mannaert, Geert, Kubicek, Stefan, Devriendt, Katia, De Meyer, Kristin, Ragnarsson, Lars-Ake, Steegen, An, Horiguchi, Naoto

Relation: IEEE International Electron Devices Meeting - IEDM location:Washington, DC USA date:12/05/2011; https://lirias.kuleuven.be/handle/123456789/334667; C22907

الاتاحة: https://lirias.kuleuven.be/handle/123456789/334667

المؤلفون: Govoreanu, Bogdan, Kubicek, Stefan, Kar, Gouri Sankar, Chen, Yangyin, Paraschiv, Vasile, Rakowski, Michal, Degraeve, Robin, Goux, Ludovic, Clima, Sergiu, Jossart, Nico, Adelmann, Christoph, Richard, Olivier, Raes, Thomas, Vangoidsenhoven, Diziana, Vandeweyer, Tom, Tielens, Hilde, Kellens, Kristof, Devriendt, Katia, Heylen, Nancy, Brus, Stephan, Verbrugge, Beatrijs, Pantisano, Luigi, Bender, Hugo, Pourtois, Geoffrey, Kittl, Jorge, Wouters, Dirk, Altimime, Laith, Jurczak, Malgorzata

Relation: International Conference on Solid State Devices and Materials - SSDM location:Nagoya Japan date:09/28/2011; C24179; https://lirias.kuleuven.be/handle/123456789/334804

الاتاحة: https://lirias.kuleuven.be/handle/123456789/334804