المؤلفون: Balan, Viorel, Mendes, Ivanie, Lapeyre, Céline, Vignoud, Lionel, Otten, Ronald, Mouraille, Orion, van Dijk, Leon, Minghetti, Blandine, Depre, Jerome, van Haren, Richard

المساهمون: Département Plate-Forme Technologique (DPFT), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), ASML

المصدر: SPIE Advanced Lithography + Patterning ; https://cea.hal.science/cea-04601654 ; SPIE Advanced Lithography + Patterning, Feb 2023, San José, United States. , 12496, pp.1249633, 2023, Proc. SPIE Metrology, Inspection, and Process Control XXXVI. ⟨10.1117/12.2658296⟩ ; https://doi.org/10.1117/12.2658296

مصطلحات موضوعية: [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics

جغرافية الموضوع: San José, United States

Relation: cea-04601654; https://cea.hal.science/cea-04601654; https://cea.hal.science/cea-04601654/document; https://cea.hal.science/cea-04601654/file/Die-level_nanotopography_metrology_for_monitoring_stress-induced_local_wafer_shape_variation_Manuscript.pdf

الاتاحة: https://cea.hal.science/cea-04601654
https://cea.hal.science/cea-04601654/document
https://cea.hal.science/cea-04601654/file/Die-level_nanotopography_metrology_for_monitoring_stress-induced_local_wafer_shape_variation_Manuscript.pdf
https://doi.org/10.1117/12.2658296

المؤلفون: Blancquaert, Yoann, May, Michael, Depre, Jerome, Cannac, Maxime, Minghetti, Blandine, Heijmerikx, Herman

المساهمون: Département Plate-Forme Technologique (DPFT), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), ASML ASML

المصدر: SPIE Advance Lithography + Patterning 2022 ; https://cea.hal.science/cea-04654503 ; SPIE Advance Lithography + Patterning 2022, Feb 2022, San José, United States ; https://spie.org/conferences-and-exhibitions/advanced-lithography-and-patterning?utm_id=raloocaw&utm_campaign=al_calendar_link_on_optics.org&utm_source=event_event_calendar_links&utm_medium=display_online_advertising&utm_term=al20_call_campaign&webSyncID=abbe222e-b8b6-598d-6a95-a39416857c2d&sessionGUID=6e7688e1-8b4c-6217-0336-a302a70b4e46

مصطلحات موضوعية: [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics

جغرافية الموضوع: San José, United States

Relation: cea-04654503; https://cea.hal.science/cea-04654503; https://cea.hal.science/cea-04654503/document; https://cea.hal.science/cea-04654503/file/2bdd7ae2-f798-47d5-8cb6-9e69ec5bd439.pdf

الاتاحة: https://cea.hal.science/cea-04654503
https://cea.hal.science/cea-04654503/document
https://cea.hal.science/cea-04654503/file/2bdd7ae2-f798-47d5-8cb6-9e69ec5bd439.pdf

المؤلفون: May, Michael J., Minghetti, Blandine, Depre, Jérome, Blancquaert, Yoann, Lam, Pui L., Lapeyre, Céline, Lee, Joungchel

المساهمون: Adan, Ofer, Robinson, John C.

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV

الاتاحة: http://dx.doi.org/10.1117/12.2552012

المؤلفون: Calado, Victor, Depre, Jerome, Massacrier, Clement, Tarabrin, Sergey, van Haren, Richard, Dettoni, Florent, Bouyssou, Régis, Dezauzier, Chistophe

المساهمون: Adan, Ofer, Ukraintsev, Vladimir A.

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII

الاتاحة: http://dx.doi.org/10.1117/12.2297673

المؤلفون: Dettoni, Florent, Bouyssou, Régis, Dezauzier, Christophe, Depre, Jerome, Meyer, Steffen, Prentice, Christopher

المساهمون: Sanchez, Martha I., Ukraintsev, Vladimir A.

المصدر: SPIE Proceedings ; Metrology, Inspection, and Process Control for Microlithography XXXI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2258206

المؤلفون: Blancquaert, Yoann, Dezauzier, Christophe, Depre, Jerome, Miqyass, Mohamed, Beltman, Jan

المساهمون: Starikov, Alexander, Cain, Jason P.

المصدر: SPIE Proceedings ; Metrology, Inspection, and Process Control for Microlithography XXVII ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.2011406

المؤلفون: Kim, Young Ki, Pohling, Lua, Hwee, Ng Teng, Kim, Jeong Soo, Benyon, Peter, Depre, Jerome, Hong, Jongkyun, Serebriakov, Alexander

المساهمون: Allgair, John A., Raymond, Christopher J.

المصدر: Metrology, Inspection, and Process Control for Microlithography XXIII ; SPIE Proceedings ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.813609

المؤلفون: Hinnen, Paul, Depre, Jerome, Tanaka, Shinichi, Lim, Ser-Yong, Brioso, Omar, Shahrjerdy, Mir, Ishigo, Kazutaka, Kono, Takuya, Higashiki, Tatsuhiko

المساهمون: Flagello, Donis G.

المصدر: SPIE Proceedings ; Optical Microlithography XX ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.712084

المؤلفون: Warrick, Scott, Hinnen, Paul, Morton, Rob, Cooper, Kevin, Sassoulas, Pierre-Olivier, Depre, Jerome, Navarro, Ramon, van Haren, Richard, Browning, Clyde, Reber, Doug, Megens, Henry

المصدر: Optical Microlithography XVIII

الاتاحة: http://dx.doi.org/10.1117/12.599807

المؤلفون: Luce, Emmanuelle, Mougel, Sebastien, Goirand, Pierre-Jerome, Depre, Jerome

المساهمون: Yen, Anthony

المصدر: SPIE Proceedings ; Optical Microlithography XV ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.474634
http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.474634

المؤلفون: Sanchez, Martha I., Ukraintsev, Vladimir A., Dettoni, Florent, Bouyssou, Régis, Dezauzier, Christophe, Depre, Jerome, Meyer, Steffen, Prentice, Christopher

المصدر: Proceedings of SPIE; March 2017, Vol. 10145 Issue: 1 p101452B-101452B-11, 10043760p

المؤلفون: Robinson, John C., Sendelbach, Matthew J., Balan, Viorel, Michel, Florent, Mendes, Ivanie, Lapeyre, Celine, Vignoud, Lionel, Otten, Ronald, Mouraille, Orion, van Dijk, Leon, Minghetti, Blandine, Depre, Jerome, van Haren, Richard

المصدر: Proceedings of SPIE; April 2023, Vol. 12496 Issue: 1 p1249633-1249633-5

المؤلفون: Weisbuch, Francois, Warrick, Scott, Conley, Will, Depre, Jerome

المصدر: Proceedings of SPIE; Nov2005, Issue 1, p1405-1416, 12p

المؤلفون: Starikov, Alexander, Cain, Jason P., Blancquaert, Yoann, Dezauzier, Christophe, Depre, Jerome, Miqyass, Mohamed, Beltman, Jan

المصدر: Proceedings of SPIE; April 2013, Vol. 8681 Issue: 1 p86811F-86811F-13, 8594303p